JP2000313961A5 - - Google Patents

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Publication number
JP2000313961A5
JP2000313961A5 JP2000057727A JP2000057727A JP2000313961A5 JP 2000313961 A5 JP2000313961 A5 JP 2000313961A5 JP 2000057727 A JP2000057727 A JP 2000057727A JP 2000057727 A JP2000057727 A JP 2000057727A JP 2000313961 A5 JP2000313961 A5 JP 2000313961A5
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JP
Japan
Prior art keywords
gas
gases
temperature
kinds
individually
Prior art date
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Pending
Application number
JP2000057727A
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English (en)
Japanese (ja)
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JP2000313961A (ja
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Publication date
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Priority to JP2000057727A priority Critical patent/JP2000313961A/ja
Priority claimed from JP2000057727A external-priority patent/JP2000313961A/ja
Publication of JP2000313961A publication Critical patent/JP2000313961A/ja
Publication of JP2000313961A5 publication Critical patent/JP2000313961A5/ja
Pending legal-status Critical Current

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JP2000057727A 1999-03-03 2000-03-02 ガス噴射ヘッド Pending JP2000313961A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000057727A JP2000313961A (ja) 1999-03-03 2000-03-02 ガス噴射ヘッド

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11-56154 1999-03-03
JP5615499 1999-03-03
JP2000057727A JP2000313961A (ja) 1999-03-03 2000-03-02 ガス噴射ヘッド

Publications (2)

Publication Number Publication Date
JP2000313961A JP2000313961A (ja) 2000-11-14
JP2000313961A5 true JP2000313961A5 (enExample) 2005-07-28

Family

ID=26397087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000057727A Pending JP2000313961A (ja) 1999-03-03 2000-03-02 ガス噴射ヘッド

Country Status (1)

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JP (1) JP2000313961A (enExample)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4567148B2 (ja) * 2000-06-23 2010-10-20 東京エレクトロン株式会社 薄膜形成装置
JP5034138B2 (ja) * 2001-01-25 2012-09-26 東京エレクトロン株式会社 熱処理方法及び熱処理装置
WO2004111297A1 (ja) * 2003-06-10 2004-12-23 Tokyo Electron Limited 処理ガス供給機構、成膜装置および成膜方法
KR100726136B1 (ko) 2006-02-08 2007-06-12 주식회사 아바코 증착원 분사장치
JP4863890B2 (ja) * 2007-01-19 2012-01-25 大陽日酸株式会社 気相成長装置
WO2018083989A1 (ja) * 2016-11-02 2018-05-11 東京エレクトロン株式会社 シャワーヘッド及び基板処理装置
JP2020068247A (ja) * 2018-10-23 2020-04-30 東京エレクトロン株式会社 シャワーヘッドおよび基板処理装置

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