JP2000313961A - ガス噴射ヘッド - Google Patents

ガス噴射ヘッド

Info

Publication number
JP2000313961A
JP2000313961A JP2000057727A JP2000057727A JP2000313961A JP 2000313961 A JP2000313961 A JP 2000313961A JP 2000057727 A JP2000057727 A JP 2000057727A JP 2000057727 A JP2000057727 A JP 2000057727A JP 2000313961 A JP2000313961 A JP 2000313961A
Authority
JP
Japan
Prior art keywords
gas
temperature
injection head
film
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000057727A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000313961A5 (enExample
Inventor
Kuniaki Horie
邦明 堀江
Yukio Fukunaga
由紀夫 福永
Tsutomu Nakada
勉 中田
Mitsunao Shibazaki
光直 柴崎
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ebara Corp
Original Assignee
Ebara Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ebara Corp filed Critical Ebara Corp
Priority to JP2000057727A priority Critical patent/JP2000313961A/ja
Publication of JP2000313961A publication Critical patent/JP2000313961A/ja
Publication of JP2000313961A5 publication Critical patent/JP2000313961A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Semiconductor Memories (AREA)
  • Chemical Vapour Deposition (AREA)
  • Electrodes Of Semiconductors (AREA)
JP2000057727A 1999-03-03 2000-03-02 ガス噴射ヘッド Pending JP2000313961A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000057727A JP2000313961A (ja) 1999-03-03 2000-03-02 ガス噴射ヘッド

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP11-56154 1999-03-03
JP5615499 1999-03-03
JP2000057727A JP2000313961A (ja) 1999-03-03 2000-03-02 ガス噴射ヘッド

Publications (2)

Publication Number Publication Date
JP2000313961A true JP2000313961A (ja) 2000-11-14
JP2000313961A5 JP2000313961A5 (enExample) 2005-07-28

Family

ID=26397087

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000057727A Pending JP2000313961A (ja) 1999-03-03 2000-03-02 ガス噴射ヘッド

Country Status (1)

Country Link
JP (1) JP2000313961A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002008995A (ja) * 2000-06-23 2002-01-11 Tokyo Electron Ltd 薄膜形成方法及び薄膜形成装置
JP2002222804A (ja) * 2001-01-25 2002-08-09 Tokyo Electron Ltd 熱処理方法及び熱処理装置
JPWO2004111297A1 (ja) * 2003-06-10 2006-07-20 東京エレクトロン株式会社 処理ガス供給機構、成膜装置および成膜方法
KR100726136B1 (ko) 2006-02-08 2007-06-12 주식회사 아바코 증착원 분사장치
JP2008177380A (ja) * 2007-01-19 2008-07-31 Taiyo Nippon Sanso Corp 気相成長装置
WO2018083989A1 (ja) * 2016-11-02 2018-05-11 東京エレクトロン株式会社 シャワーヘッド及び基板処理装置
WO2020085128A1 (ja) * 2018-10-23 2020-04-30 東京エレクトロン株式会社 シャワーヘッドおよび基板処理装置

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002008995A (ja) * 2000-06-23 2002-01-11 Tokyo Electron Ltd 薄膜形成方法及び薄膜形成装置
JP2002222804A (ja) * 2001-01-25 2002-08-09 Tokyo Electron Ltd 熱処理方法及び熱処理装置
JPWO2004111297A1 (ja) * 2003-06-10 2006-07-20 東京エレクトロン株式会社 処理ガス供給機構、成膜装置および成膜方法
KR100726136B1 (ko) 2006-02-08 2007-06-12 주식회사 아바코 증착원 분사장치
JP2008177380A (ja) * 2007-01-19 2008-07-31 Taiyo Nippon Sanso Corp 気相成長装置
WO2018083989A1 (ja) * 2016-11-02 2018-05-11 東京エレクトロン株式会社 シャワーヘッド及び基板処理装置
WO2020085128A1 (ja) * 2018-10-23 2020-04-30 東京エレクトロン株式会社 シャワーヘッドおよび基板処理装置

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