JP2000286178A - 投影光学系、露光装置及び前記投影光学系の製造方法 - Google Patents

投影光学系、露光装置及び前記投影光学系の製造方法

Info

Publication number
JP2000286178A
JP2000286178A JP11087970A JP8797099A JP2000286178A JP 2000286178 A JP2000286178 A JP 2000286178A JP 11087970 A JP11087970 A JP 11087970A JP 8797099 A JP8797099 A JP 8797099A JP 2000286178 A JP2000286178 A JP 2000286178A
Authority
JP
Japan
Prior art keywords
optical system
projection optical
optical member
projection
workpiece
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11087970A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000286178A5 (enExample
Inventor
Maiko Yamaguchi
麻衣子 山口
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP11087970A priority Critical patent/JP2000286178A/ja
Publication of JP2000286178A publication Critical patent/JP2000286178A/ja
Publication of JP2000286178A5 publication Critical patent/JP2000286178A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP11087970A 1999-03-30 1999-03-30 投影光学系、露光装置及び前記投影光学系の製造方法 Pending JP2000286178A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11087970A JP2000286178A (ja) 1999-03-30 1999-03-30 投影光学系、露光装置及び前記投影光学系の製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11087970A JP2000286178A (ja) 1999-03-30 1999-03-30 投影光学系、露光装置及び前記投影光学系の製造方法

Publications (2)

Publication Number Publication Date
JP2000286178A true JP2000286178A (ja) 2000-10-13
JP2000286178A5 JP2000286178A5 (enExample) 2008-01-31

Family

ID=13929716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11087970A Pending JP2000286178A (ja) 1999-03-30 1999-03-30 投影光学系、露光装置及び前記投影光学系の製造方法

Country Status (1)

Country Link
JP (1) JP2000286178A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6639651B2 (en) 2000-12-14 2003-10-28 Nikon Corporation Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus
JP2004343101A (ja) * 2003-04-25 2004-12-02 Canon Inc 駆動機構、それを有する露光装置、デバイスの製造方法
US7068435B2 (en) 2003-07-31 2006-06-27 Olympus Corporation Optical system radial deformation adjustment method and system
JP2012079739A (ja) * 2010-09-30 2012-04-19 Dainippon Screen Mfg Co Ltd 変位算出方法、描画データの補正方法、描画方法および描画装置

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6639651B2 (en) 2000-12-14 2003-10-28 Nikon Corporation Fabrication method for correcting member, fabrication method for projection optical system, and exposure apparatus
JP2004343101A (ja) * 2003-04-25 2004-12-02 Canon Inc 駆動機構、それを有する露光装置、デバイスの製造方法
US7068435B2 (en) 2003-07-31 2006-06-27 Olympus Corporation Optical system radial deformation adjustment method and system
JP2012079739A (ja) * 2010-09-30 2012-04-19 Dainippon Screen Mfg Co Ltd 変位算出方法、描画データの補正方法、描画方法および描画装置
US8886350B2 (en) 2010-09-30 2014-11-11 SCREEN Holdings Co., Ltd. Displacement calculation method, drawing data correction method, substrate manufacturing method, and drawing apparatus

Similar Documents

Publication Publication Date Title
US6333776B1 (en) Projection exposure apparatus
EP1083462A1 (en) Exposure method and system, photomask, method of manufacturing photomask, micro-device and method of manufacturing micro-device
US6456377B1 (en) Method for measuring optical feature of exposure apparatus and exposure apparatus having means for measuring optical feature
JPH08203805A (ja) 投影光学装置の調整方法及び露光装置
US20020080338A1 (en) Projection exposure apparatus
US6278514B1 (en) Exposure apparatus
JPH0822948A (ja) 走査型露光装置
US6172740B1 (en) Projection exposure apparatus and device manufacturing method
JPWO2002025711A1 (ja) 結像特性の計測方法及び露光方法
JP2002353108A (ja) 露光方法、露光装置、フォトマスク、デバイス製造方法、及びフォトマスク製造方法
KR20190092275A (ko) 투영 광학계, 노광 장치, 및 물품의 제조 방법
JP2002170754A (ja) 露光装置、光学特性検出方法及び露光方法
JP4333035B2 (ja) 露光装置および該装置を用いた半導体デバイスの製造方法
JP2897345B2 (ja) 投影露光装置
JPH11502942A (ja) 反対方向の動きを伴う走査リソグラフィシステム
KR20040042864A (ko) 리소그래피장치 및 빔크기와 발산을 결정하는 방법
JP3555233B2 (ja) 投影露光装置
KR100992302B1 (ko) 광학계, 노광장치 및 디바이스 제조방법
JPH10189443A (ja) 位置検出用マーク、マーク検出方法及びその装置並びに露光装置
JP2000286178A (ja) 投影光学系、露光装置及び前記投影光学系の製造方法
JP2884950B2 (ja) 投影露光装置、露光方法および半導体集積回路の製造方法
JP2840314B2 (ja) 投影露光装置
JPH088157A (ja) 投影露光装置
JP5360529B2 (ja) 投影光学系、露光装置、およびデバイス製造方法
JP3092732B2 (ja) 投影露光装置及び投影露光方法

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20051130

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20071211

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20080417

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20080422

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20080819