JP2000277509A5 - - Google Patents

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Publication number
JP2000277509A5
JP2000277509A5 JP1999086289A JP8628999A JP2000277509A5 JP 2000277509 A5 JP2000277509 A5 JP 2000277509A5 JP 1999086289 A JP1999086289 A JP 1999086289A JP 8628999 A JP8628999 A JP 8628999A JP 2000277509 A5 JP2000277509 A5 JP 2000277509A5
Authority
JP
Japan
Prior art keywords
gas
blowing nozzles
substrate
processing apparatus
gas blowing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1999086289A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000277509A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP11086289A priority Critical patent/JP2000277509A/ja
Priority claimed from JP11086289A external-priority patent/JP2000277509A/ja
Publication of JP2000277509A publication Critical patent/JP2000277509A/ja
Publication of JP2000277509A5 publication Critical patent/JP2000277509A5/ja
Pending legal-status Critical Current

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JP11086289A 1999-03-29 1999-03-29 基板処理装置 Pending JP2000277509A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11086289A JP2000277509A (ja) 1999-03-29 1999-03-29 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11086289A JP2000277509A (ja) 1999-03-29 1999-03-29 基板処理装置

Publications (2)

Publication Number Publication Date
JP2000277509A JP2000277509A (ja) 2000-10-06
JP2000277509A5 true JP2000277509A5 (enExample) 2006-05-18

Family

ID=13882688

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11086289A Pending JP2000277509A (ja) 1999-03-29 1999-03-29 基板処理装置

Country Status (1)

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JP (1) JP2000277509A (enExample)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102004029466A1 (de) * 2004-06-18 2006-01-05 Leybold Optics Gmbh Medieninjektor
KR101183141B1 (ko) * 2005-08-29 2012-09-14 주성엔지니어링(주) 가스분배판 및 이를 포함하는 플라즈마 발생장치
JP4638833B2 (ja) * 2006-03-31 2011-02-23 三井造船株式会社 プラズマ成膜装置およびプラズマ成膜装置のクリーニング方法
WO2009066389A1 (ja) * 2007-11-22 2009-05-28 Canon Anelva Corporation スパッタ装置およびスパッタ方法
KR100982987B1 (ko) 2008-04-18 2010-09-17 삼성엘이디 주식회사 화학 기상 증착 장치
JP5172484B2 (ja) * 2008-06-09 2013-03-27 昭和電工株式会社 磁気記録媒体の製造方法及び成膜装置
JP2011077143A (ja) * 2009-09-29 2011-04-14 Dainippon Screen Mfg Co Ltd 熱処理装置
WO2012128783A1 (en) * 2011-03-22 2012-09-27 Applied Materials, Inc. Liner assembly for chemical vapor deposition chamber
US9245717B2 (en) * 2011-05-31 2016-01-26 Lam Research Corporation Gas distribution system for ceramic showerhead of plasma etch reactor
JP5843626B2 (ja) * 2012-01-20 2016-01-13 東京エレクトロン株式会社 ガス供給ヘッド及び基板処理装置
JP6230986B2 (ja) * 2014-11-28 2017-11-15 東京エレクトロン株式会社 プラズマ処理装置
CN108292588B (zh) * 2015-12-04 2022-02-18 应用材料公司 用以防止hdp-cvd腔室电弧放电的先进涂层方法及材料
CN115537779A (zh) * 2022-10-12 2022-12-30 拓荆科技股份有限公司 气体输送结构及气相沉积设备

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