JP2000182550A5 - - Google Patents

Download PDF

Info

Publication number
JP2000182550A5
JP2000182550A5 JP1998361040A JP36104098A JP2000182550A5 JP 2000182550 A5 JP2000182550 A5 JP 2000182550A5 JP 1998361040 A JP1998361040 A JP 1998361040A JP 36104098 A JP36104098 A JP 36104098A JP 2000182550 A5 JP2000182550 A5 JP 2000182550A5
Authority
JP
Japan
Prior art keywords
electrode
electron
acceleration
electron gun
control means
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP1998361040A
Other languages
English (en)
Japanese (ja)
Other versions
JP2000182550A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10361040A priority Critical patent/JP2000182550A/ja
Priority claimed from JP10361040A external-priority patent/JP2000182550A/ja
Priority to US09/461,835 priority patent/US6670620B1/en
Publication of JP2000182550A publication Critical patent/JP2000182550A/ja
Publication of JP2000182550A5 publication Critical patent/JP2000182550A5/ja
Abandoned legal-status Critical Current

Links

JP10361040A 1998-12-18 1998-12-18 電子銃および電子銃を用いる照明装置または電子ビーム露光装置 Abandoned JP2000182550A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP10361040A JP2000182550A (ja) 1998-12-18 1998-12-18 電子銃および電子銃を用いる照明装置または電子ビーム露光装置
US09/461,835 US6670620B1 (en) 1998-12-18 1999-12-16 Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10361040A JP2000182550A (ja) 1998-12-18 1998-12-18 電子銃および電子銃を用いる照明装置または電子ビーム露光装置

Publications (2)

Publication Number Publication Date
JP2000182550A JP2000182550A (ja) 2000-06-30
JP2000182550A5 true JP2000182550A5 (enExample) 2006-04-27

Family

ID=18471943

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10361040A Abandoned JP2000182550A (ja) 1998-12-18 1998-12-18 電子銃および電子銃を用いる照明装置または電子ビーム露光装置

Country Status (2)

Country Link
US (1) US6670620B1 (enExample)
JP (1) JP2000182550A (enExample)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6528799B1 (en) * 2000-10-20 2003-03-04 Lucent Technologies, Inc. Device and method for suppressing space charge induced aberrations in charged-particle projection lithography systems
JP4113032B2 (ja) * 2003-04-21 2008-07-02 キヤノン株式会社 電子銃及び電子ビーム露光装置
US7110500B2 (en) * 2003-09-12 2006-09-19 Leek Paul H Multiple energy x-ray source and inspection apparatus employing same
WO2009085240A2 (en) * 2007-12-21 2009-07-09 Cornell Research Foundation, Inc. Self-powered lithography method and apparatus using radioactive thin films
US8581526B1 (en) * 2010-08-28 2013-11-12 Jefferson Science Associates, Llc Unbalanced field RF electron gun
JP6363864B2 (ja) * 2014-04-16 2018-07-25 株式会社ニューフレアテクノロジー 電子ビーム描画装置、及び電子ビームの収束半角調整方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4897552A (en) 1987-04-28 1990-01-30 Canon Kabushiki Kaisha Multi-electron-beam pattern drawing apparatus
JP2599591B2 (ja) 1987-04-28 1997-04-09 キヤノン株式会社 電子放出素子特性測定装置
DE3851083T2 (de) 1987-04-28 1995-01-12 Canon Kk Musteraufzeichnungsgerät mit Mehrfach-Elektronenstrahl.
US4896945A (en) 1987-12-14 1990-01-30 Nippon Telegraph And Telephone Corporation Liquid crystal cell array and method for driving the same
US5633507A (en) * 1995-09-19 1997-05-27 International Business Machines Corporation Electron beam lithography system with low brightness
JP3369379B2 (ja) 1995-11-16 2003-01-20 日本電信電話株式会社 荷電粒子照射装置
JPH10106926A (ja) * 1996-10-01 1998-04-24 Nikon Corp 荷電粒子線リソグラフィ装置、荷電粒子線リソグラフィ装置の評価方法およびパターン形成方法
JP3728031B2 (ja) 1996-10-25 2005-12-21 キヤノン株式会社 電子ビーム露光装置及び電子ビーム露光用マスク
US6232040B1 (en) * 1999-05-06 2001-05-15 Agere Systems, Inc. Method of electron beam exposure utilizing emitter with conductive mesh grid

Similar Documents

Publication Publication Date Title
CA2162748A1 (en) Ion generating source for use in an ion implanter
US8247958B2 (en) System, method and apparatus for multi-beam lithography including a dispenser cathode for homogeneous electron emission
ES2119714A1 (es) Cuerpo catodico, cañon de electrones y tubo de rayos catodicos que utilizan un emisor ferroelectrico.
EP1199739A3 (en) A device and method for suppressing space charge induced abberations in charged-particle projection lithography systems
JP2000182550A5 (enExample)
EP0690473A3 (en) Ion beam electron neutralizer
JP4647866B2 (ja) 高い輝度と大きいビーム電流の間で切換可能な粒子源を含む粒子光学装置
JP4601923B2 (ja) 電子銃とそれを用いた電子ビーム照射装置
WO2002033725A3 (en) System and method for rapidly controlling the output of an ion source for ion implantation
JP4246373B2 (ja) 電子ビーム生成装置及び電子ビーム露光装置
US6670620B1 (en) Electron gun, illumination apparatus using the electron gun, and electron beam exposure apparatus using the illumination apparatus
US5637953A (en) Cathode assembly for a line focus electron beam device
JP2003324050A (ja) 露光装置及びカソード製造方法
JPH07118279B2 (ja) 平面形電子放出装置
JPH0689690A (ja) イオン注入装置のイオンビーム中和装置
JP2876280B2 (ja) ビーム発生方法及び装置
JP2023001063A (ja) 電荷キャリア発生源
JPH01274349A (ja) 電子銃用高圧電源
JPS62140344A (ja) 電子銃
JPS58201246A (ja) 光源用陰極線管
JP2003332204A (ja) 露光装置、及び電子銃
JP2021150184A (ja) 負イオン生成装置
JP2021157943A (ja) 負イオン生成装置
JPS5851438A (ja) 電子線源
JPS61227354A (ja) 線状電子ビ−ム発生装置