JP2000178728A - 光学薄膜の製造装置及び光学薄膜の製造方法 - Google Patents
光学薄膜の製造装置及び光学薄膜の製造方法Info
- Publication number
- JP2000178728A JP2000178728A JP10361252A JP36125298A JP2000178728A JP 2000178728 A JP2000178728 A JP 2000178728A JP 10361252 A JP10361252 A JP 10361252A JP 36125298 A JP36125298 A JP 36125298A JP 2000178728 A JP2000178728 A JP 2000178728A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- optical thin
- substrate
- electrode
- refractive index
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 title claims abstract description 141
- 230000003287 optical effect Effects 0.000 title claims abstract description 102
- 238000004519 manufacturing process Methods 0.000 title claims description 44
- 239000000758 substrate Substances 0.000 claims abstract description 103
- 239000010408 film Substances 0.000 claims abstract description 91
- 238000001755 magnetron sputter deposition Methods 0.000 claims abstract description 40
- 239000002245 particle Substances 0.000 claims abstract description 31
- 238000000034 method Methods 0.000 claims abstract description 22
- 230000015572 biosynthetic process Effects 0.000 claims description 26
- 238000005477 sputtering target Methods 0.000 abstract description 73
- 230000007246 mechanism Effects 0.000 abstract description 67
- 238000004544 sputter deposition Methods 0.000 abstract description 27
- 239000000463 material Substances 0.000 abstract description 24
- 238000009416 shuttering Methods 0.000 abstract 2
- 239000007789 gas Substances 0.000 description 34
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 20
- 239000013077 target material Substances 0.000 description 20
- 229910052786 argon Inorganic materials 0.000 description 10
- 230000008859 change Effects 0.000 description 9
- 238000000151 deposition Methods 0.000 description 9
- 230000008021 deposition Effects 0.000 description 8
- 239000002184 metal Substances 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- MYMOFIZGZYHOMD-UHFFFAOYSA-N Dioxygen Chemical compound O=O MYMOFIZGZYHOMD-UHFFFAOYSA-N 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 5
- 229910001882 dioxygen Inorganic materials 0.000 description 5
- 239000001301 oxygen Substances 0.000 description 5
- 229910052760 oxygen Inorganic materials 0.000 description 5
- 230000002159 abnormal effect Effects 0.000 description 4
- 230000000052 comparative effect Effects 0.000 description 4
- 239000012788 optical film Substances 0.000 description 4
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000011261 inert gas Substances 0.000 description 3
- 230000008901 benefit Effects 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 230000012447 hatching Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 101100280298 Homo sapiens FAM162A gene Proteins 0.000 description 1
- 102100023788 Protein FAM162A Human genes 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000001659 ion-beam spectroscopy Methods 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 238000005546 reactive sputtering Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Landscapes
- Surface Treatment Of Optical Elements (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10361252A JP2000178728A (ja) | 1998-12-18 | 1998-12-18 | 光学薄膜の製造装置及び光学薄膜の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10361252A JP2000178728A (ja) | 1998-12-18 | 1998-12-18 | 光学薄膜の製造装置及び光学薄膜の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000178728A true JP2000178728A (ja) | 2000-06-27 |
| JP2000178728A5 JP2000178728A5 (enrdf_load_stackoverflow) | 2006-02-02 |
Family
ID=18472820
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10361252A Pending JP2000178728A (ja) | 1998-12-18 | 1998-12-18 | 光学薄膜の製造装置及び光学薄膜の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2000178728A (enrdf_load_stackoverflow) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009075635A1 (en) * | 2007-12-12 | 2009-06-18 | Sandvik Intellectual Property Ab | A shutter system |
| WO2025047785A1 (ja) * | 2023-08-31 | 2025-03-06 | 株式会社アルバック | シャッター装置及び成膜装置 |
Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60131966A (ja) * | 1983-12-20 | 1985-07-13 | Matsushita Electric Ind Co Ltd | スパツタ装置 |
| JPS6179770A (ja) * | 1984-09-28 | 1986-04-23 | Fujitsu Ltd | 蒸着用装置 |
| JPS6273202A (ja) * | 1985-09-27 | 1987-04-03 | Hamamatsu Photonics Kk | 光学薄膜の製造方法 |
| JPH01294860A (ja) * | 1988-05-20 | 1989-11-28 | Hitachi Koki Co Ltd | イオンビームスパッタ法 |
| JPH024967A (ja) * | 1988-02-08 | 1990-01-09 | Optical Coating Lab Inc | 薄膜形成装置及び方法 |
| JPH04193948A (ja) * | 1990-11-27 | 1992-07-14 | Mitsubishi Electric Corp | 成膜装置 |
| JPH0665722A (ja) * | 1992-08-21 | 1994-03-08 | Anelva Corp | 真空蒸着装置 |
| JPH06199592A (ja) * | 1992-12-29 | 1994-07-19 | Sony Corp | 分子線結晶成長装置 |
| JPH08292302A (ja) * | 1995-04-25 | 1996-11-05 | Olympus Optical Co Ltd | 光学薄膜およびその製造方法 |
| JPH09272971A (ja) * | 1996-04-04 | 1997-10-21 | Olympus Optical Co Ltd | 光学薄膜の製造方法及び光学薄膜 |
-
1998
- 1998-12-18 JP JP10361252A patent/JP2000178728A/ja active Pending
Patent Citations (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60131966A (ja) * | 1983-12-20 | 1985-07-13 | Matsushita Electric Ind Co Ltd | スパツタ装置 |
| JPS6179770A (ja) * | 1984-09-28 | 1986-04-23 | Fujitsu Ltd | 蒸着用装置 |
| JPS6273202A (ja) * | 1985-09-27 | 1987-04-03 | Hamamatsu Photonics Kk | 光学薄膜の製造方法 |
| JPH024967A (ja) * | 1988-02-08 | 1990-01-09 | Optical Coating Lab Inc | 薄膜形成装置及び方法 |
| JPH01294860A (ja) * | 1988-05-20 | 1989-11-28 | Hitachi Koki Co Ltd | イオンビームスパッタ法 |
| JPH04193948A (ja) * | 1990-11-27 | 1992-07-14 | Mitsubishi Electric Corp | 成膜装置 |
| JPH0665722A (ja) * | 1992-08-21 | 1994-03-08 | Anelva Corp | 真空蒸着装置 |
| JPH06199592A (ja) * | 1992-12-29 | 1994-07-19 | Sony Corp | 分子線結晶成長装置 |
| JPH08292302A (ja) * | 1995-04-25 | 1996-11-05 | Olympus Optical Co Ltd | 光学薄膜およびその製造方法 |
| JPH09272971A (ja) * | 1996-04-04 | 1997-10-21 | Olympus Optical Co Ltd | 光学薄膜の製造方法及び光学薄膜 |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2009075635A1 (en) * | 2007-12-12 | 2009-06-18 | Sandvik Intellectual Property Ab | A shutter system |
| US8232539B2 (en) | 2007-12-12 | 2012-07-31 | Sandvik Intellectual Property Ab | Shutter system |
| WO2025047785A1 (ja) * | 2023-08-31 | 2025-03-06 | 株式会社アルバック | シャッター装置及び成膜装置 |
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