JP2000164555A5 - - Google Patents

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Publication number
JP2000164555A5
JP2000164555A5 JP1998340406A JP34040698A JP2000164555A5 JP 2000164555 A5 JP2000164555 A5 JP 2000164555A5 JP 1998340406 A JP1998340406 A JP 1998340406A JP 34040698 A JP34040698 A JP 34040698A JP 2000164555 A5 JP2000164555 A5 JP 2000164555A5
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JP
Japan
Prior art keywords
substrate
rotating
drying apparatus
light source
irradiating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1998340406A
Other languages
English (en)
Japanese (ja)
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JP2000164555A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP10340406A priority Critical patent/JP2000164555A/ja
Priority claimed from JP10340406A external-priority patent/JP2000164555A/ja
Publication of JP2000164555A publication Critical patent/JP2000164555A/ja
Publication of JP2000164555A5 publication Critical patent/JP2000164555A5/ja
Pending legal-status Critical Current

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JP10340406A 1998-11-30 1998-11-30 基板乾燥装置及び方法 Pending JP2000164555A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10340406A JP2000164555A (ja) 1998-11-30 1998-11-30 基板乾燥装置及び方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10340406A JP2000164555A (ja) 1998-11-30 1998-11-30 基板乾燥装置及び方法

Publications (2)

Publication Number Publication Date
JP2000164555A JP2000164555A (ja) 2000-06-16
JP2000164555A5 true JP2000164555A5 (enExample) 2005-07-21

Family

ID=18336651

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10340406A Pending JP2000164555A (ja) 1998-11-30 1998-11-30 基板乾燥装置及び方法

Country Status (1)

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JP (1) JP2000164555A (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4055503B2 (ja) 2001-07-24 2008-03-05 日亜化学工業株式会社 半導体発光素子
US6837943B2 (en) * 2002-12-17 2005-01-04 Samsung Electronics Co., Ltd. Method and apparatus for cleaning a semiconductor substrate
KR100749548B1 (ko) 2006-08-01 2007-08-14 세메스 주식회사 기판 처리 장치
JP5043406B2 (ja) * 2006-11-21 2012-10-10 大日本スクリーン製造株式会社 基板乾燥方法および基板乾燥装置
US9355883B2 (en) * 2011-09-09 2016-05-31 Lam Research Ag Method and apparatus for liquid treatment of wafer shaped articles
JP5878441B2 (ja) 2012-08-20 2016-03-08 株式会社荏原製作所 基板洗浄装置及び基板処理装置
TWI602253B (zh) * 2012-10-12 2017-10-11 蘭姆研究股份公司 圓盤狀物件之液體處理用設備及用於該設備中之加熱系統
DE102013104577B3 (de) 2013-05-03 2014-07-24 Heraeus Noblelight Gmbh Vorrichtung zum Trocknen und Sintern metallhaltiger Tinte auf einem Substrat
US9245777B2 (en) * 2013-05-15 2016-01-26 Lam Research Ag Apparatus for liquid treatment of wafer shaped articles and heating system for use in such apparatus
KR20170143035A (ko) * 2013-12-02 2017-12-28 고쿠리츠켄큐카이하츠호진 상교기쥬츠 소고켄큐쇼 웨트 처리 장치
JP6184015B2 (ja) * 2013-12-02 2017-08-23 国立研究開発法人産業技術総合研究所 被処理体に臨んだ位置で加熱する加熱ウェット処理装置およびその方法
JP6563762B2 (ja) * 2015-09-29 2019-08-21 芝浦メカトロニクス株式会社 基板処理装置及び基板処理方法

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