JP2000031107A5 - - Google Patents
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- Publication number
- JP2000031107A5 JP2000031107A5 JP1999108436A JP10843699A JP2000031107A5 JP 2000031107 A5 JP2000031107 A5 JP 2000031107A5 JP 1999108436 A JP1999108436 A JP 1999108436A JP 10843699 A JP10843699 A JP 10843699A JP 2000031107 A5 JP2000031107 A5 JP 2000031107A5
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor substrate
- organic solvent
- vaporized
- drying
- nozzle
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 description 65
- 239000000758 substrate Substances 0.000 description 65
- 239000003960 organic solvent Substances 0.000 description 39
- 238000001035 drying Methods 0.000 description 32
- 238000005507 spraying Methods 0.000 description 4
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10843699A JP4311809B2 (ja) | 1998-05-07 | 1999-04-15 | 半導体基板の乾燥装置および半導体基板の乾燥方法 |
Applications Claiming Priority (7)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12493398 | 1998-05-07 | ||
JP10-124933 | 1998-05-07 | ||
JP10-124935 | 1998-05-07 | ||
JP12493498 | 1998-05-07 | ||
JP12493598 | 1998-05-07 | ||
JP10-124934 | 1998-05-07 | ||
JP10843699A JP4311809B2 (ja) | 1998-05-07 | 1999-04-15 | 半導体基板の乾燥装置および半導体基板の乾燥方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2000031107A JP2000031107A (ja) | 2000-01-28 |
JP2000031107A5 true JP2000031107A5 (ko) | 2006-03-30 |
JP4311809B2 JP4311809B2 (ja) | 2009-08-12 |
Family
ID=27469630
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10843699A Expired - Fee Related JP4311809B2 (ja) | 1998-05-07 | 1999-04-15 | 半導体基板の乾燥装置および半導体基板の乾燥方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4311809B2 (ko) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4931042B2 (ja) * | 2006-04-10 | 2012-05-16 | 株式会社ジェイ・イー・ティ | 基板処理装置 |
JP2012039163A (ja) * | 2011-11-24 | 2012-02-23 | Jet Co Ltd | 基板処理装置 |
CN114562874B (zh) * | 2022-03-02 | 2023-07-04 | 浙江光特科技有限公司 | 一种用于晶圆清洗后烘干处理装置 |
CN116544144B (zh) * | 2023-05-16 | 2023-10-27 | 江苏亚电科技有限公司 | 具有喷气功能的晶圆清洗干燥升降机构 |
-
1999
- 1999-04-15 JP JP10843699A patent/JP4311809B2/ja not_active Expired - Fee Related
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