JP2000021000A5 - - Google Patents
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- Publication number
- JP2000021000A5 JP2000021000A5 JP1998185007A JP18500798A JP2000021000A5 JP 2000021000 A5 JP2000021000 A5 JP 2000021000A5 JP 1998185007 A JP1998185007 A JP 1998185007A JP 18500798 A JP18500798 A JP 18500798A JP 2000021000 A5 JP2000021000 A5 JP 2000021000A5
- Authority
- JP
- Japan
- Prior art keywords
- light
- anisotropic
- grating
- magneto
- optical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001514 detection method Methods 0.000 description 72
- 230000003287 optical effect Effects 0.000 description 60
- 238000000034 method Methods 0.000 description 41
- 239000000758 substrate Substances 0.000 description 41
- 230000010287 polarization Effects 0.000 description 27
- 239000011521 glass Substances 0.000 description 25
- 239000004065 semiconductor Substances 0.000 description 24
- 239000005264 High molar mass liquid crystal Substances 0.000 description 20
- 239000010409 thin film Substances 0.000 description 19
- 239000000945 filler Substances 0.000 description 10
- 239000012790 adhesive layer Substances 0.000 description 8
- 230000002547 anomalous effect Effects 0.000 description 8
- 239000000853 adhesive Substances 0.000 description 7
- 230000001070 adhesive effect Effects 0.000 description 7
- 238000001312 dry etching Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 7
- 229920002120 photoresistant polymer Polymers 0.000 description 7
- 238000004528 spin coating Methods 0.000 description 6
- 230000005540 biological transmission Effects 0.000 description 5
- 239000004973 liquid crystal related substance Substances 0.000 description 5
- 238000000206 photolithography Methods 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical group [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 229910052710 silicon Inorganic materials 0.000 description 4
- 239000010703 silicon Substances 0.000 description 4
- 201000009310 astigmatism Diseases 0.000 description 3
- 230000015572 biosynthetic process Effects 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 239000000178 monomer Substances 0.000 description 3
- 238000006116 polymerization reaction Methods 0.000 description 3
- 230000003667 anti-reflective effect Effects 0.000 description 2
- 238000005094 computer simulation Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 230000005374 Kerr effect Effects 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 230000002708 enhancing effect Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 230000009249 intrinsic sympathomimetic activity Effects 0.000 description 1
- CNQCVBJFEGMYDW-UHFFFAOYSA-N lawrencium atom Chemical compound [Lr] CNQCVBJFEGMYDW-UHFFFAOYSA-N 0.000 description 1
- 230000031700 light absorption Effects 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 239000005304 optical glass Substances 0.000 description 1
- 230000000737 periodic effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920006289 polycarbonate film Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 239000013585 weight reducing agent Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18500798A JP4420990B2 (ja) | 1998-06-30 | 1998-06-30 | 光ヘッド装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP18500798A JP4420990B2 (ja) | 1998-06-30 | 1998-06-30 | 光ヘッド装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000021000A JP2000021000A (ja) | 2000-01-21 |
| JP2000021000A5 true JP2000021000A5 (https=) | 2005-05-26 |
| JP4420990B2 JP4420990B2 (ja) | 2010-02-24 |
Family
ID=16163153
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP18500798A Expired - Fee Related JP4420990B2 (ja) | 1998-06-30 | 1998-06-30 | 光ヘッド装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4420990B2 (https=) |
-
1998
- 1998-06-30 JP JP18500798A patent/JP4420990B2/ja not_active Expired - Fee Related
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