USD801942S1
(en)
*
|
2015-04-16 |
2017-11-07 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
USD797067S1
(en)
|
2015-04-21 |
2017-09-12 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
JP1545222S
(es)
*
|
2015-06-10 |
2016-03-07 |
|
|
JP1551512S
(es)
*
|
2015-06-12 |
2016-06-13 |
|
|
JP1546801S
(es)
*
|
2015-06-12 |
2016-03-28 |
|
|
JP1545407S
(es)
*
|
2015-06-16 |
2016-03-14 |
|
|
JP1545406S
(es)
*
|
2015-06-16 |
2016-03-14 |
|
|
USD798248S1
(en)
*
|
2015-06-18 |
2017-09-26 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
JP1549880S
(es)
*
|
2015-08-06 |
2016-05-23 |
|
|
JP1550115S
(es)
*
|
2015-08-18 |
2016-05-23 |
|
|
JP1549882S
(es)
*
|
2015-08-18 |
2016-05-23 |
|
|
TWD179095S
(zh)
*
|
2015-08-25 |
2016-10-21 |
荏原製作所股份有限公司 |
基板保持環
|
USD810705S1
(en)
*
|
2016-04-01 |
2018-02-20 |
Veeco Instruments Inc. |
Self-centering wafer carrier for chemical vapor deposition
|
USD830434S1
(en)
*
|
2015-12-28 |
2018-10-09 |
Ntn Corporation |
Inner ring for tapered roller bearing
|
USD847982S1
(en)
*
|
2016-02-04 |
2019-05-07 |
Atos Medical Ab |
Heat exchanger base plate
|
USD828419S1
(en)
*
|
2016-02-23 |
2018-09-11 |
Joy Global Underground Mining Llc |
Idler roller
|
USD836572S1
(en)
|
2016-09-30 |
2018-12-25 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
JP1581911S
(es)
*
|
2016-10-25 |
2017-07-24 |
|
|
USD839224S1
(en)
|
2016-12-12 |
2019-01-29 |
Ebara Corporation |
Elastic membrane for semiconductor wafer polishing
|
JP1611626S
(es)
*
|
2017-01-20 |
2018-08-20 |
|
|
JP1584906S
(es)
|
2017-01-31 |
2017-08-28 |
|
|
JP1584241S
(es)
|
2017-01-31 |
2017-08-21 |
|
|
JP1584146S
(es)
|
2017-01-31 |
2017-08-21 |
|
|
JP1584784S
(es)
|
2017-01-31 |
2017-08-28 |
|
|
JP1598997S
(es)
*
|
2017-08-31 |
2018-03-05 |
|
|
JP1598998S
(es)
*
|
2017-08-31 |
2018-03-05 |
|
|
USD851613S1
(en)
|
2017-10-05 |
2019-06-18 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
USD891923S1
(en)
*
|
2017-11-12 |
2020-08-04 |
Yun Lin |
Container lid
|
USD868124S1
(en)
|
2017-12-11 |
2019-11-26 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
USD877101S1
(en)
|
2018-03-09 |
2020-03-03 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
JP1642983S
(es)
|
2018-07-25 |
2019-10-07 |
|
|
JP1643125S
(es)
|
2018-07-25 |
2019-10-07 |
|
|
JP1643124S
(es)
|
2018-07-25 |
2019-10-07 |
|
|
JP1642984S
(es)
|
2018-07-25 |
2019-10-07 |
|
|
JP1643123S
(es)
|
2018-07-25 |
2019-10-07 |
|
|
JP1646505S
(es)
*
|
2018-12-07 |
2019-11-25 |
|
|
USD933725S1
(en)
*
|
2019-02-08 |
2021-10-19 |
Applied Materials, Inc. |
Deposition ring for a substrate processing chamber
|
USD891382S1
(en)
*
|
2019-02-08 |
2020-07-28 |
Applied Materials, Inc. |
Process shield for a substrate processing chamber
|
USD904305S1
(en)
*
|
2019-02-25 |
2020-12-08 |
Petram Technologies, Inc. |
Electrode cage for a plasma blasting probe
|
JP1646366S
(es)
*
|
2019-03-19 |
2019-11-25 |
|
|
USD920521S1
(en)
|
2019-05-08 |
2021-05-25 |
Reza Jalinous |
Double coil
|
USD970020S1
(en)
|
2019-05-09 |
2022-11-15 |
Reza Jalinous |
Double coil
|
USD926996S1
(en)
|
2019-05-14 |
2021-08-03 |
Reza Jalinous |
Coil
|
USD1010135S1
(en)
|
2019-05-20 |
2024-01-02 |
Reza Jalinous |
Coil
|
USD979080S1
(en)
|
2019-06-27 |
2023-02-21 |
Reza Jalinous |
MRI tower coil stand
|
USD908645S1
(en)
|
2019-08-26 |
2021-01-26 |
Applied Materials, Inc. |
Sputtering target for a physical vapor deposition chamber
|
USD931241S1
(en)
*
|
2019-08-28 |
2021-09-21 |
Applied Materials, Inc. |
Lower shield for a substrate processing chamber
|
JP1659287S
(es)
*
|
2019-10-18 |
2020-05-11 |
|
|
USD979524S1
(en)
*
|
2020-03-19 |
2023-02-28 |
Applied Materials, Inc. |
Confinement liner for a substrate processing chamber
|
USD943539S1
(en)
|
2020-03-19 |
2022-02-15 |
Applied Materials, Inc. |
Confinement plate for a substrate processing chamber
|
USD934315S1
(en)
*
|
2020-03-20 |
2021-10-26 |
Applied Materials, Inc. |
Deposition ring for a substrate processing chamber
|
USD937329S1
(en)
|
2020-03-23 |
2021-11-30 |
Applied Materials, Inc. |
Sputter target for a physical vapor deposition chamber
|
USD980394S1
(en)
*
|
2020-04-01 |
2023-03-07 |
Watermann Polyworks Gmbh |
Sealing apparatus
|
USD1034491S1
(en)
*
|
2020-07-27 |
2024-07-09 |
Applied Materials, Inc. |
Edge ring
|
USD933726S1
(en)
*
|
2020-07-31 |
2021-10-19 |
Applied Materials, Inc. |
Deposition ring for a semiconductor processing chamber
|
US11581166B2
(en)
|
2020-07-31 |
2023-02-14 |
Applied Materials, Inc. |
Low profile deposition ring for enhanced life
|
USD922589S1
(en)
|
2020-09-08 |
2021-06-15 |
Reza Jalinous |
Coil
|
USD989012S1
(en)
*
|
2020-09-17 |
2023-06-13 |
Ebara Corporation |
Elastic membrane
|
USD940765S1
(en)
|
2020-12-02 |
2022-01-11 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
USD1006768S1
(en)
*
|
2021-01-07 |
2023-12-05 |
Solaero Technologies Corp. |
Semiconductor wafer for mosaic solar cell fabrication
|
USD1007449S1
(en)
|
2021-05-07 |
2023-12-12 |
Applied Materials, Inc. |
Target profile for a physical vapor deposition chamber target
|
USD981459S1
(en)
*
|
2021-06-16 |
2023-03-21 |
Ebara Corporation |
Retaining ring for substrate
|