JP1545406S - - Google Patents
Info
- Publication number
- JP1545406S JP1545406S JPD2015-13299F JP2015013299F JP1545406S JP 1545406 S JP1545406 S JP 1545406S JP 2015013299 F JP2015013299 F JP 2015013299F JP 1545406 S JP1545406 S JP 1545406S
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-13299F JP1545406S (es) | 2015-06-16 | 2015-06-16 | |
| TW104306988F TWD176077S (zh) | 2015-06-16 | 2015-12-15 | 反射環構件 |
| US29/548,574 USD803917S1 (en) | 2015-06-16 | 2015-12-15 | Heat reflector for substrate processing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JPD2015-13299F JP1545406S (es) | 2015-06-16 | 2015-06-16 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP1545406S true JP1545406S (es) | 2016-03-14 |
Family
ID=55484211
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JPD2015-13299F Active JP1545406S (es) | 2015-06-16 | 2015-06-16 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | USD803917S1 (es) |
| JP (1) | JP1545406S (es) |
| TW (1) | TWD176077S (es) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10438795B2 (en) | 2015-06-22 | 2019-10-08 | Veeco Instruments, Inc. | Self-centering wafer carrier system for chemical vapor deposition |
| USD868993S1 (en) | 2017-08-31 | 2019-12-03 | Hitachi High-Technologies Corporation | Electrode plate for a plasma processing apparatus |
| USD870314S1 (en) | 2017-08-31 | 2019-12-17 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
| USD871609S1 (en) | 2017-08-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Electrode plate peripheral ring for a plasma processing apparatus |
| USD871608S1 (en) | 2017-07-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Gas ring for a plasma processing apparatus |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP1581911S (es) * | 2016-10-25 | 2017-07-24 | ||
| JP1584241S (es) * | 2017-01-31 | 2017-08-21 | ||
| JP1584906S (es) * | 2017-01-31 | 2017-08-28 | ||
| USD828088S1 (en) * | 2017-02-09 | 2018-09-11 | Sovaro Coolers, LLC | Tumbler rim |
| USD891923S1 (en) * | 2017-11-12 | 2020-08-04 | Yun Lin | Container lid |
| JP1659287S (es) * | 2019-10-18 | 2020-05-11 | ||
| USD974910S1 (en) * | 2020-02-04 | 2023-01-10 | Wilson Sporting Goods Co. | Tennis ball container overcap |
| USD943642S1 (en) * | 2020-02-29 | 2022-02-15 | Bmic Llc | Perforating apparatus |
| USD1042373S1 (en) | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Sliding ring for an interlocking process kit for a substrate processing chamber |
| USD1042374S1 (en) * | 2022-03-18 | 2024-09-17 | Applied Materials, Inc. | Support pipe for an interlocking process kit for a substrate processing chamber |
Family Cites Families (19)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US1798246A (en) * | 1930-09-19 | 1931-03-31 | Victor Mfg & Gasket Co | Gasket |
| US3414183A (en) * | 1966-08-24 | 1968-12-03 | Phillips Petroleum Co | Ring-a-rim closures |
| USD243664S (en) * | 1975-11-10 | 1977-03-15 | Hardinge Brothers, Inc. | Index ring for a machine tool |
| USD348836S (en) * | 1991-06-06 | 1994-07-19 | Armstrong Containers, Inc. | Transportation safety ring for cylindrical containers |
| US5533924A (en) * | 1994-09-01 | 1996-07-09 | Micron Technology, Inc. | Polishing apparatus, a polishing wafer carrier apparatus, a replacable component for a particular polishing apparatus and a process of polishing wafers |
| USD380527S (en) * | 1996-03-19 | 1997-07-01 | Cherle Velez | Sink drain shield |
| USD470050S1 (en) * | 2001-07-17 | 2003-02-11 | Playtex Products, Inc. | Converter ring |
| US7160493B2 (en) * | 2002-10-11 | 2007-01-09 | Semplastics, Llc | Retaining ring for use on a carrier of a polishing apparatus |
| USD525127S1 (en) * | 2004-03-01 | 2006-07-18 | Kraft Foods Holdings, Inc. | Susceptor ring |
| USD559994S1 (en) * | 2005-03-30 | 2008-01-15 | Tokyo Electron Limited | Cover ring |
| USD588078S1 (en) * | 2006-06-16 | 2009-03-10 | Tokyo Electron Limited | Heat dissipation deterrence link for semiconductor manufacture |
| USD684551S1 (en) * | 2011-07-07 | 2013-06-18 | Phuong Van Nguyen | Wafer polishing pad holder |
| USD709538S1 (en) * | 2011-09-30 | 2014-07-22 | Tokyo Electron Limited | Focusing ring |
| USD665491S1 (en) * | 2012-01-25 | 2012-08-14 | Applied Materials, Inc. | Deposition chamber cover ring |
| USD698939S1 (en) * | 2013-03-14 | 2014-02-04 | Charles River Laboratories, Inc. | Lid |
| USD730734S1 (en) * | 2013-07-10 | 2015-06-02 | Gino Rapparini | Reinforcement ring for beverage capsule |
| TWD169790S (zh) * | 2013-07-10 | 2015-08-11 | 日立國際電氣股份有限公司 | 基板處理裝置用氣化器之部分 |
| USD751398S1 (en) * | 2014-06-03 | 2016-03-15 | Tri State Distribution, Inc. | Scalloped pharmaceutical closure |
| JP1546800S (es) * | 2015-06-12 | 2016-03-28 |
-
2015
- 2015-06-16 JP JPD2015-13299F patent/JP1545406S/ja active Active
- 2015-12-15 TW TW104306988F patent/TWD176077S/zh unknown
- 2015-12-15 US US29/548,574 patent/USD803917S1/en active Active
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10438795B2 (en) | 2015-06-22 | 2019-10-08 | Veeco Instruments, Inc. | Self-centering wafer carrier system for chemical vapor deposition |
| USD871608S1 (en) | 2017-07-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Gas ring for a plasma processing apparatus |
| USD868993S1 (en) | 2017-08-31 | 2019-12-03 | Hitachi High-Technologies Corporation | Electrode plate for a plasma processing apparatus |
| USD870314S1 (en) | 2017-08-31 | 2019-12-17 | Hitachi High-Technologies Corporation | Electrode cover for a plasma processing apparatus |
| USD871609S1 (en) | 2017-08-31 | 2019-12-31 | Hitachi High-Technologies Corporation | Electrode plate peripheral ring for a plasma processing apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| USD803917S1 (en) | 2017-11-28 |
| TWD176077S (zh) | 2016-06-01 |