IT8683611A0 - Struttura npn equivalente con tensione di rottura maggiorata rispetto alla tensione di rottura intrinseca dell'npn. - Google Patents
Struttura npn equivalente con tensione di rottura maggiorata rispetto alla tensione di rottura intrinseca dell'npn.Info
- Publication number
- IT8683611A0 IT8683611A0 IT8683611A IT8361186A IT8683611A0 IT 8683611 A0 IT8683611 A0 IT 8683611A0 IT 8683611 A IT8683611 A IT 8683611A IT 8361186 A IT8361186 A IT 8361186A IT 8683611 A0 IT8683611 A0 IT 8683611A0
- Authority
- IT
- Italy
- Prior art keywords
- breakdown voltage
- npn
- equivalent
- intrinsic
- increased
- Prior art date
Links
- 230000015556 catabolic process Effects 0.000 title 2
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/0611—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region
- H01L27/0617—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type
- H01L27/0623—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having at least one potential-jump barrier or surface barrier; including integrated passive circuit elements with at least one potential-jump barrier or surface barrier the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration integrated circuits having a two-dimensional layout of components without a common active region comprising components of the field-effect type in combination with bipolar transistors
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT83611/86A IT1204244B (it) | 1986-03-21 | 1986-03-21 | Struttura npn equivalente con tensione di rottura maggiorata rispetto alla tensione di rottura intrinseca dell'npn |
US07/022,273 US4740821A (en) | 1986-03-21 | 1987-03-05 | NPN equivalent structure with breakdown voltage greater than the intrinsic breakdown voltage of NPN transistors |
FR878703928A FR2596202B1 (fr) | 1986-03-21 | 1987-03-20 | Structure de transistor npn equivalent a tension de claquage plus elevee que la tension de claquage intrinseque des transistors npn |
JP62067742A JPH0797553B2 (ja) | 1986-03-21 | 1987-03-20 | Npnトランジスタ−の固有降伏電圧より大きい降伏電圧を有するnpn等価構造 |
DE3709124A DE3709124C2 (de) | 1986-03-21 | 1987-03-20 | NPN-äquivalente Struktur mit erhöhter Durchschlagspannung |
NL8700663A NL8700663A (nl) | 1986-03-21 | 1987-03-20 | Npn equivalente structuur met een doorslagspanning groter dan de intrinsieke doorslagspanning van npntransistors. |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
IT83611/86A IT1204244B (it) | 1986-03-21 | 1986-03-21 | Struttura npn equivalente con tensione di rottura maggiorata rispetto alla tensione di rottura intrinseca dell'npn |
Publications (2)
Publication Number | Publication Date |
---|---|
IT8683611A0 true IT8683611A0 (it) | 1986-03-21 |
IT1204244B IT1204244B (it) | 1989-03-01 |
Family
ID=11323110
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT83611/86A IT1204244B (it) | 1986-03-21 | 1986-03-21 | Struttura npn equivalente con tensione di rottura maggiorata rispetto alla tensione di rottura intrinseca dell'npn |
Country Status (6)
Country | Link |
---|---|
US (1) | US4740821A (it) |
JP (1) | JPH0797553B2 (it) |
DE (1) | DE3709124C2 (it) |
FR (1) | FR2596202B1 (it) |
IT (1) | IT1204244B (it) |
NL (1) | NL8700663A (it) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
IT1232930B (it) * | 1987-10-30 | 1992-03-10 | Sgs Microelettronica Spa | Struttura integrata a componenti attivi e passivi inclusi in sacche di isolamento operante a tensione maggiore della tensione di rottura tra ciascun componente e la sacca che lo contiene |
US4939099A (en) * | 1988-06-21 | 1990-07-03 | Texas Instruments Incorporated | Process for fabricating isolated vertical bipolar and JFET transistors |
US4951115A (en) * | 1989-03-06 | 1990-08-21 | International Business Machines Corp. | Complementary transistor structure and method for manufacture |
EP0580254A3 (en) * | 1992-07-20 | 1996-01-03 | Philips Electronics Nv | Integrated semiconductor circuit |
US5610079A (en) * | 1995-06-19 | 1997-03-11 | Reliance Electric Industrial Company | Self-biased moat for parasitic current suppression in integrated circuits |
US6551869B1 (en) * | 2000-06-09 | 2003-04-22 | Motorola, Inc. | Lateral PNP and method of manufacture |
US7888768B2 (en) * | 2006-01-09 | 2011-02-15 | Fairchild Korea Semiconductor, Ltd. | Power integrated circuit device having embedded high-side power switch |
CN113823678A (zh) * | 2021-09-03 | 2021-12-21 | 无锡市晶源微电子有限公司 | 一种高压npn器件 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB1406391A (en) * | 1973-02-17 | 1975-09-17 | Ferranti Ltd | Inverter circuit arrangements |
US4095252A (en) * | 1976-12-27 | 1978-06-13 | National Semiconductor Corporation | Composite jfet-bipolar transistor structure |
JPS5585135A (en) * | 1978-12-21 | 1980-06-26 | Sony Corp | Mos-fet switching circuit |
US4395812A (en) * | 1980-02-04 | 1983-08-02 | Ibm Corporation | Forming an integrated circuit |
DE3029553A1 (de) * | 1980-08-04 | 1982-03-11 | Siemens AG, 1000 Berlin und 8000 München | Transistoranordnung mit hoher kollektor-emitter-durchbruchsspannung |
FR2523370B1 (fr) * | 1982-03-12 | 1985-12-13 | Thomson Csf | Transistor pnp fort courant faisant partie d'un circuit integre monolithique |
JPH0693626B2 (ja) * | 1983-07-25 | 1994-11-16 | 株式会社日立製作所 | 半導体集積回路装置 |
-
1986
- 1986-03-21 IT IT83611/86A patent/IT1204244B/it active
-
1987
- 1987-03-05 US US07/022,273 patent/US4740821A/en not_active Expired - Lifetime
- 1987-03-20 DE DE3709124A patent/DE3709124C2/de not_active Expired - Fee Related
- 1987-03-20 JP JP62067742A patent/JPH0797553B2/ja not_active Expired - Fee Related
- 1987-03-20 NL NL8700663A patent/NL8700663A/nl not_active Application Discontinuation
- 1987-03-20 FR FR878703928A patent/FR2596202B1/fr not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
FR2596202B1 (fr) | 1990-03-16 |
DE3709124A1 (de) | 1987-09-24 |
IT1204244B (it) | 1989-03-01 |
NL8700663A (nl) | 1987-10-16 |
DE3709124C2 (de) | 1995-10-26 |
US4740821A (en) | 1988-04-26 |
JPH0797553B2 (ja) | 1995-10-18 |
JPS62229967A (ja) | 1987-10-08 |
FR2596202A1 (fr) | 1987-09-25 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
TA | Fee payment date (situation as of event date), data collected since 19931001 |
Effective date: 19970329 |