IT1202764B - Processo di fabbricazione di circuiti semiconduttori integrati - Google Patents
Processo di fabbricazione di circuiti semiconduttori integratiInfo
- Publication number
- IT1202764B IT1202764B IT27014/78A IT2701478A IT1202764B IT 1202764 B IT1202764 B IT 1202764B IT 27014/78 A IT27014/78 A IT 27014/78A IT 2701478 A IT2701478 A IT 2701478A IT 1202764 B IT1202764 B IT 1202764B
- Authority
- IT
- Italy
- Prior art keywords
- manufacturing process
- integrated semiconductor
- semiconductor circuits
- circuits
- integrated
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2739502A DE2739502C3 (de) | 1977-09-02 | 1977-09-02 | Verfahren zur Belichtung durch Korpuskularstrahlen-Schattenwurf und Vorrichtung zur Durchführung des Verfahrens |
Publications (2)
Publication Number | Publication Date |
---|---|
IT7827014A0 IT7827014A0 (it) | 1978-08-25 |
IT1202764B true IT1202764B (it) | 1989-02-09 |
Family
ID=6017915
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT27014/78A IT1202764B (it) | 1977-09-02 | 1978-08-25 | Processo di fabbricazione di circuiti semiconduttori integrati |
Country Status (6)
Country | Link |
---|---|
US (1) | US4169230A (it) |
EP (1) | EP0001042B1 (it) |
JP (1) | JPS5441076A (it) |
AT (1) | AT376066B (it) |
DE (2) | DE2739502C3 (it) |
IT (1) | IT1202764B (it) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2837590A1 (de) * | 1978-08-29 | 1980-03-13 | Ibm Deutschland | Verfahren zur schattenwurfbelichtung |
DE2841124C2 (de) * | 1978-09-21 | 1984-09-13 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum Herstellen von elektronischen Halbleiterbauelementen durch Röntgen-Lithographie |
DE2966200D1 (en) * | 1978-10-30 | 1983-10-27 | Sanden Corp | Scroll-type fluid compressor units |
US4310743A (en) * | 1979-09-24 | 1982-01-12 | Hughes Aircraft Company | Ion beam lithography process and apparatus using step-and-repeat exposure |
DE2939044A1 (de) * | 1979-09-27 | 1981-04-09 | Ibm Deutschland Gmbh, 7000 Stuttgart | Einrichtung fuer elektronenstrahllithographie |
DE3067832D1 (en) * | 1980-07-10 | 1984-06-20 | Ibm | Process for compensating the proximity effect in electron beam projection devices |
US4504558A (en) * | 1980-07-10 | 1985-03-12 | International Business Machines Corporation | Method of compensating the proximity effect in electron beam projection systems |
DE3173277D1 (en) * | 1980-12-29 | 1986-01-30 | Fujitsu Ltd | Method of projecting circuit patterns |
DE3121666A1 (de) * | 1981-05-30 | 1982-12-16 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren und einrichtung zur gegenseitigen ausrichtung von objekten bei roentgenstrahl- und korpuskularstrahl-belichtungsvorgaengen |
JPS57211732A (en) * | 1981-06-24 | 1982-12-25 | Toshiba Corp | X ray exposing mask and manufacture thereof |
JPS5834918A (ja) * | 1981-08-26 | 1983-03-01 | Fujitsu Ltd | 電子ビ−ム露光方法 |
DE3410885A1 (de) * | 1984-03-24 | 1985-10-03 | Ibm Deutschland Gmbh, 7000 Stuttgart | Fehlerkorrigierte korpuskularstrahllithographie |
AT393925B (de) * | 1987-06-02 | 1992-01-10 | Ims Ionen Mikrofab Syst | Anordnung zur durchfuehrung eines verfahrens zum positionieren der abbildung der auf einer maske befindlichen struktur auf ein substrat, und verfahren zum ausrichten von auf einer maske angeordneten markierungen auf markierungen, die auf einem traeger angeordnet sind |
US4845370A (en) * | 1987-12-11 | 1989-07-04 | Radiation Dynamics, Inc. | Magnetic field former for charged particle beams |
EP0364929B1 (en) * | 1988-10-20 | 1995-09-06 | Fujitsu Limited | Fabrication method of semiconductor devices and transparent mask for charged particle beam |
JPH03270215A (ja) * | 1990-03-20 | 1991-12-02 | Fujitsu Ltd | 荷電粒子ビーム露光方法及び露光装置 |
JP2837515B2 (ja) * | 1990-06-20 | 1998-12-16 | 富士通株式会社 | 電子ビーム露光装置 |
DE19642116C2 (de) * | 1996-10-12 | 2000-12-07 | Fraunhofer Ges Forschung | Verfahren zur strukturierten Energieübertragung mit Elektronenstrahlen |
US5831272A (en) * | 1997-10-21 | 1998-11-03 | Utsumi; Takao | Low energy electron beam lithography |
JP2003045786A (ja) * | 2001-08-01 | 2003-02-14 | Seiko Instruments Inc | ステンシルマスクのレイアウト図形データ分割処理装置、ステンシルマスクのレイアウト図形データ分割処理方法、コンピュータにステンシルマスクのレイアウト図形データ分割処理を行わせるためのプログラム |
TWI229236B (en) * | 2001-11-12 | 2005-03-11 | Sony Corp | Complementary mask, fabrication method thereof, exposure method, semiconductor device, and fabrication method thereof |
TW584901B (en) * | 2001-11-30 | 2004-04-21 | Sony Corp | Exposure method of using complementary dividing moldboard mask |
DE10392343T5 (de) * | 2002-03-13 | 2005-03-10 | Sony Corp. | Maske, Herstellungsverfahren für Halbleitereinrichtung und Halbleitereinrichtung |
DE102007063649B4 (de) * | 2007-05-29 | 2018-08-02 | Advanced Mask Technology Center Gmbh & Co. Kg | Verfahren zum Erzeugen von Strukturen in einem Resistmaterial und Elektronenstrahlbelichtungsanlagen |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3326176A (en) * | 1964-10-27 | 1967-06-20 | Nat Res Corp | Work-registration device including ionic beam probe |
US3614423A (en) * | 1970-09-21 | 1971-10-19 | Stanford Research Inst | Charged particle pattern imaging and exposure system |
US3811069A (en) * | 1972-06-20 | 1974-05-14 | Westinghouse Electric Corp | Signal stabilization of an alignment detection device |
US3894271A (en) * | 1973-08-31 | 1975-07-08 | Ibm | Method and apparatus for aligning electron beams |
DE2460716C2 (de) * | 1974-12-19 | 1976-12-30 | Siemens Ag | Korpuskularstrahloptisches geraet zur korpuskelbestrahlung eines praeparats |
DE2547079C3 (de) * | 1975-10-17 | 1979-12-06 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Verfahren zur Korpuskularbestrahlung eines Präparats |
-
1977
- 1977-09-02 DE DE2739502A patent/DE2739502C3/de not_active Expired
-
1978
- 1978-05-08 US US05/904,069 patent/US4169230A/en not_active Expired - Lifetime
- 1978-06-19 AT AT0446878A patent/AT376066B/de not_active IP Right Cessation
- 1978-07-19 DE DE7878100442T patent/DE2860937D1/de not_active Expired
- 1978-07-19 EP EP78100442A patent/EP0001042B1/de not_active Expired
- 1978-07-25 JP JP9006278A patent/JPS5441076A/ja active Granted
- 1978-08-25 IT IT27014/78A patent/IT1202764B/it active
Also Published As
Publication number | Publication date |
---|---|
AT376066B (de) | 1984-10-10 |
ATA446878A (de) | 1984-02-15 |
DE2739502B2 (de) | 1979-09-06 |
DE2739502A1 (de) | 1979-03-08 |
JPS5441076A (en) | 1979-03-31 |
EP0001042B1 (de) | 1981-08-12 |
IT7827014A0 (it) | 1978-08-25 |
US4169230A (en) | 1979-09-25 |
DE2739502C3 (de) | 1980-07-03 |
DE2860937D1 (en) | 1981-11-12 |
EP0001042A1 (de) | 1979-03-21 |
JPS5416715B2 (it) | 1979-06-25 |
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