IT1081184B - Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen - Google Patents

Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen

Info

Publication number
IT1081184B
IT1081184B IT2616277A IT2616277A IT1081184B IT 1081184 B IT1081184 B IT 1081184B IT 2616277 A IT2616277 A IT 2616277A IT 2616277 A IT2616277 A IT 2616277A IT 1081184 B IT1081184 B IT 1081184B
Authority
IT
Italy
Prior art keywords
photomasker
ray
adjusting
disc substrate
substrate compared
Prior art date
Application number
IT2616277A
Other languages
English (en)
Italian (it)
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of IT1081184B publication Critical patent/IT1081184B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
IT2616277A 1976-08-05 1977-07-27 Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen IT1081184B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19762635275 DE2635275C2 (de) 1976-08-05 1976-08-05 Verfahren zur Justierung eines scheibenförmigen Substrates relativ zu einer Fotomaske in einem Röntgenstrahlbelichtungsgerät

Publications (1)

Publication Number Publication Date
IT1081184B true IT1081184B (it) 1985-05-16

Family

ID=5984815

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2616277A IT1081184B (it) 1976-08-05 1977-07-27 Dispositivo per aggiustare un substrato a disco rispetto ad una fotomaschera in un apparecchio di esposizione a raggirontgen

Country Status (7)

Country Link
JP (1) JPS5318970A (enExample)
BE (1) BE857539A (enExample)
DE (1) DE2635275C2 (enExample)
FR (1) FR2360916A1 (enExample)
GB (1) GB1589286A (enExample)
IT (1) IT1081184B (enExample)
NL (1) NL7708652A (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5655041A (en) * 1979-10-11 1981-05-15 Nippon Telegr & Teleph Corp <Ntt> Positioning exposure
JP7497649B2 (ja) * 2020-08-25 2024-06-11 セイコーエプソン株式会社 液体噴射装置、液体噴射装置のメンテナンス方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1804923A1 (de) * 1967-10-27 1969-07-31 Hilger & Watts Ltd Verfahren und Vorrichtung zur Reproduktion eines Musters von einem ebenen Koerper auf einen zweiten ebenen Koerper
US3745358A (en) * 1971-05-10 1973-07-10 Radiant Energy Systems Alignment method and apparatus for electron projection systems
US3743842A (en) * 1972-01-14 1973-07-03 Massachusetts Inst Technology Soft x-ray lithographic apparatus and process
US3742229A (en) * 1972-06-29 1973-06-26 Massachusetts Inst Technology Soft x-ray mask alignment system
DE2460914C2 (de) * 1974-12-21 1983-08-18 Ibm Deutschland Gmbh, 7000 Stuttgart Photolithographische Projektionsvorrichtung
US4085329A (en) * 1976-05-03 1978-04-18 Hughes Aircraft Company Hard X-ray and fluorescent X-ray detection of alignment marks for precision mask alignment

Also Published As

Publication number Publication date
DE2635275A1 (de) 1978-02-09
FR2360916B1 (enExample) 1982-05-21
NL7708652A (nl) 1978-02-07
FR2360916A1 (fr) 1978-03-03
JPS5318970A (en) 1978-02-21
DE2635275C2 (de) 1984-09-06
GB1589286A (en) 1981-05-07
BE857539A (fr) 1977-12-01

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