IT1032842B - Macchina da disegno particolarmente per maschere per circuiti integrati - Google Patents

Macchina da disegno particolarmente per maschere per circuiti integrati

Info

Publication number
IT1032842B
IT1032842B IT6818675A IT6818675A IT1032842B IT 1032842 B IT1032842 B IT 1032842B IT 6818675 A IT6818675 A IT 6818675A IT 6818675 A IT6818675 A IT 6818675A IT 1032842 B IT1032842 B IT 1032842B
Authority
IT
Italy
Prior art keywords
masks
integrated circuits
drawing machine
machine particularly
circuits
Prior art date
Application number
IT6818675A
Other languages
English (en)
Italian (it)
Inventor
P Tigreat
Original Assignee
Commissariat Energie Atomique
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat Energie Atomique filed Critical Commissariat Energie Atomique
Application granted granted Critical
Publication of IT1032842B publication Critical patent/IT1032842B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
IT6818675A 1974-05-10 1975-05-09 Macchina da disegno particolarmente per maschere per circuiti integrati IT1032842B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7416288A FR2270616B1 (enrdf_load_stackoverflow) 1974-05-10 1974-05-10

Publications (1)

Publication Number Publication Date
IT1032842B true IT1032842B (it) 1979-06-20

Family

ID=9138697

Family Applications (1)

Application Number Title Priority Date Filing Date
IT6818675A IT1032842B (it) 1974-05-10 1975-05-09 Macchina da disegno particolarmente per maschere per circuiti integrati

Country Status (7)

Country Link
JP (1) JPS50159677A (enrdf_load_stackoverflow)
BE (1) BE828336A (enrdf_load_stackoverflow)
DE (1) DE2520809A1 (enrdf_load_stackoverflow)
FR (1) FR2270616B1 (enrdf_load_stackoverflow)
GB (1) GB1489005A (enrdf_load_stackoverflow)
IT (1) IT1032842B (enrdf_load_stackoverflow)
NL (1) NL7505454A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS60173550A (ja) * 1984-02-20 1985-09-06 Canon Inc 半導体焼付装置
US5187519A (en) * 1990-10-05 1993-02-16 Canon Kabushiki Kaisha Exposure apparatus having mount means to suppress vibrations
JPH07105337B2 (ja) * 1994-04-22 1995-11-13 株式会社日立製作所 パターン刻印装置

Also Published As

Publication number Publication date
DE2520809A1 (de) 1975-11-20
GB1489005A (en) 1977-10-19
NL7505454A (nl) 1975-11-12
BE828336A (fr) 1975-08-18
FR2270616B1 (enrdf_load_stackoverflow) 1978-06-02
JPS50159677A (enrdf_load_stackoverflow) 1975-12-24
FR2270616A1 (enrdf_load_stackoverflow) 1975-12-05

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