IT1042658B - Procedimento per fabbricare circuiti elettrici integrati - Google Patents
Procedimento per fabbricare circuiti elettrici integratiInfo
- Publication number
- IT1042658B IT1042658B IT2737375A IT2737375A IT1042658B IT 1042658 B IT1042658 B IT 1042658B IT 2737375 A IT2737375 A IT 2737375A IT 2737375 A IT2737375 A IT 2737375A IT 1042658 B IT1042658 B IT 1042658B
- Authority
- IT
- Italy
- Prior art keywords
- procedure
- electric circuits
- integrated electric
- manufacturing integrated
- manufacturing
- Prior art date
Links
- 238000004519 manufacturing process Methods 0.000 title 1
- 238000000034 method Methods 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L23/00—Details of semiconductor or other solid state devices
- H01L23/28—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection
- H01L23/29—Encapsulations, e.g. encapsulating layers, coatings, e.g. for protection characterised by the material, e.g. carbon
- H01L23/291—Oxides or nitrides or carbides, e.g. ceramics, glass
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Electrodes Of Semiconductors (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Insulated Gate Type Field-Effect Transistor (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19742445594 DE2445594A1 (de) | 1974-09-24 | 1974-09-24 | Verfahren zur herstellung integrierter schaltungen |
Publications (1)
Publication Number | Publication Date |
---|---|
IT1042658B true IT1042658B (it) | 1980-01-30 |
Family
ID=5926596
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IT2737375A IT1042658B (it) | 1974-09-24 | 1975-09-18 | Procedimento per fabbricare circuiti elettrici integrati |
Country Status (5)
Country | Link |
---|---|
JP (1) | JPS5160175A (it) |
DE (1) | DE2445594A1 (it) |
FR (1) | FR2286504A1 (it) |
GB (1) | GB1514288A (it) |
IT (1) | IT1042658B (it) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE3218309A1 (de) * | 1982-05-14 | 1983-11-17 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum herstellen von integrierten mos-feldeffekttransistoren mit einer aus metallsiliziden bestehenden zusaetzlichen leiterbahnebene |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE2040180B2 (de) * | 1970-01-22 | 1977-08-25 | Intel Corp, Mountain View, Calif. (V.St.A.) | Verfahren zur verhinderung von mechanischen bruechen einer duennen, die oberflaeche eines halbleiterkoerpers ueberdeckende isolierschichten ueberziehenden elektrisch leitenden schicht |
US3833919A (en) * | 1972-10-12 | 1974-09-03 | Ncr | Multilevel conductor structure and method |
-
1974
- 1974-09-24 DE DE19742445594 patent/DE2445594A1/de active Pending
-
1975
- 1975-08-28 GB GB3546475A patent/GB1514288A/en not_active Expired
- 1975-09-18 IT IT2737375A patent/IT1042658B/it active
- 1975-09-22 FR FR7528930A patent/FR2286504A1/fr active Granted
- 1975-09-25 JP JP11592675A patent/JPS5160175A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2286504B1 (it) | 1978-04-07 |
DE2445594A1 (de) | 1976-04-08 |
GB1514288A (en) | 1978-06-14 |
JPS5160175A (ja) | 1976-05-25 |
FR2286504A1 (fr) | 1976-04-23 |
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