BE828336A - Machines a dessiner notamment pour masques de circuits integres - Google Patents

Machines a dessiner notamment pour masques de circuits integres

Info

Publication number
BE828336A
BE828336A BE155727A BE155727A BE828336A BE 828336 A BE828336 A BE 828336A BE 155727 A BE155727 A BE 155727A BE 155727 A BE155727 A BE 155727A BE 828336 A BE828336 A BE 828336A
Authority
BE
Belgium
Prior art keywords
masks
integrated circuits
drawing machines
machines especially
circuits
Prior art date
Application number
BE155727A
Other languages
English (en)
Inventor
P Tigreat
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of BE828336A publication Critical patent/BE828336A/fr

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
BE155727A 1974-05-10 1975-04-24 Machines a dessiner notamment pour masques de circuits integres BE828336A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7416288A FR2270616B1 (fr) 1974-05-10 1974-05-10

Publications (1)

Publication Number Publication Date
BE828336A true BE828336A (fr) 1975-08-18

Family

ID=9138697

Family Applications (1)

Application Number Title Priority Date Filing Date
BE155727A BE828336A (fr) 1974-05-10 1975-04-24 Machines a dessiner notamment pour masques de circuits integres

Country Status (7)

Country Link
JP (1) JPS50159677A (fr)
BE (1) BE828336A (fr)
DE (1) DE2520809A1 (fr)
FR (1) FR2270616B1 (fr)
GB (1) GB1489005A (fr)
IT (1) IT1032842B (fr)
NL (1) NL7505454A (fr)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS60173550A (ja) * 1984-02-20 1985-09-06 Canon Inc 半導体焼付装置
US5187519A (en) * 1990-10-05 1993-02-16 Canon Kabushiki Kaisha Exposure apparatus having mount means to suppress vibrations
JPH07105337B2 (ja) * 1994-04-22 1995-11-13 株式会社日立製作所 パターン刻印装置

Also Published As

Publication number Publication date
FR2270616B1 (fr) 1978-06-02
DE2520809A1 (de) 1975-11-20
JPS50159677A (fr) 1975-12-24
NL7505454A (nl) 1975-11-12
GB1489005A (en) 1977-10-19
IT1032842B (it) 1979-06-20
FR2270616A1 (fr) 1975-12-05

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Legal Events

Date Code Title Description
RE Patent lapsed

Owner name: COMMISSARIAT A L'ENERGIE ATOMIQUE SOC. POUR L'ET

Effective date: 19840424