FR2270616A1 - - Google Patents

Info

Publication number
FR2270616A1
FR2270616A1 FR7416288A FR7416288A FR2270616A1 FR 2270616 A1 FR2270616 A1 FR 2270616A1 FR 7416288 A FR7416288 A FR 7416288A FR 7416288 A FR7416288 A FR 7416288A FR 2270616 A1 FR2270616 A1 FR 2270616A1
Authority
FR
France
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
FR7416288A
Other languages
French (fr)
Other versions
FR2270616B1 (enrdf_load_stackoverflow
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Priority to FR7416288A priority Critical patent/FR2270616B1/fr
Priority to BE155727A priority patent/BE828336A/xx
Priority to GB1867575A priority patent/GB1489005A/en
Priority to JP50055365A priority patent/JPS50159677A/ja
Priority to NL7505454A priority patent/NL7505454A/xx
Priority to IT6818675A priority patent/IT1032842B/it
Priority to DE19752520809 priority patent/DE2520809A1/de
Publication of FR2270616A1 publication Critical patent/FR2270616A1/fr
Priority to US05/803,883 priority patent/US4110762A/en
Application granted granted Critical
Publication of FR2270616B1 publication Critical patent/FR2270616B1/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mounting And Adjusting Of Optical Elements (AREA)
FR7416288A 1974-05-10 1974-05-10 Expired FR2270616B1 (enrdf_load_stackoverflow)

Priority Applications (8)

Application Number Priority Date Filing Date Title
FR7416288A FR2270616B1 (enrdf_load_stackoverflow) 1974-05-10 1974-05-10
BE155727A BE828336A (fr) 1974-05-10 1975-04-24 Machines a dessiner notamment pour masques de circuits integres
GB1867575A GB1489005A (en) 1974-05-10 1975-05-05 Drawing machines
JP50055365A JPS50159677A (enrdf_load_stackoverflow) 1974-05-10 1975-05-08
NL7505454A NL7505454A (nl) 1974-05-10 1975-05-09 Toestel voor het aanbrengen van patronen op een fotogevoelige laag.
IT6818675A IT1032842B (it) 1974-05-10 1975-05-09 Macchina da disegno particolarmente per maschere per circuiti integrati
DE19752520809 DE2520809A1 (de) 1974-05-10 1975-05-09 Zeichengeraet
US05/803,883 US4110762A (en) 1974-05-10 1977-06-06 Drawing machines especially for integrated circuit masks

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7416288A FR2270616B1 (enrdf_load_stackoverflow) 1974-05-10 1974-05-10

Publications (2)

Publication Number Publication Date
FR2270616A1 true FR2270616A1 (enrdf_load_stackoverflow) 1975-12-05
FR2270616B1 FR2270616B1 (enrdf_load_stackoverflow) 1978-06-02

Family

ID=9138697

Family Applications (1)

Application Number Title Priority Date Filing Date
FR7416288A Expired FR2270616B1 (enrdf_load_stackoverflow) 1974-05-10 1974-05-10

Country Status (7)

Country Link
JP (1) JPS50159677A (enrdf_load_stackoverflow)
BE (1) BE828336A (enrdf_load_stackoverflow)
DE (1) DE2520809A1 (enrdf_load_stackoverflow)
FR (1) FR2270616B1 (enrdf_load_stackoverflow)
GB (1) GB1489005A (enrdf_load_stackoverflow)
IT (1) IT1032842B (enrdf_load_stackoverflow)
NL (1) NL7505454A (enrdf_load_stackoverflow)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS58108745A (ja) * 1981-12-23 1983-06-28 Canon Inc 転写装置
JPS60173550A (ja) * 1984-02-20 1985-09-06 Canon Inc 半導体焼付装置
US5187519A (en) * 1990-10-05 1993-02-16 Canon Kabushiki Kaisha Exposure apparatus having mount means to suppress vibrations
JPH07105337B2 (ja) * 1994-04-22 1995-11-13 株式会社日立製作所 パターン刻印装置

Also Published As

Publication number Publication date
DE2520809A1 (de) 1975-11-20
IT1032842B (it) 1979-06-20
GB1489005A (en) 1977-10-19
NL7505454A (nl) 1975-11-12
BE828336A (fr) 1975-08-18
FR2270616B1 (enrdf_load_stackoverflow) 1978-06-02
JPS50159677A (enrdf_load_stackoverflow) 1975-12-24

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Legal Events

Date Code Title Description
ST Notification of lapse