IT1016580B - Dispositivo per la deposizione di strati sottili sotto vuoto - Google Patents

Dispositivo per la deposizione di strati sottili sotto vuoto

Info

Publication number
IT1016580B
IT1016580B IT69227/74A IT6922774A IT1016580B IT 1016580 B IT1016580 B IT 1016580B IT 69227/74 A IT69227/74 A IT 69227/74A IT 6922774 A IT6922774 A IT 6922774A IT 1016580 B IT1016580 B IT 1016580B
Authority
IT
Italy
Prior art keywords
deposition
under vacuum
thin layers
layers under
thin
Prior art date
Application number
IT69227/74A
Other languages
English (en)
Italian (it)
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Application granted granted Critical
Publication of IT1016580B publication Critical patent/IT1016580B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
IT69227/74A 1973-07-13 1974-07-12 Dispositivo per la deposizione di strati sottili sotto vuoto IT1016580B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7325855A FR2236963B1 (xx) 1973-07-13 1973-07-13

Publications (1)

Publication Number Publication Date
IT1016580B true IT1016580B (it) 1977-06-20

Family

ID=9122584

Family Applications (1)

Application Number Title Priority Date Filing Date
IT69227/74A IT1016580B (it) 1973-07-13 1974-07-12 Dispositivo per la deposizione di strati sottili sotto vuoto

Country Status (9)

Country Link
US (1) US3886896A (xx)
JP (1) JPS5039288A (xx)
BE (1) BE816798A (xx)
CH (1) CH584294A5 (xx)
DE (1) DE2433382C2 (xx)
FR (1) FR2236963B1 (xx)
GB (1) GB1442515A (xx)
IT (1) IT1016580B (xx)
NL (1) NL7409415A (xx)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2290126A1 (fr) * 1974-10-31 1976-05-28 Anvar Perfectionnements apportes aux dispositifs d'excitation, par des ondes hf, d'une colonne de gaz enfermee dans une enveloppe
FR2456787A1 (fr) * 1979-05-18 1980-12-12 Thomson Csf Dispositif hyperfrequence pour le depot de films minces sur des solides
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS5863399A (ja) * 1981-10-14 1983-04-15 Nitto Boseki Co Ltd 新規なプラスミン測定用基質
US4466380A (en) * 1983-01-10 1984-08-21 Xerox Corporation Plasma deposition apparatus for photoconductive drums
US5216330A (en) * 1992-01-14 1993-06-01 Honeywell Inc. Ion beam gun
USRE40963E1 (en) * 1993-01-12 2009-11-10 Tokyo Electron Limited Method for plasma processing by shaping an induced electric field
US6136140A (en) * 1993-01-12 2000-10-24 Tokyo Electron Limited Plasma processing apparatus
KR100238627B1 (ko) * 1993-01-12 2000-01-15 히가시 데쓰로 플라즈마 처리장치
JP3553688B2 (ja) * 1995-05-10 2004-08-11 アネルバ株式会社 プラズマ処理装置及びプラズマ処理方法
US5630880A (en) * 1996-03-07 1997-05-20 Eastlund; Bernard J. Method and apparatus for a large volume plasma processor that can utilize any feedstock material
JP2004533390A (ja) 2001-04-12 2004-11-04 オムニガイド コミュニケーションズ インコーポレイテッド 高屈折率コントラストの光導波路および用途
WO2004049042A2 (en) * 2002-11-22 2004-06-10 Omniguide Communications Inc. Dielectric waveguide and method of making the same
CN101233598B (zh) * 2005-05-04 2013-05-01 奥尔利康贸易股份公司（特吕巴赫） 用于等离子体处理设备的等离子体增强器
JP4405973B2 (ja) * 2006-01-17 2010-01-27 キヤノンアネルバ株式会社 薄膜作製装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH417118A (de) * 1961-11-23 1966-07-15 Ciba Geigy Verfahren zur Herstellung von Tantal oder Niob durch Reduktion von Tantal- oder Niobpentachlorid im Wasserstoff-Plasmastrahl
US3264508A (en) * 1962-06-27 1966-08-02 Lai William Plasma torch
GB1160895A (en) * 1965-08-25 1969-08-06 Rank Xerox Ltd Coating Surfaces by Vapour Deposition
US3736175A (en) * 1972-06-02 1973-05-29 Du Pont Vacuum coating method

Also Published As

Publication number Publication date
FR2236963B1 (xx) 1977-02-18
FR2236963A1 (xx) 1975-02-07
GB1442515A (en) 1976-07-14
DE2433382A1 (de) 1975-01-30
CH584294A5 (xx) 1977-01-31
BE816798A (fr) 1974-12-27
NL7409415A (nl) 1975-01-15
US3886896A (en) 1975-06-03
DE2433382C2 (de) 1982-08-19
JPS5039288A (xx) 1975-04-11

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