IT1016580B - DEVICE FOR THE DEPOSITION OF THIN LAYERS UNDER VACUUM - Google Patents

DEVICE FOR THE DEPOSITION OF THIN LAYERS UNDER VACUUM

Info

Publication number
IT1016580B
IT1016580B IT69227/74A IT6922774A IT1016580B IT 1016580 B IT1016580 B IT 1016580B IT 69227/74 A IT69227/74 A IT 69227/74A IT 6922774 A IT6922774 A IT 6922774A IT 1016580 B IT1016580 B IT 1016580B
Authority
IT
Italy
Prior art keywords
deposition
under vacuum
thin layers
layers under
thin
Prior art date
Application number
IT69227/74A
Other languages
Italian (it)
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cit Alcatel filed Critical Cit Alcatel
Application granted granted Critical
Publication of IT1016580B publication Critical patent/IT1016580B/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
IT69227/74A 1973-07-13 1974-07-12 DEVICE FOR THE DEPOSITION OF THIN LAYERS UNDER VACUUM IT1016580B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7325855A FR2236963B1 (en) 1973-07-13 1973-07-13

Publications (1)

Publication Number Publication Date
IT1016580B true IT1016580B (en) 1977-06-20

Family

ID=9122584

Family Applications (1)

Application Number Title Priority Date Filing Date
IT69227/74A IT1016580B (en) 1973-07-13 1974-07-12 DEVICE FOR THE DEPOSITION OF THIN LAYERS UNDER VACUUM

Country Status (9)

Country Link
US (1) US3886896A (en)
JP (1) JPS5039288A (en)
BE (1) BE816798A (en)
CH (1) CH584294A5 (en)
DE (1) DE2433382C2 (en)
FR (1) FR2236963B1 (en)
GB (1) GB1442515A (en)
IT (1) IT1016580B (en)
NL (1) NL7409415A (en)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2290126A1 (en) * 1974-10-31 1976-05-28 Anvar IMPROVEMENTS TO EXCITATION DEVICES, BY HF WAVES, OF A GAS COLUMN ENCLOSED IN A ENCLOSURE
FR2456787A1 (en) * 1979-05-18 1980-12-12 Thomson Csf MICROWAVE DEVICE FOR DEPOSITING THIN FILMS ON SOLIDS
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
JPS5863399A (en) * 1981-10-14 1983-04-15 Nitto Boseki Co Ltd Novel substrate for measuring plasmin
US4466380A (en) * 1983-01-10 1984-08-21 Xerox Corporation Plasma deposition apparatus for photoconductive drums
US5216330A (en) * 1992-01-14 1993-06-01 Honeywell Inc. Ion beam gun
USRE40963E1 (en) * 1993-01-12 2009-11-10 Tokyo Electron Limited Method for plasma processing by shaping an induced electric field
KR100238627B1 (en) 1993-01-12 2000-01-15 히가시 데쓰로 Plasma processing apparatus
US6136140A (en) * 1993-01-12 2000-10-24 Tokyo Electron Limited Plasma processing apparatus
JP3553688B2 (en) * 1995-05-10 2004-08-11 アネルバ株式会社 Plasma processing apparatus and plasma processing method
US5630880A (en) * 1996-03-07 1997-05-20 Eastlund; Bernard J. Method and apparatus for a large volume plasma processor that can utilize any feedstock material
US7142756B2 (en) 2001-04-12 2006-11-28 Omniguide, Inc. High index-contrast fiber waveguides and applications
AU2003295929A1 (en) * 2002-11-22 2004-06-18 Omniguide, Inc. Dielectric waveguide and method of making the same
CN101233598B (en) * 2005-05-04 2013-05-01 奥尔利康贸易股份公司（特吕巴赫） Plasma amplifier for plasma treatment plant
JP4405973B2 (en) * 2006-01-17 2010-01-27 キヤノンアネルバ株式会社 Thin film production equipment

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CH417118A (en) * 1961-11-23 1966-07-15 Ciba Geigy Process for the production of tantalum or niobium by reducing tantalum or niobium pentachloride in a hydrogen plasma jet
US3264508A (en) * 1962-06-27 1966-08-02 Lai William Plasma torch
GB1160895A (en) * 1965-08-25 1969-08-06 Rank Xerox Ltd Coating Surfaces by Vapour Deposition
US3736175A (en) * 1972-06-02 1973-05-29 Du Pont Vacuum coating method

Also Published As

Publication number Publication date
JPS5039288A (en) 1975-04-11
NL7409415A (en) 1975-01-15
CH584294A5 (en) 1977-01-31
GB1442515A (en) 1976-07-14
BE816798A (en) 1974-12-27
FR2236963A1 (en) 1975-02-07
US3886896A (en) 1975-06-03
FR2236963B1 (en) 1977-02-18
DE2433382A1 (en) 1975-01-30
DE2433382C2 (en) 1982-08-19

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