IT1007402B - Dispositivo per fabbricare strati sottili di sostanze inorganiche - Google Patents

Dispositivo per fabbricare strati sottili di sostanze inorganiche

Info

Publication number
IT1007402B
IT1007402B IT20536/74A IT2053674A IT1007402B IT 1007402 B IT1007402 B IT 1007402B IT 20536/74 A IT20536/74 A IT 20536/74A IT 2053674 A IT2053674 A IT 2053674A IT 1007402 B IT1007402 B IT 1007402B
Authority
IT
Italy
Prior art keywords
thin layers
inorganic substances
manufacturing thin
manufacturing
substances
Prior art date
Application number
IT20536/74A
Other languages
English (en)
Original Assignee
Cit Alcatel
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from BE129306A external-priority patent/BE797385R/xx
Application filed by Cit Alcatel filed Critical Cit Alcatel
Application granted granted Critical
Publication of IT1007402B publication Critical patent/IT1007402B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
IT20536/74A 1973-03-27 1974-04-08 Dispositivo per fabbricare strati sottili di sostanze inorganiche IT1007402B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE129306A BE797385R (en) 1971-04-27 1973-03-27 Thin mineral film deposition appts - using plasma excited by rf induction

Publications (1)

Publication Number Publication Date
IT1007402B true IT1007402B (it) 1976-10-30

Family

ID=3841811

Family Applications (1)

Application Number Title Priority Date Filing Date
IT20536/74A IT1007402B (it) 1973-03-27 1974-04-08 Dispositivo per fabbricare strati sottili di sostanze inorganiche

Country Status (7)

Country Link
US (1) US3922214A (it)
JP (1) JPS5026778A (it)
CH (1) CH581198A5 (it)
DE (1) DE2412928A1 (it)
GB (2) GB1356769A (it)
IT (1) IT1007402B (it)
NL (1) NL178700C (it)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2324755A1 (fr) * 1975-09-19 1977-04-15 Anvar Dispositif de pulverisation cathodique de grande vitesse de depot
JPS5435178A (en) * 1977-08-23 1979-03-15 Matsushita Electric Ind Co Ltd Ultrafine particle depositing apparatus
DE2849240C2 (de) * 1978-11-13 1983-01-13 Siemens Ag, 1000 Berlin Und 8000 Muenchen CVD-Beschichtungsvorrichtung für Kleinteile und ihre Verwendung
DE2941908C2 (de) * 1979-10-17 1986-07-03 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum Herstellen einer eine Silizium-Schicht aufweisenden Solarzelle
FR2480552A1 (fr) * 1980-04-10 1981-10-16 Anvar Generateur de plasmaŸ
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
DE3117070A1 (de) * 1981-04-29 1982-11-18 Licentia Patent-Verwaltungs-Gmbh, 6000 Frankfurt Verfahren zum herstellen einer halbleiter-schicht-solarzelle
US4929322A (en) * 1985-09-30 1990-05-29 Union Carbide Corporation Apparatus and process for arc vapor depositing a coating in an evacuated chamber
US4839245A (en) * 1985-09-30 1989-06-13 Union Carbide Corporation Zirconium nitride coated article and method for making same
US4895765A (en) * 1985-09-30 1990-01-23 Union Carbide Corporation Titanium nitride and zirconium nitride coating compositions, coated articles and methods of manufacture
US5037522B1 (en) * 1990-07-24 1996-07-02 Vergason Technology Inc Electric arc vapor deposition device
CA2065581C (en) 1991-04-22 2002-03-12 Andal Corp. Plasma enhancement apparatus and method for physical vapor deposition
DE19635669C1 (de) * 1996-09-03 1997-07-24 Fraunhofer Ges Forschung Verfahren und Vorrichtung zur Beschichtung von Substraten mittels Gasflußsputtern
DE59702419D1 (de) * 1997-07-15 2000-11-09 Unaxis Trading Ag Truebbach Verfahren und Vorrichtung zur Sputterbeschichtung
IT1310029B1 (it) 1999-02-26 2002-02-05 Ist Naz Fisica Della Materia Vaporizzatore a microplasma pulsato.
US20120048723A1 (en) * 2010-08-24 2012-03-01 Varian Semiconductor Equipment Associates, Inc. Sputter target feed system
KR101822988B1 (ko) 2013-10-30 2018-01-29 도요타 지도샤（주） 차량 및 그 제조 방법
JP6124020B2 (ja) 2014-08-29 2017-05-10 トヨタ自動車株式会社 車両用帯電電荷低減装置
JP6128093B2 (ja) 2014-10-16 2017-05-17 トヨタ自動車株式会社 車両の吸気装置
JP6160603B2 (ja) 2014-12-19 2017-07-12 トヨタ自動車株式会社 車両の冷却装置
JP6201980B2 (ja) 2014-12-25 2017-09-27 トヨタ自動車株式会社 車両の吸気装置
JP6115559B2 (ja) 2014-12-26 2017-04-19 トヨタ自動車株式会社 車両の排気装置
JP6183383B2 (ja) 2015-01-13 2017-08-23 トヨタ自動車株式会社 車両
JP6365316B2 (ja) 2015-01-19 2018-08-01 トヨタ自動車株式会社 車両の潤滑油又は燃料の供給装置
EP3048017B1 (en) 2015-01-23 2017-11-08 Toyota Jidosha Kabushiki Kaisha Damping force generation device for vehicle
JP6281501B2 (ja) 2015-01-29 2018-02-21 トヨタ自動車株式会社 車両の車輪支持装置
JP6248962B2 (ja) 2015-02-10 2017-12-20 トヨタ自動車株式会社 車両の制動力発生装置
WO2019050483A1 (en) * 2017-09-11 2019-03-14 Agency For Science, Technology And Research SPRAY SYSTEM AND METHOD

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3408283A (en) * 1966-09-15 1968-10-29 Kennecott Copper Corp High current duoplasmatron having an apertured anode positioned in the low pressure region
US3625848A (en) * 1968-12-26 1971-12-07 Alvin A Snaper Arc deposition process and apparatus
BE766345A (fr) * 1971-04-27 1971-09-16 Universitaire De L Etat A Mons Dispositif pour fabriquer des couches minces de substances minerales.

Also Published As

Publication number Publication date
GB1356769A (en) 1974-06-12
GB1419239A (en) 1975-12-24
JPS5026778A (it) 1975-03-19
DE2412928A1 (de) 1974-10-03
NL178700C (nl) 1986-05-01
US3922214A (en) 1975-11-25
NL7404173A (it) 1974-10-01
NL178700B (nl) 1985-12-02
CH581198A5 (it) 1976-10-29

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