BE766345A - Dispositif pour fabriquer des couches minces de substances minerales. - Google Patents

Dispositif pour fabriquer des couches minces de substances minerales.

Info

Publication number
BE766345A
BE766345A BE766345A BE766345A BE766345A BE 766345 A BE766345 A BE 766345A BE 766345 A BE766345 A BE 766345A BE 766345 A BE766345 A BE 766345A BE 766345 A BE766345 A BE 766345A
Authority
BE
Belgium
Prior art keywords
thin layers
mineral substances
manufacturing thin
manufacturing
mineral
Prior art date
Application number
BE766345A
Other languages
English (en)
Original Assignee
Universitaire De L Etat A Mons
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Universitaire De L Etat A Mons filed Critical Universitaire De L Etat A Mons
Publication of BE766345A publication Critical patent/BE766345A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/228—Gas flow assisted PVD deposition
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3471—Introduction of auxiliary energy into the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411—Constructional aspects of the reactor
    • H01J37/3414—Targets
    • H01J37/342—Hollow targets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Physical Vapour Deposition (AREA)
BE766345A 1971-04-27 1971-04-27 Dispositif pour fabriquer des couches minces de substances minerales. BE766345A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE102716 1971-04-27

Publications (1)

Publication Number Publication Date
BE766345A true BE766345A (fr) 1971-09-16

Family

ID=3841508

Family Applications (1)

Application Number Title Priority Date Filing Date
BE766345A BE766345A (fr) 1971-04-27 1971-04-27 Dispositif pour fabriquer des couches minces de substances minerales.

Country Status (8)

Country Link
US (1) US3801355A (fr)
JP (1) JPS5511744B1 (fr)
BE (1) BE766345A (fr)
CH (1) CH561286A5 (fr)
DE (1) DE2220086C3 (fr)
FR (1) FR2134336B1 (fr)
IT (1) IT965683B (fr)
NL (1) NL7205566A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1356769A (en) * 1973-03-27 1974-06-12 Cit Alcatel Apparatus and method for depositing thin layers on a substrate
FR2245779B1 (fr) * 1973-09-28 1978-02-10 Cit Alcatel
DE2830134C2 (de) 1978-07-08 1983-12-08 Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle Verfahren zum Ablagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück
DE2857102C2 (de) * 1978-07-08 1983-12-01 Wolfgang Ing.(grad.) 7981 Grünkraut Kieferle Vorrichtung zum Eindiffundieren und Auflagern einer Metall- oder Legierungsschicht auf ein elektrisch leitendes Werkstück
US4268711A (en) * 1979-04-26 1981-05-19 Optical Coating Laboratory, Inc. Method and apparatus for forming films from vapors using a contained plasma source
GB2085482B (en) * 1980-10-06 1985-03-06 Optical Coating Laboratory Inc Forming thin film oxide layers using reactive evaporation techniques
US4687560A (en) * 1985-08-16 1987-08-18 The United States Of America As Represented By The United States Department Of Energy Method of synthesizing a plurality of reactants and producing thin films of electro-optically active transition metal oxides
US4915906A (en) * 1988-06-17 1990-04-10 Canadian Patents And Development Limited/Societie Canadienne Des Brevets Et D'exploitation Limitee Novel zinc-based alloys, preparation and use thereof for producing thermal-sprayed coatings having improved corrosion resistance and adherence
US6015595A (en) * 1998-05-28 2000-01-18 Felts; John T. Multiple source deposition plasma apparatus
JP2004533390A (ja) 2001-04-12 2004-11-04 オムニガイド コミュニケーションズ インコーポレイテッド 高屈折率コントラストの光導波路および用途
WO2004049042A2 (fr) * 2002-11-22 2004-06-10 Omniguide Communications Inc. Guide d'ondes dielectrique et son procede de production
CA2658210A1 (fr) * 2008-04-04 2009-10-04 Sulzer Metco Ag Methode et dispositif permettant de revetir et de traiter la surface des substrats au moyen d'un faisceau plasma

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1065108A (en) * 1964-04-09 1967-04-12 Western Electric Co Production of oxide films on solid substrates
NL130959C (fr) * 1965-12-17
DE1905058C3 (de) * 1969-02-01 1973-10-04 Leybold-Heraeus Gmbh & Co, Kg, 5000 Koeln-Bayental Vorrichtung für die Beschichtung von Werkstücken durch Hochfrequenz-Plasmazerstäubung von Werkstoffen im Vakuum

Also Published As

Publication number Publication date
DE2220086B2 (de) 1981-07-23
FR2134336A1 (fr) 1972-12-08
DE2220086A1 (de) 1972-11-16
FR2134336B1 (fr) 1974-05-10
US3801355A (en) 1974-04-02
DE2220086C3 (de) 1982-05-06
JPS5511744B1 (fr) 1980-03-27
IT965683B (it) 1974-02-11
CH561286A5 (fr) 1975-04-30
NL7205566A (fr) 1972-10-31

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