IN2015DN03283A - - Google Patents

Download PDF

Info

Publication number
IN2015DN03283A
IN2015DN03283A IN3283DEN2015A IN2015DN03283A IN 2015DN03283 A IN2015DN03283 A IN 2015DN03283A IN 3283DEN2015 A IN3283DEN2015 A IN 3283DEN2015A IN 2015DN03283 A IN2015DN03283 A IN 2015DN03283A
Authority
IN
India
Prior art keywords
heat sink
metal layer
copper
layer
intermetallic compound
Prior art date
Application number
Other languages
English (en)
Inventor
Nobuyuki Terasaki
Yoshiyuki Nagatomo
Yoshirou Kuromitsu
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Publication of IN2015DN03283A publication Critical patent/IN2015DN03283A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/36—Selection of materials, or shaping, to facilitate cooling or heating, e.g. heatsinks
    • H01L23/373—Cooling facilitated by selection of materials for the device or materials for thermal expansion adaptation, e.g. carbon
    • H01L23/3735—Laminates or multilayers, e.g. direct bond copper ceramic substrates
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K7/00—Constructional details common to different types of electric apparatus
    • H05K7/20—Modifications to facilitate cooling, ventilating, or heating
    • H05K7/2089—Modifications to facilitate cooling, ventilating, or heating for power electronics, e.g. for inverters for controlling motor
    • H05K7/209—Heat transfer by conduction from internal heat source to heat radiating structure
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/64—Burning or sintering processes
    • C04B35/645—Pressure sintering
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/021—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles in a direct manner, e.g. direct copper bonding [DCB]
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B37/00—Joining burned ceramic articles with other burned ceramic articles or other articles by heating
    • C04B37/02—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles
    • C04B37/023—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used
    • C04B37/026—Joining burned ceramic articles with other burned ceramic articles or other articles by heating with metallic articles characterised by the interlayer used consisting of metals or metal salts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/48—Manufacture or treatment of parts, e.g. containers, prior to assembly of the devices, using processes not provided for in a single one of the subgroups H01L21/06 - H01L21/326
    • H01L21/4814—Conductive parts
    • H01L21/4871—Bases, plates or heatsinks
    • H01L21/4882—Assembly of heatsink parts
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00—Details of semiconductor or other solid state devices
    • H01L23/34—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements
    • H01L23/46—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids
    • H01L23/473—Arrangements for cooling, heating, ventilating or temperature compensation ; Temperature sensing arrangements involving the transfer of heat by flowing fluids by flowing liquids
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/12—Metallic interlayers
    • C04B2237/121—Metallic interlayers based on aluminium
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/02—Aspects relating to interlayers, e.g. used to join ceramic articles with other articles by heating
    • C04B2237/12—Metallic interlayers
    • C04B2237/126—Metallic interlayers wherein the active component for bonding is not the largest fraction of the interlayer
    • C04B2237/128—The active component for bonding being silicon
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/34—Oxidic
    • C04B2237/343—Alumina or aluminates
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/36—Non-oxidic
    • C04B2237/366—Aluminium nitride
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/32—Ceramic
    • C04B2237/36—Non-oxidic
    • C04B2237/368—Silicon nitride
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/40—Metallic
    • C04B2237/402—Aluminium
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/30—Composition of layers of ceramic laminates or of ceramic or metallic articles to be joined by heating, e.g. Si substrates
    • C04B2237/40—Metallic
    • C04B2237/407—Copper
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/70—Forming laminates or joined articles comprising layers of a specific, unusual thickness
    • C04B2237/704—Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the ceramic layers or articles
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/70—Forming laminates or joined articles comprising layers of a specific, unusual thickness
    • C04B2237/706—Forming laminates or joined articles comprising layers of a specific, unusual thickness of one or more of the metallic layers or articles
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B2237/00—Aspects relating to ceramic laminates or to joining of ceramic articles with other articles by heating
    • C04B2237/50—Processing aspects relating to ceramic laminates or to the joining of ceramic articles with other articles by heating
    • C04B2237/86—Joining of two substrates at their largest surfaces, one surface being complete joined and covered, the other surface not, e.g. a small plate joined at it's largest surface on top of a larger plate
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L2224/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H01L2224/29001—Core members of the layer connector
    • H01L2224/29099—Material
    • H01L2224/291—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/29101—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of less than 400°C
    • H01L2224/29111—Tin [Sn] as principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321—Disposition
    • H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/32227—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation the layer connector connecting to a bond pad of the item
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/83—Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a layer connector
    • H01L2224/8338—Bonding interfaces outside the semiconductor or solid-state body
    • H01L2224/83399—Material
    • H01L2224/834—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof
    • H01L2224/83417—Material with a principal constituent of the material being a metal or a metalloid, e.g. boron [B], silicon [Si], germanium [Ge], arsenic [As], antimony [Sb], tellurium [Te] and polonium [Po], and alloys thereof the principal constituent melting at a temperature of greater than or equal to 400°C and less than 950°C
    • H01L2224/83424—Aluminium [Al] as principal constituent
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
    • H01L24/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/31—Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L24/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/10—Details of semiconductor or other solid state devices to be connected
    • H01L2924/11—Device type
    • H01L2924/13—Discrete devices, e.g. 3 terminal devices
    • H01L2924/1304—Transistor
    • H01L2924/1305—Bipolar Junction Transistor [BJT]
    • H01L2924/13055—Insulated gate bipolar transistor [IGBT]

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Power Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Structural Engineering (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Thermal Sciences (AREA)
  • Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
  • Pressure Welding/Diffusion-Bonding (AREA)
IN3283DEN2015 2012-10-16 2013-10-11 IN2015DN03283A (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012228870 2012-10-16
PCT/JP2013/077766 WO2014061588A1 (ja) 2012-10-16 2013-10-11 ヒートシンク付パワーモジュール用基板、ヒートシンク付パワーモジュール、及びヒートシンク付パワーモジュール用基板の製造方法

Publications (1)

Publication Number Publication Date
IN2015DN03283A true IN2015DN03283A (es) 2015-10-09

Family

ID=50488154

Family Applications (1)

Application Number Title Priority Date Filing Date
IN3283DEN2015 IN2015DN03283A (es) 2012-10-16 2013-10-11

Country Status (8)

Country Link
US (1) US9968012B2 (es)
EP (1) EP2911192B1 (es)
JP (1) JP5614485B2 (es)
KR (1) KR102146589B1 (es)
CN (1) CN104718616B (es)
IN (1) IN2015DN03283A (es)
TW (1) TWI600126B (es)
WO (1) WO2014061588A1 (es)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5542765B2 (ja) * 2011-09-26 2014-07-09 日立オートモティブシステムズ株式会社 パワーモジュール
JP6111764B2 (ja) * 2013-03-18 2017-04-12 三菱マテリアル株式会社 パワーモジュール用基板の製造方法
JP5672324B2 (ja) 2013-03-18 2015-02-18 三菱マテリアル株式会社 接合体の製造方法及びパワーモジュール用基板の製造方法
DE112015003487T5 (de) * 2014-07-29 2017-05-11 Denka Company Limited Keramische Leiterplatte und Verfahren zur Herstellung der selben
JP6432208B2 (ja) * 2014-08-18 2018-12-05 三菱マテリアル株式会社 パワーモジュール用基板の製造方法、及び、ヒートシンク付パワーモジュール用基板の製造方法
JP6432466B2 (ja) 2014-08-26 2018-12-05 三菱マテリアル株式会社 接合体、ヒートシンク付パワーモジュール用基板、ヒートシンク、接合体の製造方法、ヒートシンク付パワーモジュール用基板の製造方法、及び、ヒートシンクの製造方法
JP6332108B2 (ja) 2015-03-30 2018-05-30 三菱マテリアル株式会社 ヒートシンク付パワーモジュール用基板の製造方法
JP6696214B2 (ja) 2015-04-16 2020-05-20 三菱マテリアル株式会社 接合体、ヒートシンク付パワーモジュール用基板、ヒートシンク、及び、接合体の製造方法、ヒートシンク付パワーモジュール用基板の製造方法、ヒートシンクの製造方法
WO2016167217A1 (ja) * 2015-04-16 2016-10-20 三菱マテリアル株式会社 接合体、ヒートシンク付パワーモジュール用基板、ヒートシンク、及び、接合体の製造方法、ヒートシンク付パワーモジュール用基板の製造方法、ヒートシンクの製造方法
JP6696215B2 (ja) * 2015-04-16 2020-05-20 三菱マテリアル株式会社 接合体、ヒートシンク付パワーモジュール用基板、ヒートシンク、及び、接合体の製造方法、ヒートシンク付パワーモジュール用基板の製造方法、ヒートシンクの製造方法
US10497585B2 (en) 2015-04-16 2019-12-03 Mitsubishi Materials Corporation Bonded body, substrate for power module with heat sink, heat sink, method for producing bonded body, method for producing substrate for power module with heat sink, and method for producing heat sink
CN105081500B (zh) * 2015-09-02 2017-02-22 哈尔滨工业大学 一种使用激光前向转印具有特定晶粒取向和数量薄膜诱发金属间化合物生长的方法
JP2017063127A (ja) * 2015-09-25 2017-03-30 三菱マテリアル株式会社 発光モジュール用基板、発光モジュール、冷却器付き発光モジュール用基板、および発光モジュール用基板の製造方法
JP6638282B2 (ja) * 2015-09-25 2020-01-29 三菱マテリアル株式会社 冷却器付き発光モジュールおよび冷却器付き発光モジュールの製造方法
DE112017002999B4 (de) * 2016-06-16 2022-03-24 Mitsubishi Electric Corporation Halbleiter-montage-wärmeabführungs-basisplatte und herstellungsverfahren für dieselbe
JPWO2018154870A1 (ja) * 2017-02-27 2019-02-28 三菱電機株式会社 金属接合方法、半導体装置の製造方法、及び半導体装置
JP6776953B2 (ja) * 2017-03-07 2020-10-28 三菱マテリアル株式会社 ヒートシンク付パワーモジュール用基板
JP6717245B2 (ja) 2017-03-17 2020-07-01 三菱マテリアル株式会社 接合体の製造方法、絶縁回路基板の製造方法、及び、ヒートシンク付き絶縁回路基板の製造方法
JP6790945B2 (ja) * 2017-03-17 2020-11-25 三菱マテリアル株式会社 絶縁回路基板の製造方法、及び、ヒートシンク付き絶縁回路基板の製造方法
CN115295523A (zh) * 2017-03-30 2022-11-04 株式会社东芝 陶瓷铜电路基板及使用了其的半导体装置
WO2018181236A1 (ja) * 2017-03-31 2018-10-04 パナソニックＩｐマネジメント株式会社 半導体装置及びその製造方法
JP7135716B2 (ja) 2017-10-27 2022-09-13 三菱マテリアル株式会社 接合体、ヒートシンク付絶縁回路基板、及び、ヒートシンク
WO2019082973A1 (ja) 2017-10-27 2019-05-02 三菱マテリアル株式会社 接合体、ヒートシンク付絶縁回路基板、及び、ヒートシンク
EP3754701B1 (en) * 2018-02-13 2022-06-08 Mitsubishi Materials Corporation Copper/titanium/aluminum joint, insulating circuit board, insulating circuit board with heat sink, power module, led module, and thermoelectric module
JP7060084B2 (ja) * 2018-03-26 2022-04-26 三菱マテリアル株式会社 絶縁回路基板用接合体の製造方法および絶縁回路基板用接合体
KR20200138302A (ko) * 2018-03-28 2020-12-09 미쓰비시 마테리알 가부시키가이샤 히트 싱크가 부착된 절연 회로 기판
JP7167642B2 (ja) 2018-11-08 2022-11-09 三菱マテリアル株式会社 接合体、ヒートシンク付絶縁回路基板、及び、ヒートシンク
WO2020111107A1 (ja) 2018-11-28 2020-06-04 三菱マテリアル株式会社 接合体、ヒートシンク付絶縁回路基板、及び、ヒートシンク
DE102019126954A1 (de) * 2019-10-08 2021-04-08 Rogers Germany Gmbh Verfahren zur Herstellung eines Metall-Keramik-Substrats, Lötsystem und Metall-Keramik-Substrat, hergestellt mit einem solchen Verfahren
US11828546B2 (en) * 2019-11-21 2023-11-28 Heraeus Deutschland GmbH & Co. KG Heat exchange compound module
JP7470181B2 (ja) * 2020-03-18 2024-04-17 株式会社東芝 接合体、セラミックス銅回路基板、接合体の製造方法、およびセラミックス銅回路基板の製造方法
US11825628B2 (en) * 2020-08-19 2023-11-21 Baidu Usa Llc Hybrid cooling system for electronic racks
US20230130677A1 (en) * 2021-10-21 2023-04-27 Amulaire Thermal Technology, Inc. Heat-dissipation substrate having gradient sputtered structure

Family Cites Families (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04315524A (ja) 1991-04-10 1992-11-06 Kobe Steel Ltd 銅材とアルミニウム材との接合用部材及びその製造方法
JP3240211B2 (ja) 1993-04-12 2001-12-17 旭化成株式会社 銅−アルミニウム異種金属継手材
TW252061B (en) 1994-07-20 1995-07-21 Dong-Hann Chang Process of undergoing diffusion bonding under low pressure
JPH08255973A (ja) * 1995-03-17 1996-10-01 Toshiba Corp セラミックス回路基板
US6033787A (en) * 1996-08-22 2000-03-07 Mitsubishi Materials Corporation Ceramic circuit board with heat sink
US6124635A (en) * 1997-03-21 2000-09-26 Honda Giken Kogyo Kabushiki Kaisha Functionally gradient integrated metal-ceramic member and semiconductor circuit substrate application thereof
JPH11156995A (ja) 1997-09-25 1999-06-15 Daido Steel Co Ltd クラッド板とこれを用いた電池用ケース並びにこれらの製造方法
JP3752830B2 (ja) 1998-03-31 2006-03-08 マツダ株式会社 接合金属部材及び該部材の接合方法
JP2001148451A (ja) * 1999-03-24 2001-05-29 Mitsubishi Materials Corp パワーモジュール用基板
JP2001252772A (ja) 2000-03-10 2001-09-18 Showa Denko Kk アルミニウム−銅クラッド材およびその製造方法
JP2002064169A (ja) * 2000-08-21 2002-02-28 Denki Kagaku Kogyo Kk 放熱構造体
JP2002203942A (ja) * 2000-12-28 2002-07-19 Fuji Electric Co Ltd パワー半導体モジュール
JP2002231865A (ja) * 2001-02-02 2002-08-16 Toyota Industries Corp ヒートシンク付絶縁基板、接合部材及び接合方法
JP2003078086A (ja) 2001-09-04 2003-03-14 Kubota Corp 半導体素子モジュール基板の積層構造
JP2003092383A (ja) 2001-09-19 2003-03-28 Hitachi Ltd パワー半導体装置およびそのヒートシンク
JP2003258170A (ja) * 2002-02-26 2003-09-12 Akane:Kk ヒートシンク
JP3917503B2 (ja) 2002-04-05 2007-05-23 住友精密工業株式会社 アルミニウム部材と銅部材の接合方法及びその接合構造物
TW540298B (en) 2002-09-04 2003-07-01 Loyalty Founder Entpr Co Ltd Composite board forming method for heat sink
JP3938079B2 (ja) 2003-03-20 2007-06-27 三菱マテリアル株式会社 パワーモジュール用基板の製造方法
WO2005014217A1 (ja) 2003-08-07 2005-02-17 Sumitomo Precision Products Co., Ltd. Al-Cu接合構造物およびその製造方法
KR20110124372A (ko) * 2004-04-05 2011-11-16 미쓰비시 마테리알 가부시키가이샤 Ａｌ／ＡｌＮ 접합체, 전력 모듈용 기판 및 전력 모듈, 그리고 Ａｌ／ＡｌＮ 접합체의 제조 방법
JP2006100770A (ja) * 2004-09-01 2006-04-13 Toyota Industries Corp 回路基板のベース板の製造方法及び回路基板のベース板並びにベース板を用いた回路基板
JP4759384B2 (ja) * 2005-12-20 2011-08-31 昭和電工株式会社 半導体モジュール
KR20150045449A (ko) 2007-10-25 2015-04-28 미츠비시 레이온 가부시키가이샤 스탬퍼와 그의 제조방법, 성형체의 제조방법, 및 스탬퍼용 알루미늄 원형
JP5067187B2 (ja) * 2007-11-06 2012-11-07 三菱マテリアル株式会社 ヒートシンク付パワーモジュール用基板及びヒートシンク付パワーモジュール
JP4747315B2 (ja) * 2007-11-19 2011-08-17 三菱マテリアル株式会社 パワーモジュール用基板及びパワーモジュール
JP5163199B2 (ja) 2008-03-17 2013-03-13 三菱マテリアル株式会社 ヒートシンク付パワーモジュール用基板及びヒートシンク付パワーモジュール
JP2010034238A (ja) 2008-07-28 2010-02-12 Shin Kobe Electric Mach Co Ltd 配線板
JP2010137251A (ja) 2008-12-11 2010-06-24 Mitsubishi Electric Corp 金属接合体およびその製造方法
US8159821B2 (en) * 2009-07-28 2012-04-17 Dsem Holdings Sdn. Bhd. Diffusion bonding circuit submount directly to vapor chamber
KR101690820B1 (ko) * 2009-09-09 2016-12-28 미쓰비시 마테리알 가부시키가이샤 히트 싱크 부착 파워 모듈용 기판의 제조 방법, 히트 싱크 부착 파워 모듈용 기판 및 파워 모듈
WO2011052517A1 (ja) * 2009-10-26 2011-05-05 株式会社Ｎｅｏｍａｘマテリアル アルミニウム接合合金、その合金で形成された接合合金層を有するクラッド材及びアルミニウム接合複合材
JP5488619B2 (ja) * 2010-02-05 2014-05-14 三菱マテリアル株式会社 パワーモジュール用基板及びパワーモジュール
KR101276496B1 (ko) 2010-06-08 2013-06-18 가부시키가이샤 네오맥스 마테리아르 알루미늄 구리 클래드재
CN101947689B (zh) 2010-09-21 2012-10-03 河南科技大学 铜铝复合板的连续复合成形方法及其复合成形装置
DE102010041714A1 (de) 2010-09-30 2011-08-25 Infineon Technologies AG, 85579 Leistungshalbleitermodul und Verfahren zur Herstellung eines Leistungshalbleitermoduls
JP5736807B2 (ja) 2011-02-02 2015-06-17 三菱マテリアル株式会社 ヒートシンク付パワーモジュール用基板、ヒートシンク付パワーモジュール用基板の製造方法及びパワーモジュール
JP5910166B2 (ja) * 2012-02-29 2016-04-27 三菱マテリアル株式会社 パワーモジュール用基板の製造方法
JP5403129B2 (ja) 2012-03-30 2014-01-29 三菱マテリアル株式会社 パワーモジュール用基板、ヒートシンク付パワーモジュール用基板、パワーモジュール、及びパワーモジュール用基板の製造方法
EP2898979B1 (en) 2012-09-21 2019-03-06 Mitsubishi Materials Corporation Bonding structure for aluminum member and copper member

Also Published As

Publication number Publication date
TW201423922A (zh) 2014-06-16
WO2014061588A1 (ja) 2014-04-24
TWI600126B (zh) 2017-09-21
JP2014099596A (ja) 2014-05-29
JP5614485B2 (ja) 2014-10-29
KR102146589B1 (ko) 2020-08-20
EP2911192A1 (en) 2015-08-26
CN104718616A (zh) 2015-06-17
CN104718616B (zh) 2017-11-14
EP2911192B1 (en) 2021-05-05
US20150282379A1 (en) 2015-10-01
US9968012B2 (en) 2018-05-08
EP2911192A4 (en) 2016-06-22
KR20150067177A (ko) 2015-06-17

Similar Documents

Publication Publication Date Title
IN2015DN03283A (es)
IN2015DN02361A (es)
TW201613755A (en) Bonded body, power module substrate with heat sink, heat sink, method of producing bonded body, method of producing power module substrate with heat sink and method of producing heat sink
TW201613037A (en) Substrate for power modules, substrate with heat sink for power modules and power module with heat sink
IN2014DN08075A (es)
WO2014022619A8 (en) Dual solder layer for fluidic self assembly and electrical component substrate and method employing same
IN2014DN08074A (es)
IN2014DN08029A (es)
EP2811513A4 (en) SUBSTRATE FOR CURRENT MODULES, SUBSTRATE WITH THERMAL DISSIPATOR FOR CURRENT MODULES, CURRENT MODULE, SUBSTRATE MANUFACTURING METHOD FOR CURRENT MODULES, AND PASTE FOR COPPER ELEMENT BONDING
PH12017500373B1 (en) Conductive adhesive film
MY184905A (en) Assembly and semiconductor device
EP2733734A3 (en) Multiple bonding layers for thin-wafer handling
WO2013009853A3 (en) Electronic assembly including die on substrate with heat spreader having an open window on the die
WO2010114874A3 (en) Conductive compositions containing blended alloy fillers
WO2012015982A3 (en) Electronics substrate with enhanced direct bonded metal
IN2014DN09944A (es)
EP2930744A4 (en) SUBSTRATE FOR POWER MODULES, SUBSTRATE WITH THERMAL DISSIPATOR FOR POWER MODULES, POWER MODULE, METHOD FOR MANUFACTURING SUBSTRATE FOR POWER MODULES, AND PASTE FOR BONDING COPPER PLATE, AND METHOD FOR PRODUCING METALLIZED BODY
EP2747133A3 (en) Power module package with cooling fluid reservoir
JP2013214576A5 (es)
GB0908626D0 (en) A metallization layer stack without a terminal aluminium metal layer
EP3076445A3 (en) Thermoelectric converter and dehumidifier using the same
TR201902757T4 (tr) Eritici madde bulunmayan termal birleştirme yönteminde kullanmak için alüminyum kompozit malzeme ve bunun üretimi için yöntem.
WO2013152909A3 (de) Laserdiodenvorrichtung
EP3047937A4 (en) Bi GROUP SOLDER ALLOY, METHOD FOR BONDING ELECTRONIC PART USING SAME, AND ELECTRONIC PART MOUNTING SUBSTRATE
EP2793258A4 (en) POWER MODULE SUBSTRATE, SUBSTRATE FOR A POWER MODULE WITH A COOLING BODY, POWER MODULE, PASTE FOR PRODUCING A RIVER COMPONENT INHIBITING PREVENTION LAYER AND BINDING METHOD FOR A PRODUCT TO BE BINDED