IN2014KN01122A - - Google Patents

Info

Publication number
IN2014KN01122A
IN2014KN01122A IN1122KON2014A IN2014KN01122A IN 2014KN01122 A IN2014KN01122 A IN 2014KN01122A IN 1122KON2014 A IN1122KON2014 A IN 1122KON2014A IN 2014KN01122 A IN2014KN01122 A IN 2014KN01122A
Authority
IN
India
Prior art keywords
agnw
cnts
proceed
tubes
mixtures
Prior art date
Application number
Other languages
English (en)
Inventor
Werner Stockum
Oliver Doll
Ingo Koehler
Christian Matuschek
Original Assignee
Merck Patent Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Merck Patent Gmbh filed Critical Merck Patent Gmbh
Publication of IN2014KN01122A publication Critical patent/IN2014KN01122A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/06—Etching, surface-brightening or pickling compositions containing an inorganic acid with organic material
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K13/00—Etching, surface-brightening or pickling compositions
    • C09K13/04—Etching, surface-brightening or pickling compositions containing an inorganic acid
    • C09K13/08—Etching, surface-brightening or pickling compositions containing an inorganic acid containing a fluorine compound
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/10—Etching compositions
    • C23F1/14—Aqueous compositions
    • C23F1/16—Acidic compositions
    • C23F1/30—Acidic compositions for etching other metallic material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B1/00—Conductors or conductive bodies characterised by the conductive materials; Selection of materials as conductors
    • H01B1/20—Conductive material dispersed in non-conductive organic material
    • H01B1/22—Conductive material dispersed in non-conductive organic material the conductive material comprising metals or alloys
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L31/00—Semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation and specially adapted either for the conversion of the energy of such radiation into electrical energy or for the control of electrical energy by such radiation; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L31/18—Processes or apparatus specially adapted for the manufacture or treatment of these devices or of parts thereof
    • H01L31/1884—Manufacture of transparent electrodes, e.g. TCO, ITO
    • H01L31/1888—Manufacture of transparent electrodes, e.g. TCO, ITO methods for etching transparent electrodes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L33/00—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
    • H01L33/36—Semiconductor devices having potential barriers specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
    • H01L33/40—Materials therefor
    • H01L33/42—Transparent materials
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K10/00—Organic devices specially adapted for rectifying, amplifying, oscillating or switching; Organic capacitors or resistors having potential barriers
    • H10K10/80—Constructional details
    • H10K10/82—Electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H10K50/826—Multilayers, e.g. opaque multilayers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/80—Constructional details
    • H10K50/805—Electrodes
    • H10K50/82—Cathodes
    • H10K50/828—Transparent cathodes, e.g. comprising thin metal layers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/621—Providing a shape to conductive layers, e.g. patterning or selective deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2102/00—Constructional details relating to the organic devices covered by this subclass
    • H10K2102/301—Details of OLEDs
    • H10K2102/331—Nanoparticles used in non-emissive layers, e.g. in packaging layer
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/20—Changing the shape of the active layer in the devices, e.g. patterning
    • H10K71/231—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers
    • H10K71/236—Changing the shape of the active layer in the devices, e.g. patterning by etching of existing layers using printing techniques, e.g. applying the etch liquid using an ink jet printer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E10/00—Energy generation through renewable energy sources
    • Y02E10/50—Photovoltaic [PV] energy

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Metallurgy (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Computer Hardware Design (AREA)
  • Inorganic Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Dispersion Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Weting (AREA)
  • Photovoltaic Devices (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Of Electric Cables (AREA)
  • Surface Treatment Of Glass (AREA)
  • ing And Chemical Polishing (AREA)
  • Catalysts (AREA)
IN1122KON2014 2011-10-27 2012-09-28 IN2014KN01122A (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP11008621.2A EP2587564A1 (de) 2011-10-27 2011-10-27 Selektives Ätzen einer Matrix, die Silber-Nanodrähte oder Kohlenstoffnanoröhrchen umfasst
PCT/EP2012/004095 WO2013060409A1 (en) 2011-10-27 2012-09-28 Selective etching of a matrix comprising silver nano wires

Publications (1)

Publication Number Publication Date
IN2014KN01122A true IN2014KN01122A (de) 2015-10-16

Family

ID=46968144

Family Applications (1)

Application Number Title Priority Date Filing Date
IN1122KON2014 IN2014KN01122A (de) 2011-10-27 2012-09-28

Country Status (10)

Country Link
US (1) US9379326B2 (de)
EP (2) EP2587564A1 (de)
JP (1) JP2015501541A (de)
KR (1) KR20140085563A (de)
CN (1) CN103907216A (de)
BR (1) BR112014009871A2 (de)
IN (1) IN2014KN01122A (de)
SG (1) SG11201401650UA (de)
TW (1) TWI561459B (de)
WO (1) WO2013060409A1 (de)

Families Citing this family (40)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9199870B2 (en) 2012-05-22 2015-12-01 Corning Incorporated Electrostatic method and apparatus to form low-particulate defect thin glass sheets
US10100393B2 (en) 2013-02-21 2018-10-16 Nlight, Inc. Laser patterning of multi-layer structures
US10464172B2 (en) 2013-02-21 2019-11-05 Nlight, Inc. Patterning conductive films using variable focal plane to control feature size
US9537042B2 (en) 2013-02-21 2017-01-03 Nlight, Inc. Non-ablative laser patterning
US9842665B2 (en) 2013-02-21 2017-12-12 Nlight, Inc. Optimization of high resolution digitally encoded laser scanners for fine feature marking
EP2830110A1 (de) 2013-07-22 2015-01-28 Heraeus Precious Metals GmbH & Co. KG Strukturierung einer Zusammensetzung mit Silber-Nanodrähten
KR20160084428A (ko) * 2013-11-08 2016-07-13 메르크 파텐트 게엠베하 은 나노 재료를 포함하는 투명 전도성 기질의 구조화 방법
US10069271B2 (en) 2014-06-02 2018-09-04 Nlight, Inc. Scalable high power fiber laser
US10618131B2 (en) 2014-06-05 2020-04-14 Nlight, Inc. Laser patterning skew correction
KR102209680B1 (ko) * 2014-06-27 2021-01-29 동우 화인켐 주식회사 금속막의 식각액 조성물 및 이를 이용한 액정 표시 장치용 어레이 기판의 제조방법
US9482477B2 (en) 2014-07-28 2016-11-01 Northrop Grumman Systems Corporation Nano-thermal agents for enhanced interfacial thermal conductance
US10310201B2 (en) 2014-08-01 2019-06-04 Nlight, Inc. Back-reflection protection and monitoring in fiber and fiber-delivered lasers
CN105374696B (zh) * 2014-08-05 2018-08-28 上海蓝沛信泰光电科技有限公司 一种利用激光刻蚀制备透明金属引线结构的方法
KR102323848B1 (ko) * 2014-09-30 2021-11-09 동우 화인켐 주식회사 은 나노 와이어의 식각액 조성물
KR102254561B1 (ko) * 2014-09-30 2021-05-21 동우 화인켐 주식회사 은 나노 와이어의 식각액 조성물
US9296614B1 (en) 2014-11-12 2016-03-29 Corning Incorporated Substrate such as for use with carbon nanotubes
US9837783B2 (en) 2015-01-26 2017-12-05 Nlight, Inc. High-power, single-mode fiber sources
CN106155429A (zh) * 2015-03-25 2016-11-23 联想(北京)有限公司 电子设备、触控部件及其设置方法
US10050404B2 (en) 2015-03-26 2018-08-14 Nlight, Inc. Fiber source with cascaded gain stages and/or multimode delivery fiber with low splice loss
WO2017004055A1 (en) 2015-07-02 2017-01-05 Sabic Global Technologies B.V. Process and material for growth of adsorbed compound via nanoscale-controlled resistive heating and uses thereof
WO2017008022A1 (en) 2015-07-08 2017-01-12 Nlight, Inc. Fiber with depressed central index for increased beam parameter product
CN104962919B (zh) * 2015-07-31 2017-09-22 合肥银派科技有限公司 一种银纳米线的刻蚀液及刻蚀方法
US9447504B1 (en) * 2015-09-28 2016-09-20 Xerox Corporation Method of etching using inkjet printing
EP3978184A1 (de) 2015-11-23 2022-04-06 NLIGHT, Inc. Verfahren und vorrichtung zur feinstufigen zeitsteuerung für eine laserstrahlmaterialbearbeitung
US10074960B2 (en) 2015-11-23 2018-09-11 Nlight, Inc. Predictive modification of laser diode drive current waveform in order to optimize optical output waveform in high power laser systems
US11179807B2 (en) 2015-11-23 2021-11-23 Nlight, Inc. Fine-scale temporal control for laser material processing
WO2017127573A1 (en) 2016-01-19 2017-07-27 Nlight, Inc. Method of processing calibration data in 3d laser scanner systems
JP7221579B2 (ja) * 2016-03-22 2023-02-14 富士電機株式会社 樹脂組成物
US10732439B2 (en) 2016-09-29 2020-08-04 Nlight, Inc. Fiber-coupled device for varying beam characteristics
EP3519871A1 (de) 2016-09-29 2019-08-07 NLIGHT, Inc. Einstellbare strahleigenschaften
US10730785B2 (en) 2016-09-29 2020-08-04 Nlight, Inc. Optical fiber bending mechanisms
CN107068412B (zh) * 2016-12-08 2018-10-16 常州大学 一种高功率的长线性超级电容器及其制备方法
KR102611837B1 (ko) 2017-04-04 2023-12-07 엔라이트 인크. 검류계 스캐너 보정을 위한 광학 기준 생성
US10614928B2 (en) 2017-04-17 2020-04-07 Philippe Hansen-Estruch Biodegradable flexible lightweight energy storage composite and methods of making the same
CN109835867B (zh) * 2017-11-24 2023-07-14 中芯国际集成电路制造(上海)有限公司 刻蚀溶液和刻蚀方法
CN109045368A (zh) * 2018-07-04 2018-12-21 郑州大学第附属医院 一种医用高强度高韧性可吸收复合生物材料
CN110444632A (zh) * 2019-07-08 2019-11-12 绵阳金能移动能源有限公司 一种采用石墨烯导电膜制备柔性太阳电池前电极的方法
WO2021050791A1 (en) * 2019-09-10 2021-03-18 Washington University Compositions of conductive polymers and methods for making and using same
CN112185608B (zh) * 2020-10-28 2021-11-30 碳星科技(天津)有限公司 一种新型双层导电网络结构的柔性透明电极及其制备方法
CN114517094B (zh) * 2020-11-20 2023-08-22 苏州阿特斯阳光电力科技有限公司 一种丝网印刷电化学刻蚀用浆料及其制备方法和应用

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1378947A1 (de) * 2002-07-01 2004-01-07 Interuniversitair Microelektronica Centrum Vzw Ätzpaste für Halbleiter und Verwendung einer Ätzpaste zum lokalisierten Ätzen von Halbleitersubstraten
US8018568B2 (en) * 2006-10-12 2011-09-13 Cambrios Technologies Corporation Nanowire-based transparent conductors and applications thereof
CN102324462B (zh) * 2006-10-12 2015-07-01 凯博瑞奥斯技术公司 基于纳米线的透明导体及其应用
DE102006051952A1 (de) * 2006-11-01 2008-05-08 Merck Patent Gmbh Partikelhaltige Ätzpasten für Siliziumoberflächen und -schichten
JP2008159923A (ja) * 2006-12-25 2008-07-10 Sharp Corp 有機薄膜トランジスタ製造用蒸着用マスク、これを用いた有機薄膜トランジスタの製造方法、有機薄膜トランジスタ
TWI374859B (en) * 2008-05-28 2012-10-21 Ind Tech Res Inst Photo energy transformation catalysts and methods for fabricating the same
WO2010022849A2 (de) * 2008-09-01 2010-03-04 Merck Patent Gmbh Randentschichtung von dünnschicht-solar-modulen mittels ätzen
WO2010093779A1 (en) * 2009-02-12 2010-08-19 Optera, Inc. Plastic capacitive touch screen and method of manufacturing same
JP4998619B2 (ja) 2009-03-30 2012-08-15 東レ株式会社 導電膜除去剤および導電膜除去方法
MY161189A (en) * 2009-09-18 2017-04-14 Merck Patent Gmbh Ink jet printable etching inks and associated process
WO2011119707A2 (en) * 2010-03-23 2011-09-29 Cambrios Technologies Corporation Etch patterning of nanostructure transparent conductors
EP2572388B1 (de) 2010-05-21 2015-01-07 Merck Patent GmbH Selektives ätzen einer kohlenstoffnanoröhrchen-polymermatrix auf einer kunststoffunterstruktur
US20120291836A1 (en) * 2010-11-17 2012-11-22 E.I. Du Pont De Nemours And Company Array of thin-film photovoltaic cells having an etchant-resistant electrode an an integrated bypass diode associated with a plurality of cells and a panel incorporating the same
WO2012083082A1 (en) * 2010-12-15 2012-06-21 Sun Chemical Corporation Printable etchant compositions for etching silver nanoware-based transparent, conductive film

Also Published As

Publication number Publication date
US20140291287A1 (en) 2014-10-02
CN103907216A (zh) 2014-07-02
TW201323319A (zh) 2013-06-16
TWI561459B (en) 2016-12-11
WO2013060409A1 (en) 2013-05-02
EP2771919A1 (de) 2014-09-03
EP2587564A1 (de) 2013-05-01
KR20140085563A (ko) 2014-07-07
SG11201401650UA (en) 2014-05-29
BR112014009871A2 (pt) 2017-04-18
JP2015501541A (ja) 2015-01-15
US9379326B2 (en) 2016-06-28

Similar Documents

Publication Publication Date Title
IN2014KN01122A (de)
WO2011144292A3 (en) Selectively etching of a carbon nano tubes (cnt) polymer matrix on a plastic substructure
FR2916364B1 (fr) Procede de preparation de pre-composites a base de nanotubes notamment de carbone
WO2011099831A3 (ko) 그래핀을 이용한 유연성 투명 발열체 및 이의 제조 방법
EP2525626A4 (de) Bleifreies glasmaterial zur oel-versiegelung, damit geformte oel-anzeige und verfahren zur herstellung der anzeige
EP2496700A4 (de) Nukleinsäurehaltige fettpartikel und entsprechende verfahren
EP3011079A4 (de) Verfahren zur herstellung eines metallmatrixnanokomposits mit graphen
EP2206142A4 (de) Abstandsverfahren für rasterkontakte und entsprechende strukturen
FR2937324B1 (fr) Procede de preparation d'un materiau composite a base de nanotubes, notamment de carbone
EP2685463A4 (de) Flexible, gemusterte, transparente, leitende folie und herstellungsverfahren dafür
EP2548995A4 (de) Herstellungsverfahren für einen transparenten leitfähigen kohlenstofffilm und transparenter leitfähiger kohlenstofffilm
HK1175158A1 (en) Carbon nanotube sheet and process for production thereof
BR112012002233A2 (pt) sietmas e métodos relacionados à formação de nanoestruturas a base de carbono.
EP2356881A4 (de) Leuchtbauelement, herstellungsverfahren dafür und dieses enthaltende anzeige
HK1143896A1 (en) Anisotropic electroconductive film, and process for producing connection structure using the same
EP2543688A4 (de) Polymerisierungsflüssigkeit, verfahren zu ihrer herstellung, aus der polymerisierungsflüssigkeit hergestellter transparenter film und transparente elektrode
WO2012102561A3 (ko) 환원 그래핀 옥사이드와 탄소나노튜브로 구성된 전도성 박막의 제조방법 및 이에 의해 제조된 전도성 박막을 포함하는 투명전극
IN2012DN00933A (de)
MY155499A (en) Sensor assembly and a method of sensing
EP2356880A4 (de) Leuchtbauelement, herstellungsverfahren dafür und dieses enthaltende anzeige
EP2216791A4 (de) Transparenter elektroleitfähiger film und prozess zur herstellung des transparenten elektroleitfähigen films
HK1210861A1 (en) Display device, process for manufacturing same, and transparent resin filler
PT2442838E (pt) Processo de preparação de nácar estruturado mecanicamente por síntese mecânica, nácar estruturado mecanicamente assim obtido e suas apicações
EP2264125A4 (de) Transparenter phosphor und verfahren zur herstellung des transparenten phosphors
BRPI0914736A2 (pt) sistema de produção de hidrogênio sonoquímico assistido por cavitação