IN2014DN05653A - - Google Patents

Info

Publication number
IN2014DN05653A
IN2014DN05653A IN5653DEN2014A IN2014DN05653A IN 2014DN05653 A IN2014DN05653 A IN 2014DN05653A IN 5653DEN2014 A IN5653DEN2014 A IN 5653DEN2014A IN 2014DN05653 A IN2014DN05653 A IN 2014DN05653A
Authority
IN
India
Application number
Other languages
English (en)
Inventor
William C Breneman
Original Assignee
Rec Silicon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rec Silicon Inc filed Critical Rec Silicon Inc
Publication of IN2014DN05653A publication Critical patent/IN2014DN05653A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/04—Hydrides of silicon
    • C01B33/043—Monosilane
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10778—Purification
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P20/00—Technologies relating to chemical industry
    • Y02P20/10—Process efficiency

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
IN5653DEN2014 2011-12-16 2014-07-08 IN2014DN05653A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13/328,820 US20130156675A1 (en) 2011-12-16 2011-12-16 Process for production of silane and hydrohalosilanes
PCT/US2012/069758 WO2013090726A1 (en) 2011-12-16 2012-12-14 Process for production of silane and hydrohalosilanes

Publications (1)

Publication Number Publication Date
IN2014DN05653A true IN2014DN05653A (zh) 2015-04-03

Family

ID=48610342

Family Applications (1)

Application Number Title Priority Date Filing Date
IN5653DEN2014 IN2014DN05653A (zh) 2011-12-16 2014-07-08

Country Status (8)

Country Link
US (1) US20130156675A1 (zh)
JP (1) JP5876589B2 (zh)
KR (1) KR101681565B1 (zh)
CN (1) CN103946158B (zh)
DE (1) DE112012005246T5 (zh)
IN (1) IN2014DN05653A (zh)
TW (1) TWI642622B (zh)
WO (1) WO2013090726A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5886234B2 (ja) * 2013-04-11 2016-03-16 信越化学工業株式会社 シラン化合物またはクロロシラン化合物の精製方法、多結晶シリコンの製造方法、および、弱塩基性イオン交換樹脂の再生処理方法
US9352971B2 (en) 2013-06-14 2016-05-31 Rec Silicon Inc Method and apparatus for production of silane and hydrohalosilanes
US10252916B2 (en) * 2014-09-04 2019-04-09 Corner Star Limited Methods for separating halosilanes
US20170297916A1 (en) * 2014-10-14 2017-10-19 Sitec Gmbh Distillation process
KR101654119B1 (ko) * 2014-10-23 2016-09-06 한국과학기술연구원 헤테로 원자가 포함된 활성탄 촉매를 사용한 하이드로실란의 제조 방법)
US10040689B2 (en) 2014-12-19 2018-08-07 Dow Silicones Corporation Process for preparing monohydrogentrihalosilanes
CN108367928B (zh) 2015-10-09 2022-07-26 密尔沃基硅有限责任公司 用于纯化硅的装置和系统
JP7245012B2 (ja) * 2017-09-12 2023-03-23 オルガノ株式会社 電解液の精製装置および精製方法
WO2019054220A1 (ja) * 2017-09-12 2019-03-21 オルガノ株式会社 電解液の精製装置および精製方法
CN110357915B (zh) * 2018-04-11 2023-02-03 台湾特品化学股份有限公司 硅乙烷合成及过滤纯化的系统
US10773192B1 (en) * 2019-04-09 2020-09-15 Bitfury Ip B.V. Method and apparatus for recovering dielectric fluids used for immersion cooling
CN112758936A (zh) * 2020-12-31 2021-05-07 内蒙古兴洋科技有限公司 一种同时生产电子级硅烷和电子级一氯硅烷的系统和方法
EP4317062A1 (en) 2022-08-02 2024-02-07 Alexander Lygin Optimized process for silicon deposition

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA988275A (en) * 1970-12-17 1976-05-04 Carl J. Litteral Disproportionation of chlorosilicon hydrides
US4676967A (en) * 1978-08-23 1987-06-30 Union Carbide Corporation High purity silane and silicon production
DE3711444A1 (de) * 1987-04-04 1988-10-13 Huels Troisdorf Verfahren und vorrichtung zur herstellung von dichlorsilan
JP4256998B2 (ja) * 1999-10-27 2009-04-22 株式会社トクヤマ シラン化合物の不均化反応生成物の製造方法
DE102004045245B4 (de) * 2004-09-17 2007-11-15 Degussa Gmbh Vorrichtung und Verfahren zur Herstellung von Silanen
EP2085358A4 (en) * 2006-09-27 2015-06-17 Denki Kagaku Kogyo Kk PROCESS FOR THE CONTINUOUS PRODUCTION OF MONOSILANE
DE102007028254A1 (de) * 2007-06-20 2008-12-24 Wacker Chemie Ag Verfahren zur Herstellung von SiH-haltigen Silanen
DE102008002537A1 (de) * 2008-06-19 2009-12-24 Evonik Degussa Gmbh Verfahren zur Entfernung von Bor enthaltenden Verunreinigungen aus Halogensilanen sowie Anlage zur Durchführung des Verfahrens
WO2010103631A1 (ja) * 2009-03-11 2010-09-16 電気化学工業株式会社 トリクロロシラン製造装置
CN201560125U (zh) * 2009-08-31 2010-08-25 比亚迪股份有限公司 一种三氯氢硅歧化制备二氯氢硅的装置

Also Published As

Publication number Publication date
CN103946158A (zh) 2014-07-23
KR20140105013A (ko) 2014-08-29
CN103946158B (zh) 2017-02-08
TW201341311A (zh) 2013-10-16
KR101681565B1 (ko) 2016-12-01
US20130156675A1 (en) 2013-06-20
JP5876589B2 (ja) 2016-03-02
DE112012005246T5 (de) 2014-10-09
TWI642622B (zh) 2018-12-01
WO2013090726A1 (en) 2013-06-20
JP2015504838A (ja) 2015-02-16

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