IN2013MN02445A - - Google Patents
Info
- Publication number
- IN2013MN02445A IN2013MN02445A IN2445MUN2013A IN2013MN02445A IN 2013MN02445 A IN2013MN02445 A IN 2013MN02445A IN 2445MUN2013 A IN2445MUN2013 A IN 2445MUN2013A IN 2013MN02445 A IN2013MN02445 A IN 2013MN02445A
- Authority
- IN
- India
- Prior art keywords
- structural units
- formula
- acrylic resin
- units represented
- mass
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/10—Homopolymers or copolymers of methacrylic acid esters
- C08L33/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/14—Methyl esters, e.g. methyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F220/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical or a salt, anhydride ester, amide, imide or nitrile thereof
- C08F220/02—Monocarboxylic acids having less than ten carbon atoms; Derivatives thereof
- C08F220/10—Esters
- C08F220/12—Esters of monohydric alcohols or phenols
- C08F220/16—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms
- C08F220/18—Esters of monohydric alcohols or phenols of phenols or of alcohols containing two or more carbon atoms with acrylic or methacrylic acids
- C08F220/1807—C7-(meth)acrylate, e.g. heptyl (meth)acrylate or benzyl (meth)acrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F222/00—Copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical and containing at least one other carboxyl radical in the molecule; Salts, anhydrides, esters, amides, imides, or nitriles thereof
- C08F222/36—Amides or imides
- C08F222/40—Imides, e.g. cyclic imides
- C08F222/402—Alkyl substituted imides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
- C08J5/18—Manufacture of films or sheets
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L33/04—Homopolymers or copolymers of esters
- C08L33/06—Homopolymers or copolymers of esters of esters containing only carbon, hydrogen and oxygen, which oxygen atoms are present only as part of the carboxyl radical
- C08L33/08—Homopolymers or copolymers of acrylic acid esters
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L35/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by a carboxyl radical, and containing at least one other carboxyl radical in the molecule, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
- C08L35/06—Copolymers with vinyl aromatic monomers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
- G02B1/041—Lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
- G02B1/14—Protective coatings, e.g. hard coatings
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3025—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state
- G02B5/3033—Polarisers, i.e. arrangements capable of producing a definite output polarisation state from an unpolarised input state in the form of a thin sheet or foil, e.g. Polaroid
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/30—Polarising elements
- G02B5/3083—Birefringent or phase retarding elements
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
- C08J2333/00—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers
- C08J2333/04—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters
- C08J2333/06—Characterised by the use of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides, or nitriles thereof; Derivatives of such polymers esters of esters containing only carbon, hydrogen, and oxygen, the oxygen atom being present only as part of the carboxyl radical
- C08J2333/10—Homopolymers or copolymers of methacrylic acid esters
- C08J2333/12—Homopolymers or copolymers of methyl methacrylate
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/08—Stabilised against heat, light or radiation or oxydation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2201/00—Properties
- C08L2201/10—Transparent films; Clear coatings; Transparent materials
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2203/00—Applications
- C08L2203/16—Applications used for films
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L2205/00—Polymer mixtures characterised by other features
- C08L2205/02—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group
- C08L2205/025—Polymer mixtures characterised by other features containing two or more polymers of the same C08L -group containing two or more polymers of the same hierarchy C08L, and differing only in parameters such as density, comonomer content, molecular weight, structure
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Polarising Elements (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2011147330 | 2011-07-01 | ||
PCT/JP2012/066550 WO2013005634A1 (ja) | 2011-07-01 | 2012-06-28 | アクリル系熱可塑性樹脂組成物及びその成形体 |
Publications (1)
Publication Number | Publication Date |
---|---|
IN2013MN02445A true IN2013MN02445A (de) | 2015-06-12 |
Family
ID=47436989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IN2445MUN2013 IN2013MN02445A (de) | 2011-07-01 | 2012-06-28 |
Country Status (8)
Country | Link |
---|---|
US (3) | US10030134B2 (de) |
EP (1) | EP2727961B8 (de) |
JP (1) | JP5190564B2 (de) |
KR (1) | KR101536505B1 (de) |
CN (1) | CN103619946B (de) |
IN (1) | IN2013MN02445A (de) |
TW (1) | TWI468456B (de) |
WO (1) | WO2013005634A1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US10030134B2 (en) * | 2011-07-01 | 2018-07-24 | Asahi Kasei Kabushiki Kaisha | Acrylic thermoplastic resin composition and molded article thereof |
KR101668159B1 (ko) * | 2013-10-31 | 2016-10-20 | 스미또모 가가꾸 가부시키가이샤 | (메트)아크릴계 수지 조성물 및 그것을 이용한 (메트)아크릴계 수지 필름 |
WO2015098676A1 (ja) * | 2013-12-27 | 2015-07-02 | 富士フイルム株式会社 | ドープ組成物、偏光板保護フィルム、偏光板保護フィルムの製造方法、偏光板および液晶表示装置 |
US9920227B2 (en) * | 2014-01-29 | 2018-03-20 | Hitachi Chemical Company, Ltd. | Resin composition, method for manufacturing semiconductor device using resin composition, and solid-state imaging element |
JP6339881B2 (ja) * | 2014-07-08 | 2018-06-06 | 株式会社日本触媒 | 樹脂組成物、該樹脂組成物を含むフィルム、並びに該フィルムを用いた偏光子保護フィルム、偏光板及び画像表示装置 |
KR102086677B1 (ko) | 2015-11-20 | 2020-03-09 | 아사히 가세이 가부시키가이샤 | 메타크릴계 수지, 메타크릴계 수지 조성물, 필름, 제조 방법 |
US11236209B2 (en) | 2016-03-29 | 2022-02-01 | Asahi Kasei Kabushiki Kaisha | Methacrylic resin composition and shaped product |
JP6247372B2 (ja) * | 2016-03-31 | 2017-12-13 | 旭化成株式会社 | メタクリル系樹脂組成物 |
JP6366639B2 (ja) * | 2016-05-31 | 2018-08-01 | 住友化学株式会社 | 透明粘着剤付き樹脂積層体及びそれを含む表示装置 |
KR101889078B1 (ko) | 2016-06-22 | 2018-08-16 | 주식회사 엘지화학 | 광학용 필름 및 이를 포함하는 편광판 |
JP6247373B1 (ja) * | 2016-06-22 | 2017-12-13 | 旭化成株式会社 | メタクリル系樹脂組成物、光学フィルム、光学部品 |
JP7015116B2 (ja) * | 2016-06-29 | 2022-02-15 | 旭化成株式会社 | メタクリル系樹脂組成物、該メタクリル系樹脂組成物の製造方法、ペレット、及び成形体 |
CN107540779B (zh) * | 2016-06-29 | 2021-04-13 | 旭化成株式会社 | 甲基丙烯酸系树脂组合物、该甲基丙烯酸系树脂组合物的制造方法、颗粒、以及成型体 |
TWI621518B (zh) * | 2016-07-20 | 2018-04-21 | 穎台投資控股股份有限公司 | 以雙軸同步延伸方式製造相位差膜的方法及其相位差膜 |
JP6151423B1 (ja) | 2016-08-30 | 2017-06-21 | 旭化成株式会社 | メタクリル系樹脂組成物、光学フィルム、及び光学部品 |
JP7129181B2 (ja) | 2017-03-17 | 2022-09-01 | 旭化成株式会社 | ヘッドマウントディスプレイ用部材 |
WO2019107937A1 (ko) * | 2017-11-28 | 2019-06-06 | 주식회사 엘지화학 | 색변환 필름을 포함하는 조명 모듈 |
JP7124050B2 (ja) * | 2018-02-27 | 2022-08-23 | 株式会社カネカ | 溶液流延法によるフィルム製造用樹脂組成物及びドープ |
JP7197303B2 (ja) * | 2018-07-30 | 2022-12-27 | 住友化学株式会社 | 重合体組成物 |
JP7523105B2 (ja) * | 2019-02-01 | 2024-07-26 | 康博 小池 | 光学ポリマー材料、光学フィルム、表示装置、光学ポリマー材料の製造方法および光学フィルムの製造方法 |
WO2021182384A1 (ja) * | 2020-03-11 | 2021-09-16 | 日東電工株式会社 | 前面板、光学積層体および画像表示装置 |
JP7395527B2 (ja) * | 2020-03-11 | 2023-12-11 | 日東電工株式会社 | 前面板、光学積層体および画像表示装置 |
JP7498637B2 (ja) | 2020-08-07 | 2024-06-12 | 株式会社日本触媒 | 空中ディスプレイ |
CN112300325B (zh) * | 2020-11-09 | 2021-09-07 | 聚纶材料科技(深圳)有限公司 | 光学薄膜及其制造方法 |
Family Cites Families (25)
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JPS5840970B2 (ja) | 1979-01-29 | 1983-09-09 | 旭化成株式会社 | スチレン系共重合体及びその製造法 |
JPS57153008A (en) | 1981-03-19 | 1982-09-21 | Asahi Chem Ind Co Ltd | Methacrylic resin having excellent heat resistance |
JPS6195011A (ja) * | 1984-10-17 | 1986-05-13 | Toray Ind Inc | 光デイスク基板 |
JPS61171708A (ja) | 1984-12-14 | 1986-08-02 | Mitsubishi Rayon Co Ltd | 耐熱性樹脂、その製造法およびそれからなる光学用素子 |
JPS61252211A (ja) | 1985-05-01 | 1986-11-10 | Asahi Chem Ind Co Ltd | 光学純度の良い耐熱性アクリル樹脂の製造法 |
JPS6210157A (ja) * | 1985-07-08 | 1987-01-19 | Mitsubishi Rayon Co Ltd | 耐熱性メタクリル樹脂組成物 |
JPS62270648A (ja) * | 1986-05-19 | 1987-11-25 | Mitsubishi Rayon Co Ltd | 耐熱性メタクリル樹脂組成物 |
US4810055A (en) * | 1986-10-02 | 1989-03-07 | Toray Industries, Inc. | Heat resisting plastic optical fiber and method for its manufacture |
JPS6479248A (en) * | 1987-09-22 | 1989-03-24 | Denki Kagaku Kogyo Kk | Transparent heat-resistant resin composition |
US5155190A (en) * | 1988-09-06 | 1992-10-13 | Hitachi Chemical Company | Process for producing poly methyl methacrylate/N-substituted maleimide optical resin |
US5073615A (en) * | 1989-03-13 | 1991-12-17 | Continental Polymers, Inc. | High temperature heat resistant acrylics |
JPH0737552B2 (ja) * | 1992-04-03 | 1995-04-26 | 株式会社日本触媒 | 熱可塑性樹脂組成物 |
JPH06242301A (ja) | 1993-02-16 | 1994-09-02 | Kuraray Co Ltd | 光学素子 |
JP3701374B2 (ja) * | 1996-03-25 | 2005-09-28 | 株式会社日本触媒 | 熱可塑性樹脂組成物 |
JP4424636B2 (ja) * | 2000-04-11 | 2010-03-03 | 株式会社日本触媒 | 透明耐熱性熱可塑性樹脂組成物 |
JP2002187993A (ja) * | 2000-12-21 | 2002-07-05 | Hitachi Chem Co Ltd | 非複屈折性光学用樹脂組成物及びこれを用いた光学用素子 |
CN101180359A (zh) * | 2005-05-30 | 2008-05-14 | 株式会社钟化 | 树脂组合物 |
JPWO2009031544A1 (ja) * | 2007-09-04 | 2010-12-16 | 電気化学工業株式会社 | 熱可塑性共重合樹脂及びその光学成形体 |
CN101910223B (zh) * | 2007-12-27 | 2012-11-07 | 旭化成化学株式会社 | 热塑性丙烯酸树脂以及光学材料用成型体 |
KR20090076753A (ko) * | 2008-01-08 | 2009-07-13 | 주식회사 엘지화학 | 투명한 수지 조성물 |
KR101091534B1 (ko) * | 2008-04-30 | 2011-12-13 | 주식회사 엘지화학 | 광학 필름 및 이를 포함하는 정보전자 장치 |
KR101381528B1 (ko) * | 2008-07-31 | 2014-04-10 | 아사히 가세이 케미칼즈 가부시키가이샤 | 아크릴계 열가소성 수지, 및 그 성형체 |
WO2010079920A2 (ko) * | 2009-01-06 | 2010-07-15 | 주식회사 엘지화학 | 광학 필름 및 이를 포함하는 액정 표시 장치 |
US8536275B2 (en) * | 2010-06-30 | 2013-09-17 | Lg Chem, Ltd. | Acryl-based copolymers and optical film including the same |
US10030134B2 (en) * | 2011-07-01 | 2018-07-24 | Asahi Kasei Kabushiki Kaisha | Acrylic thermoplastic resin composition and molded article thereof |
-
2012
- 2012-06-28 US US14/129,230 patent/US10030134B2/en active Active
- 2012-06-28 EP EP12807338.4A patent/EP2727961B8/de active Active
- 2012-06-28 KR KR1020137033322A patent/KR101536505B1/ko active IP Right Grant
- 2012-06-28 CN CN201280030159.7A patent/CN103619946B/zh active Active
- 2012-06-28 IN IN2445MUN2013 patent/IN2013MN02445A/en unknown
- 2012-06-28 JP JP2012549194A patent/JP5190564B2/ja active Active
- 2012-06-28 WO PCT/JP2012/066550 patent/WO2013005634A1/ja active Application Filing
- 2012-06-29 TW TW101123401A patent/TWI468456B/zh active
-
2016
- 2016-10-20 US US15/298,786 patent/US20170037236A1/en not_active Abandoned
-
2018
- 2018-07-06 US US16/029,494 patent/US20180312682A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
JPWO2013005634A1 (ja) | 2015-02-23 |
US20180312682A1 (en) | 2018-11-01 |
EP2727961B8 (de) | 2016-10-19 |
TWI468456B (zh) | 2015-01-11 |
WO2013005634A1 (ja) | 2013-01-10 |
TW201302899A (zh) | 2013-01-16 |
EP2727961A1 (de) | 2014-05-07 |
CN103619946B (zh) | 2016-08-17 |
CN103619946A (zh) | 2014-03-05 |
US10030134B2 (en) | 2018-07-24 |
KR20140013081A (ko) | 2014-02-04 |
US20140128547A1 (en) | 2014-05-08 |
JP5190564B2 (ja) | 2013-04-24 |
US20170037236A1 (en) | 2017-02-09 |
KR101536505B1 (ko) | 2015-07-13 |
EP2727961B1 (de) | 2016-08-24 |
EP2727961A4 (de) | 2014-12-31 |
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