IN2012DN05176A - - Google Patents

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Publication number
IN2012DN05176A
IN2012DN05176A IN5176DEN2012A IN2012DN05176A IN 2012DN05176 A IN2012DN05176 A IN 2012DN05176A IN 5176DEN2012 A IN5176DEN2012 A IN 5176DEN2012A IN 2012DN05176 A IN2012DN05176 A IN 2012DN05176A
Authority
IN
India
Application number
Other languages
English (en)
Inventor
Frank Erk Henry
Original Assignee
Memc Electronic Materials
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Memc Electronic Materials filed Critical Memc Electronic Materials
Publication of IN2012DN05176A publication Critical patent/IN2012DN05176A/en

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Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/10773—Halogenated silanes obtained by disproportionation and molecular rearrangement of halogenated silanes
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/02—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds
    • B01J8/0207—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with stationary particles, e.g. in fixed beds the fluid flow within the bed being predominantly horizontal
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1818—Feeding of the fluidising gas
    • B01J8/1827—Feeding of the fluidising gas the fluidising gas being a reactant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/1872—Details of the fluidised bed reactor
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J8/00—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes
    • B01J8/18—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles
    • B01J8/24—Chemical or physical processes in general, conducted in the presence of fluids and solid particles; Apparatus for such processes with fluidised particles according to "fluidised-bed" technique
    • B01J8/44—Fluidisation grids
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/02—Silicon
    • C01B33/021—Preparation
    • C01B33/027—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material
    • C01B33/03—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent
    • C01B33/031—Preparation by decomposition or reduction of gaseous or vaporised silicon compounds other than silica or silica-containing material by decomposition of silicon halides or halosilanes or reduction thereof with hydrogen as the only reducing agent by decomposition of silicon tetraiodide
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/08—Compounds containing halogen
    • C01B33/107—Halogenated silanes
    • C01B33/1071—Tetrachloride, trichlorosilane or silicochloroform, dichlorosilane, monochlorosilane or mixtures thereof
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F23—COMBUSTION APPARATUS; COMBUSTION PROCESSES
    • F23C—METHODS OR APPARATUS FOR COMBUSTION USING FLUID FUEL OR SOLID FUEL SUSPENDED IN  A CARRIER GAS OR AIR 
    • F23C10/00—Fluidised bed combustion apparatus
    • F23C10/18—Details; Accessories
    • F23C10/20—Inlets for fluidisation air, e.g. grids; Bottoms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F27—FURNACES; KILNS; OVENS; RETORTS
    • F27B—FURNACES, KILNS, OVENS, OR RETORTS IN GENERAL; OPEN SINTERING OR LIKE APPARATUS
    • F27B15/00—Fluidised-bed furnaces; Other furnaces using or treating finely-divided materials in dispersion
    • F27B15/02—Details, accessories, or equipment peculiar to furnaces of these types
    • F27B15/10—Arrangements of air or gas supply devices

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Inorganic Chemistry (AREA)
  • Combustion & Propulsion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Dispersion Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Physics & Mathematics (AREA)
  • Fluid Mechanics (AREA)
  • Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
IN5176DEN2012 2009-12-29 2012-06-12 IN2012DN05176A (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US29069209P 2009-12-29 2009-12-29
PCT/US2010/062088 WO2011090689A1 (en) 2009-12-29 2010-12-23 Methods for reducing the deposition of silicon on reactor walls using peripheral silicon tetrachloride

Publications (1)

Publication Number Publication Date
IN2012DN05176A true IN2012DN05176A (no) 2015-10-23

Family

ID=43827215

Family Applications (1)

Application Number Title Priority Date Filing Date
IN5176DEN2012 IN2012DN05176A (no) 2009-12-29 2012-06-12

Country Status (10)

Country Link
US (2) US8828324B2 (no)
EP (1) EP2519343A1 (no)
JP (1) JP2013515673A (no)
KR (1) KR20120110109A (no)
CN (1) CN102686307A (no)
IN (1) IN2012DN05176A (no)
NO (1) NO20120828A1 (no)
RU (1) RU2012132435A (no)
TW (1) TW201136830A (no)
WO (1) WO2011090689A1 (no)

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MY169283A (en) 2008-06-30 2019-03-21 Corner Star Ltd Methods for producing polycrystalline silicon that reduce the deposition of silicon on reactor walls
KR101329030B1 (ko) 2010-10-01 2013-11-13 주식회사 실리콘밸류 유동층 반응기
EP2654912B1 (en) 2010-12-20 2016-04-20 MEMC Electronic Materials, Inc. Production of polycrystalline silicon in substantially closed-loop processes that involve disproportionation operations
US20130129570A1 (en) * 2011-04-20 2013-05-23 Siliconvalue Llc. Polycrystal silicon manufacturing apparatus
KR101329035B1 (ko) 2011-04-20 2013-11-13 주식회사 실리콘밸류 유동층 반응기
WO2013049325A1 (en) 2011-09-30 2013-04-04 Memc Electronic Materials, Inc. Production of polycrystalline silicon by the thermal decomposition of silane in a fluidized bed reactor
WO2013049314A2 (en) 2011-09-30 2013-04-04 Memc Electronic Materials, Inc. Production of polycrystalline silicon by the thermal decomposition of silane in a fluidized bed reactor
US20130149228A1 (en) * 2011-12-09 2013-06-13 Siliken Chemicals, S.L. Method, system and apparatus for controlling particle size in a fluidized bed reactor
US8875728B2 (en) * 2012-07-12 2014-11-04 Siliken Chemicals, S.L. Cooled gas distribution plate, thermal bridge breaking system, and related methods
US10105669B2 (en) 2012-08-29 2018-10-23 Hemlock Semiconductor Operations Llc Tapered fluidized bed reactor and process for its use
DE102013206236A1 (de) * 2013-04-09 2014-10-09 Wacker Chemie Ag Gasverteiler für Siemens-Reaktor
DE102013208071A1 (de) * 2013-05-02 2014-11-06 Wacker Chemie Ag Wirbelschichtreaktor und Verfahren zur Herstellung von granularem Polysilicium
CN103553047A (zh) * 2013-11-06 2014-02-05 苏州协鑫工业应用研究院有限公司 一种用于在反应器中生产多晶硅产品的方法及系统
US10252916B2 (en) 2014-09-04 2019-04-09 Corner Star Limited Methods for separating halosilanes
EP3278872B1 (en) * 2015-04-01 2021-07-07 Hanwha Chemical Corporation Method for preparing granular polysilicon using a fluidised-bed reactor system
CN105170037B (zh) * 2015-08-27 2018-09-11 攀钢集团攀枝花钢铁研究院有限公司 流化床反应器
CN105363391B (zh) * 2015-11-12 2018-08-14 攀钢集团攀枝花钢铁研究院有限公司 用于流化床反应器的多管式气体分布器的导流结构
WO2017100564A1 (en) 2015-12-11 2017-06-15 Sunedison, Inc. Reactor systems having multiple pressure balancers
WO2017100404A1 (en) 2015-12-11 2017-06-15 Sunedison, Inc. Reactor systems having external pressure balancer
EP3569573A1 (en) * 2017-01-16 2019-11-20 Tokuyama Corporation Method for producing polycrystalline silicon
DE102017125221A1 (de) 2017-10-27 2019-05-02 Nexwafe Gmbh Verfahren und Vorrichtung zur Entfernung von Verunreinigungen aus Chlorsilanen

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Also Published As

Publication number Publication date
JP2013515673A (ja) 2013-05-09
US8828324B2 (en) 2014-09-09
WO2011090689A1 (en) 2011-07-28
WO2011090689A4 (en) 2011-09-22
KR20120110109A (ko) 2012-10-09
EP2519343A1 (en) 2012-11-07
TW201136830A (en) 2011-11-01
US20110158857A1 (en) 2011-06-30
NO20120828A1 (no) 2012-07-17
CN102686307A (zh) 2012-09-19
RU2012132435A (ru) 2014-02-10
US20110158888A1 (en) 2011-06-30

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