IL82535A - Thermally insulative and electrically conductive interconnect and process for making same - Google Patents

Thermally insulative and electrically conductive interconnect and process for making same

Info

Publication number
IL82535A
IL82535A IL82535A IL8253587A IL82535A IL 82535 A IL82535 A IL 82535A IL 82535 A IL82535 A IL 82535A IL 8253587 A IL8253587 A IL 8253587A IL 82535 A IL82535 A IL 82535A
Authority
IL
Israel
Prior art keywords
electrically conductive
making same
conductive interconnect
thermally insulative
insulative
Prior art date
Application number
IL82535A
Other languages
English (en)
Other versions
IL82535A0 (en
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL82535A0 publication Critical patent/IL82535A0/xx
Publication of IL82535A publication Critical patent/IL82535A/xx

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L25/00Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof
    • H01L25/16Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits
    • H01L25/167Assemblies consisting of a plurality of individual semiconductor or other solid state devices ; Multistep manufacturing processes thereof the devices being of types provided for in two or more different main groups of groups H01L27/00 - H01L33/00, or in a single subclass of H10K, H10N, e.g. forming hybrid circuits comprising optoelectronic devices, e.g. LED, photodiodes
    • GPHYSICS
    • G01MEASURING; TESTING
    • G01JMEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/10Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors
    • G01J5/34Radiation pyrometry, e.g. infrared or optical thermometry using electric radiation detectors using capacitors, e.g. pyroelectric capacitors
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N15/00Thermoelectric devices without a junction of dissimilar materials; Thermomagnetic devices, e.g. using the Nernst-Ettingshausen effect
    • H10N15/10Thermoelectric devices using thermal change of the dielectric constant, e.g. working above and below the Curie point
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10NELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N19/00Integrated devices, or assemblies of multiple devices, comprising at least one thermoelectric or thermomagnetic element covered by groups H10N10/00 - H10N15/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/30Technical effects
    • H01L2924/38Effects and problems related to the device integration
    • H01L2924/381Pitch distance

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Computer Hardware Design (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
IL82535A 1986-09-02 1987-05-14 Thermally insulative and electrically conductive interconnect and process for making same IL82535A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US06/902,733 US4740700A (en) 1986-09-02 1986-09-02 Thermally insulative and electrically conductive interconnect and process for making same

Publications (2)

Publication Number Publication Date
IL82535A0 IL82535A0 (en) 1987-11-30
IL82535A true IL82535A (en) 1991-08-16

Family

ID=25416327

Family Applications (1)

Application Number Title Priority Date Filing Date
IL82535A IL82535A (en) 1986-09-02 1987-05-14 Thermally insulative and electrically conductive interconnect and process for making same

Country Status (6)

Country Link
US (1) US4740700A (fr)
EP (1) EP0279814B1 (fr)
JP (1) JP2565524B2 (fr)
DE (1) DE3785448T2 (fr)
IL (1) IL82535A (fr)
WO (1) WO1988001793A1 (fr)

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US5236871A (en) * 1992-04-29 1993-08-17 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Method for producing a hybridization of detector array and integrated circuit for readout
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US5342207A (en) * 1992-12-14 1994-08-30 Hughes Aircraft Company Electrical interconnection method and apparatus utilizing raised connecting means
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JPH0767151B2 (ja) * 1993-02-25 1995-07-19 日本電気株式会社 赤外線撮像装置
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US5653892A (en) * 1994-04-04 1997-08-05 Texas Instruments Incorporated Etching of ceramic materials with an elevated thin film
US5679267A (en) * 1994-04-04 1997-10-21 Texas Instruments Incorporated Dual etching of ceramic materials with an elevated thin film
US5478242A (en) * 1994-04-29 1995-12-26 Texas Instruments Incorporated Thermal isolation of hybrid thermal detectors through an anisotropic etch
US5424544A (en) * 1994-04-29 1995-06-13 Texas Instruments Incorporated Inter-pixel thermal isolation for hybrid thermal detectors
US5457318A (en) * 1994-04-29 1995-10-10 Texas Instruments Incorporated Thermal detector apparatus and method using reduced thermal capacity
US5426303A (en) * 1994-04-29 1995-06-20 Texas Instruments Incorporated Thermal isolation structure for hybrid thermal detectors
EP0827190A3 (fr) * 1994-06-24 1998-09-02 Industrial Technology Research Institute Structure de plot de contact et méthodes pour sa fabrication
US5574282A (en) * 1994-06-30 1996-11-12 Texas Instruments Incorporated Thermal isolation for hybrid thermal detectors
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US5646066A (en) * 1995-03-01 1997-07-08 Texas Instruments Incorporated Method for forming electrical contact to the optical coating of an infrared detector from the backside of the detector
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US5638599A (en) * 1995-03-29 1997-06-17 Texas Instruments Incorporated Method of fabricating hybrid uncooled infrared detectors
US5578527A (en) * 1995-06-23 1996-11-26 Industrial Technology Research Institute Connection construction and method of manufacturing the same
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US6080987A (en) * 1997-10-28 2000-06-27 Raytheon Company Infrared-sensitive conductive-polymer coating
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US6130148A (en) * 1997-12-12 2000-10-10 Farnworth; Warren M. Interconnect for semiconductor components and method of fabrication
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DE10016132A1 (de) * 2000-03-31 2001-10-18 Infineon Technologies Ag Elektronisches Bauelement mit flexiblen Kontaktierungsstellen und Verfahren zu dessen Herstellung
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DE10116069C2 (de) * 2001-04-02 2003-02-20 Infineon Technologies Ag Elektronisches Bauteil mit einem Halbleiterchip und Verfahren zu seiner Herstellung
US7132736B2 (en) * 2001-10-31 2006-11-07 Georgia Tech Research Corporation Devices having compliant wafer-level packages with pillars and methods of fabrication
DE10238582B4 (de) * 2002-08-22 2006-01-19 Infineon Technologies Ag Verfahren zur Herstellung eines Verbundes aus einer getesteten integrierten Schaltung und einer elektrischen Einrichtung
US7335979B2 (en) * 2004-06-28 2008-02-26 Intel Corporation Device and method for tilted land grid array interconnects on a coreless substrate package
JP4583939B2 (ja) * 2005-01-14 2010-11-17 日東電工株式会社 配線回路基板の製造方法
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US8178965B2 (en) * 2007-03-14 2012-05-15 Infineon Technologies Ag Semiconductor module having deflecting conductive layer over a spacer structure
DE102007046451B4 (de) * 2007-09-28 2011-08-25 Pyreos Ltd. Vorrichtung zur Detektion von Wärmestrahlung mit hoher Auflösung, Verfahren zum Herstellen und Verwendung der Vorrichtung
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US9348377B2 (en) * 2014-03-14 2016-05-24 Sandisk Enterprise Ip Llc Thermal isolation techniques
RU2662631C2 (ru) * 2014-05-05 2018-07-26 Дзе Проктер Энд Гэмбл Компани Гетерогенный материал, содержащий пеноматериал
US10729600B2 (en) 2015-06-30 2020-08-04 The Procter & Gamble Company Absorbent structure
CN108348387B (zh) 2015-11-04 2021-05-28 宝洁公司 吸收结构
BR112018009094A2 (pt) 2015-11-04 2018-11-06 Procter & Gamble estrutura absorvente
JP6766144B2 (ja) 2015-11-04 2020-10-07 ザ プロクター アンド ギャンブル カンパニーThe Procter & Gamble Company 吸収性構造体
CN108156746A (zh) * 2016-12-06 2018-06-12 华邦电子股份有限公司 多层电路板及其制造方法

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US4740700A (en) 1986-09-02 1988-04-26 Hughes Aircraft Company Thermally insulative and electrically conductive interconnect and process for making same

Also Published As

Publication number Publication date
IL82535A0 (en) 1987-11-30
US4740700A (en) 1988-04-26
DE3785448D1 (de) 1993-05-19
WO1988001793A1 (fr) 1988-03-10
EP0279814B1 (fr) 1993-04-14
EP0279814A1 (fr) 1988-08-31
DE3785448T2 (de) 1993-07-29
JP2565524B2 (ja) 1996-12-18
JPH01500706A (ja) 1989-03-09

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Legal Events

Date Code Title Description
KB Patent renewed
HC Change of name of proprietor(s)
KB Patent renewed
EXP Patent expired