IL69711A0 - Baffle system for glow discharge deposition apparatus - Google Patents
Baffle system for glow discharge deposition apparatusInfo
- Publication number
- IL69711A0 IL69711A0 IL69711A IL6971183A IL69711A0 IL 69711 A0 IL69711 A0 IL 69711A0 IL 69711 A IL69711 A IL 69711A IL 6971183 A IL6971183 A IL 6971183A IL 69711 A0 IL69711 A0 IL 69711A0
- Authority
- IL
- Israel
- Prior art keywords
- chambers
- gas
- deposition apparatus
- baffle system
- sweep
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3244—Gas supply means
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
- C23C16/545—Apparatus specially adapted for continuous coating for coating elongated substrates
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
- F16J—PISTONS; CYLINDERS; SEALINGS
- F16J15/00—Sealings
- F16J15/16—Sealings between relatively-moving surfaces
- F16J15/40—Sealings between relatively-moving surfaces by means of fluid
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Physical Vapour Deposition (AREA)
- Photovoltaic Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US41892982A | 1982-09-16 | 1982-09-16 |
Publications (1)
Publication Number | Publication Date |
---|---|
IL69711A0 true IL69711A0 (en) | 1983-12-30 |
Family
ID=23660124
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
IL69711A IL69711A0 (en) | 1982-09-16 | 1983-09-13 | Baffle system for glow discharge deposition apparatus |
Country Status (9)
Country | Link |
---|---|
EP (1) | EP0106521B1 (ja) |
JP (1) | JPS5968925A (ja) |
AT (1) | ATE26309T1 (ja) |
AU (1) | AU556652B2 (ja) |
CA (1) | CA1214751A (ja) |
DE (1) | DE3370655D1 (ja) |
IL (1) | IL69711A0 (ja) |
IN (1) | IN161171B (ja) |
PH (1) | PH21147A (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4678679A (en) * | 1984-06-25 | 1987-07-07 | Energy Conversion Devices, Inc. | Continuous deposition of activated process gases |
GB2223699A (en) * | 1988-08-25 | 1990-04-18 | S G Owen | An air knife |
US6159300A (en) * | 1996-12-17 | 2000-12-12 | Canon Kabushiki Kaisha | Apparatus for forming non-single-crystal semiconductor thin film, method for forming non-single-crystal semiconductor thin film, and method for producing photovoltaic device |
EP2630271B1 (en) | 2010-10-22 | 2021-03-24 | AGC Glass Europe | Modular coater separation |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2949498A (en) | 1955-10-31 | 1960-08-16 | Texas Instruments Inc | Solar energy converter |
BE760041A (fr) * | 1970-01-02 | 1971-05-17 | Ibm | Procede et appareil de transfert de masse gazeuse |
US3753809A (en) * | 1970-01-09 | 1973-08-21 | Ibm | Method for obtaining optimum phosphorous concentration in semiconductor wafers |
US3868104A (en) * | 1973-07-26 | 1975-02-25 | Little Inc A | Contactless fluid seal |
US4048955A (en) * | 1975-09-02 | 1977-09-20 | Texas Instruments Incorporated | Continuous chemical vapor deposition reactor |
US4217374A (en) | 1978-03-08 | 1980-08-12 | Energy Conversion Devices, Inc. | Amorphous semiconductors equivalent to crystalline semiconductors |
US4410558A (en) | 1980-05-19 | 1983-10-18 | Energy Conversion Devices, Inc. | Continuous amorphous solar cell production system |
-
1983
- 1983-09-06 IN IN1084/CAL/83A patent/IN161171B/en unknown
- 1983-09-09 AU AU18977/83A patent/AU556652B2/en not_active Ceased
- 1983-09-12 AT AT83305308T patent/ATE26309T1/de not_active IP Right Cessation
- 1983-09-12 DE DE8383305308T patent/DE3370655D1/de not_active Expired
- 1983-09-12 JP JP58168084A patent/JPS5968925A/ja active Granted
- 1983-09-12 EP EP83305308A patent/EP0106521B1/en not_active Expired
- 1983-09-13 PH PH29532A patent/PH21147A/en unknown
- 1983-09-13 IL IL69711A patent/IL69711A0/xx unknown
- 1983-09-16 CA CA000436882A patent/CA1214751A/en not_active Expired
Also Published As
Publication number | Publication date |
---|---|
PH21147A (en) | 1987-07-27 |
DE3370655D1 (en) | 1987-05-07 |
EP0106521A2 (en) | 1984-04-25 |
EP0106521A3 (en) | 1984-07-11 |
CA1214751A (en) | 1986-12-02 |
ATE26309T1 (de) | 1987-04-15 |
JPH0365653B2 (ja) | 1991-10-14 |
JPS5968925A (ja) | 1984-04-19 |
AU1897783A (en) | 1984-03-22 |
IN161171B (ja) | 1987-10-10 |
EP0106521B1 (en) | 1987-04-01 |
AU556652B2 (en) | 1986-11-13 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4994301A (en) | ACVD (chemical vapor deposition) method for selectively depositing metal on a substrate | |
TW347416B (en) | Post treatment method for in-situ cleaning | |
SE9400038L (sv) | Sätt och anordning för att bilda en beläggning genom pyrolys | |
DE3370655D1 (en) | Baffle system for glow discharge deposition apparatus | |
MY132166A (en) | Method for tuning barrel reactor purge system | |
JPS5790933A (en) | Manufacture of amorphous semiconductor film | |
JPS57100720A (en) | Manufacture of amorphous semiconductor film | |
EP0167374A3 (en) | Chemical vapor deposition wafer boat | |
TW369666B (en) | A depositing apparatus of molecularity impurities | |
JPS57166033A (en) | Applying device for resist with adjusting mechanism for quantity of exhaust gas | |
JPH02200784A (ja) | Cvd電極 | |
ES344947A1 (es) | Metodo y aparato para producir y mantener un plasma gaseo- so. | |
JPH05175130A (ja) | プラズマcvd装置 | |
JPS59150417A (ja) | 気相成長方法およびその装置 | |
JPH0758699B2 (ja) | ▲iii▼−▲v▼族化合物半導体ウエハーのアニール方法 | |
JPS57138128A (en) | Cvd device | |
JPS6411323A (en) | Semiconductor manufacturing device | |
JPH04228573A (ja) | プラズマ化学気相堆積装置における微粒子汚染減少方法 | |
JPS58161317A (ja) | 半導体処理装置 | |
JPH04293784A (ja) | プラズマcvd装置 | |
TW278207B (en) | Method and apparatus for deposition of material on a semiconductor wafer | |
JPS57175720A (en) | Method for forming silicon film | |
JPS63229711A (ja) | 成膜装置 | |
JPH04163911A (ja) | 光cvd装置 | |
JPS5587439A (en) | Manufacture of semiconductor device |