IL225715A - Packaging abusive radiation detector - Google Patents

Packaging abusive radiation detector

Info

Publication number
IL225715A
IL225715A IL225715A IL22571513A IL225715A IL 225715 A IL225715 A IL 225715A IL 225715 A IL225715 A IL 225715A IL 22571513 A IL22571513 A IL 22571513A IL 225715 A IL225715 A IL 225715A
Authority
IL
Israel
Prior art keywords
detector
opaque
solder
seal ring
substrate
Prior art date
Application number
IL225715A
Other languages
English (en)
Hebrew (he)
Other versions
IL225715A0 (en
Original Assignee
Raytheon Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Raytheon Co filed Critical Raytheon Co
Publication of IL225715A0 publication Critical patent/IL225715A0/en
Publication of IL225715A publication Critical patent/IL225715A/en

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/80—Constructional details of image sensors
    • H10F39/804—Containers or encapsulations
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J5/00—Radiation pyrometry, e.g. infrared or optical thermometry
    • G01J5/02—Constructional details
    • G01J5/04—Casings
    • G01J5/041—Mountings in enclosures or in a particular environment
    • G01J5/045—Sealings; Vacuum enclosures; Encapsulated packages; Wafer bonding structures; Getter arrangements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L24/00—Arrangements for connecting or disconnecting semiconductor or solid-state bodies; Methods or apparatus related thereto
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    • H01L24/02—Bonding areas ; Manufacturing methods related thereto
    • H01L24/04—Structure, shape, material or disposition of the bonding areas prior to the connecting process
    • H01L24/05—Structure, shape, material or disposition of the bonding areas prior to the connecting process of an individual bonding area
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    • H01—ELECTRIC ELEMENTS
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    • H01L24/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L24/28—Structure, shape, material or disposition of the layer connectors prior to the connecting process
    • H01L24/29—Structure, shape, material or disposition of the layer connectors prior to the connecting process of an individual layer connector
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    • H01—ELECTRIC ELEMENTS
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    • H01L24/93—Batch processes
    • H01L24/94—Batch processes at wafer-level, i.e. with connecting carried out on a wafer comprising a plurality of undiced individual devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
    • H10F39/00—Integrated devices, or assemblies of multiple devices, comprising at least one element covered by group H10F30/00, e.g. radiation detectors comprising photodiode arrays
    • H10F39/011—Manufacture or treatment of image sensors covered by group H10F39/12
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B81—MICROSTRUCTURAL TECHNOLOGY
    • B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
    • B81B7/00—Microstructural systems; Auxiliary parts of microstructural devices or systems
    • B81B7/0032—Packages or encapsulation
    • B81B7/0077—Other packages not provided for in groups B81B7/0035 - B81B7/0074
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  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
  • Solid State Image Pick-Up Elements (AREA)
  • Transforming Light Signals Into Electric Signals (AREA)
IL225715A 2010-10-21 2011-10-20 Packaging abusive radiation detector IL225715A (en)

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Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN103728025A (zh) * 2012-10-10 2014-04-16 中国科学院微电子研究所 一种非制冷红外成像焦平面阵列探测器
US8736045B1 (en) * 2012-11-02 2014-05-27 Raytheon Company Integrated bondline spacers for wafer level packaged circuit devices
US9673169B2 (en) 2013-02-05 2017-06-06 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for a wafer seal ring
US9287188B2 (en) * 2013-02-05 2016-03-15 Taiwan Semiconductor Manufacturing Company, Ltd. Method and apparatus for a seal ring structure
JP2014186006A (ja) * 2013-03-25 2014-10-02 Toshiba Corp 赤外線撮像装置および赤外線撮像モジュール
NO2944700T3 (enExample) 2013-07-11 2018-03-17
EP3051582B1 (en) * 2013-09-27 2020-01-22 Kyocera Corporation Lid body, package, and electronic apparatus
JP6344555B2 (ja) * 2014-05-28 2018-06-20 パナソニックＩｐマネジメント株式会社 固体撮像装置
US9334154B2 (en) 2014-08-11 2016-05-10 Raytheon Company Hermetically sealed package having stress reducing layer
JP6891202B2 (ja) * 2014-08-11 2021-06-18 レイセオン カンパニー 応力低減レイヤを有する密封されたパッケージ
JP6891203B2 (ja) * 2014-08-11 2021-06-18 レイセオン カンパニー 応力低減レイヤを有する密封されたパッケージ
CN106414309B (zh) * 2014-08-11 2020-02-28 雷声公司 具有应力减小层的气密性密封封装
US9508681B2 (en) * 2014-12-22 2016-11-29 Google Inc. Stacked semiconductor chip RGBZ sensor
US9756273B2 (en) * 2015-03-04 2017-09-05 Sensors Unlimited, Inc. Multi-tiered tamper-resistant assembly system and method
CN104779214A (zh) * 2015-04-16 2015-07-15 歌尔声学股份有限公司 集成传感器的封装结构
US9771258B2 (en) 2015-06-24 2017-09-26 Raytheon Company Wafer level MEMS package including dual seal ring
US20170081178A1 (en) * 2015-09-22 2017-03-23 Freescale Semiconductor, Inc. Semiconductor device package with seal structure
US9570321B1 (en) 2015-10-20 2017-02-14 Raytheon Company Use of an external getter to reduce package pressure
JP2018146263A (ja) 2017-03-01 2018-09-20 浜松ホトニクス株式会社 光検出器
CN107681017B (zh) * 2017-09-26 2019-04-09 中国科学院长春光学精密机械与物理研究所 一种自下而上生长AlGaN基紫外及深紫外探测器阵列的方法
JP7292077B2 (ja) * 2018-07-11 2023-06-16 三菱電機株式会社 パッケージ素子の製造方法およびパッケージ素子
US11515220B2 (en) * 2019-12-04 2022-11-29 Advanced Semiconductor Engineering, Inc. Semiconductor package structures and methods of manufacturing the same

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5962854A (en) * 1996-06-12 1999-10-05 Ishizuka Electronics Corporation Infrared sensor and infrared detector
KR20030023613A (ko) * 2000-02-02 2003-03-19 레이던 컴퍼니 집적회로 컴포넌트를 구비하는 마이크로전기기계 시스템의진공 패키징 방법 및 진공 패키지
US6521477B1 (en) * 2000-02-02 2003-02-18 Raytheon Company Vacuum package fabrication of integrated circuit components
US6876052B1 (en) * 2000-05-12 2005-04-05 National Semiconductor Corporation Package-ready light-sensitive integrated circuit and method for its preparation
US20040232535A1 (en) * 2003-05-22 2004-11-25 Terry Tarn Microelectromechanical device packages with integral heaters
KR101258864B1 (ko) 2004-12-07 2013-04-29 썬더버드 테크놀로지스, 인코포레이티드 긴장된 실리콘, 게이트 엔지니어링된 페르미－ｆｅｔ
US7262412B2 (en) 2004-12-10 2007-08-28 L-3 Communications Corporation Optically blocked reference pixels for focal plane arrays
US20060257785A1 (en) * 2005-05-13 2006-11-16 Johnson Donald W Method of forming a photoresist element
JP4937623B2 (ja) * 2006-03-29 2012-05-23 シチズンホールディングス株式会社 半導体装置の製造方法
US8115305B2 (en) * 2007-05-17 2012-02-14 Stats Chippac Ltd. Integrated circuit package system with thin profile
JP4665959B2 (ja) 2007-11-30 2011-04-06 日本電気株式会社 真空パッケージ
US8173471B2 (en) * 2008-04-29 2012-05-08 Solid State System Co., Ltd. Method for fabricating micro-electro-mechanical system (MEMS) device

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US8809784B2 (en) 2014-08-19
EP2630660A1 (en) 2013-08-28
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TW201234633A (en) 2012-08-16
TWI597859B (zh) 2017-09-01

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