IL138928A - שיטת הכנה וטיהור של דיבוראן - Google Patents

שיטת הכנה וטיהור של דיבוראן

Info

Publication number
IL138928A
IL138928A IL13892899A IL13892899A IL138928A IL 138928 A IL138928 A IL 138928A IL 13892899 A IL13892899 A IL 13892899A IL 13892899 A IL13892899 A IL 13892899A IL 138928 A IL138928 A IL 138928A
Authority
IL
Israel
Prior art keywords
diborane
inorganic
composition
temperature
contacting step
Prior art date
Application number
IL13892899A
Other languages
English (en)
Other versions
IL138928A0 (en
Original Assignee
Uhp Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uhp Materials Inc filed Critical Uhp Materials Inc
Priority to IL15956999A priority Critical patent/IL159569A0/xx
Publication of IL138928A0 publication Critical patent/IL138928A0/xx
Publication of IL138928A publication Critical patent/IL138928A/he

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C01B9/08—Fluorides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C01B35/02—Boron; Borides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
    • C01B6/10—Monoborane; Diborane; Addition complexes thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/34—Purification; Stabilisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Silicon Compounds (AREA)
  • Discharge Lamp (AREA)
IL13892899A 1998-04-09 1999-04-09 שיטת הכנה וטיהור של דיבוראן IL138928A (he)

Priority Applications (1)

Application Number Priority Date Filing Date Title
IL15956999A IL159569A0 (en) 1998-04-09 1999-04-09 A process for removing carbon dioxide from a mixture comprising it together with an inorganic hydride

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US8124998P 1998-04-09 1998-04-09
PCT/US1999/007866 WO1999052817A1 (en) 1998-04-09 1999-04-09 Preparation and purification of diborane

Publications (2)

Publication Number Publication Date
IL138928A0 IL138928A0 (en) 2001-11-25
IL138928A true IL138928A (he) 2004-03-28

Family

ID=22163016

Family Applications (2)

Application Number Title Priority Date Filing Date
IL13892899A IL138928A (he) 1998-04-09 1999-04-09 שיטת הכנה וטיהור של דיבוראן
IL159569A IL159569A (he) 1998-04-09 2003-12-24 תהליך להסרת דו תחמוצת הפחמן מתערובת המכילה אותו ביחד עם הידריד אנאורגני

Family Applications After (1)

Application Number Title Priority Date Filing Date
IL159569A IL159569A (he) 1998-04-09 2003-12-24 תהליך להסרת דו תחמוצת הפחמן מתערובת המכילה אותו ביחד עם הידריד אנאורגני

Country Status (15)

Country Link
US (3) US6165434A (he)
EP (1) EP1087906B1 (he)
JP (1) JP2002511376A (he)
KR (2) KR100627920B1 (he)
CN (1) CN1309619A (he)
AU (1) AU749603B2 (he)
BR (1) BR9909531A (he)
CA (1) CA2327658A1 (he)
DE (1) DE69934889T2 (he)
IL (2) IL138928A (he)
MX (1) MXPA00009799A (he)
NO (1) NO20005048L (he)
PL (1) PL343430A1 (he)
TW (1) TWI221828B (he)
WO (1) WO1999052817A1 (he)

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JP2002511376A (ja) 1998-04-09 2002-04-16 ユーエイチピー・マテリアルズ・インコーポレーテッド ジボランの調製および精製
US6790419B1 (en) * 1999-06-11 2004-09-14 Honeywell Intellectual Properties Inc. Purification of gaseous inorganic halide
WO2005072853A1 (ja) * 2004-01-29 2005-08-11 Taiyo Nippon Sanso Corporation 排ガス処理剤および排ガス処理方法ならびに排ガス処理装置
US7521036B2 (en) * 2004-02-26 2009-04-21 General Motors Corporation Hydrogen storage materials and methods including hydrides and hydroxides
CN101269293B (zh) * 2007-03-20 2012-02-01 财团法人工业技术研究院 用于处理腐蚀性气体的净化剂及其净化方法
US20090087970A1 (en) * 2007-09-27 2009-04-02 Applied Materials, Inc. Method of producing a dopant gas species
JP5373508B2 (ja) * 2009-08-27 2013-12-18 住友精化株式会社 ジボランの製造方法
CN101955156A (zh) * 2010-06-07 2011-01-26 天津市泰源工业气体有限公司 吸附分离提纯方式制备高纯乙硼烷方法的工艺技术
CN102258933B (zh) * 2011-05-21 2013-04-03 南京中锗科技股份有限公司 一种锗烷生产系统尾气的处理方法
RU2533491C1 (ru) * 2013-08-08 2014-11-20 Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП "ГНИИХТЭОС") Способ получения хемосорбента для очистки инертных газов и газов-восстановителей от примесей
CN104086576A (zh) * 2014-07-18 2014-10-08 上海格物致知医药科技有限公司 高纯度硼烷气体的制备方法及该硼烷气体的应用
CN110950382B (zh) * 2018-09-26 2022-03-15 紫石能源有限公司 砷烷的制备方法
KR102193572B1 (ko) 2019-01-15 2020-12-22 대성산업가스 주식회사 삼불화붕소 동시반응공정을 이용한 고순도의 디보레인 제조방법 및 그 제조장치
KR102304981B1 (ko) * 2019-11-29 2021-09-27 주식회사 에프알디 디보란 합성 및 정제 장치
CN111892020A (zh) * 2020-08-14 2020-11-06 河南科技大学 一种高纯度电子级乙硼烷的合成方法及装置
KR102521600B1 (ko) * 2021-08-05 2023-04-14 주식회사 에프알디 디보란 합성 및 정제 장치
CN114870804B (zh) * 2022-06-10 2022-12-09 大连科利德光电子材料有限公司 一种杂质气体吸附剂及其制备方法和应用
CN115403011B (zh) * 2022-09-13 2023-11-24 中船(邯郸)派瑞特种气体股份有限公司 一种高纯乙硼烷的制备纯化方法
CN116573612B (zh) * 2023-04-14 2025-08-29 太和气体（荆州）有限公司 一种高纯乙硼烷的制备工艺及设备
KR102927447B1 (ko) 2023-09-08 2026-02-13 (주)원익머트리얼즈 고순도 디보란(b2h6)의 제조방법

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FR2494696A1 (fr) * 1980-11-21 1982-05-28 Roussel Uclaf Nouveau procede de preparation de steroides 3-amines et leurs sels
JPS604127B2 (ja) * 1981-08-06 1985-02-01 セントラル硝子株式会社 四弗化珪素ガスの精製法
US4388284A (en) * 1981-09-18 1983-06-14 The Ohio State University Research Foundation Dry process for producing diborane
JPS58128146A (ja) * 1982-01-27 1983-07-30 Nippon Sanso Kk 吸収処理剤
JPS5949822A (ja) * 1982-09-14 1984-03-22 Nippon Sanso Kk 揮発性無機水素化物等を含有するガスの処理方法
FR2537967A1 (fr) * 1982-12-17 1984-06-22 Ugine Kuhlmann Procede de purification de l'acide sulfurique sous-produit de la synthese du trifluorure de bore
JPS62152519A (ja) * 1985-12-26 1987-07-07 Iwatani & Co ハロゲン系廃ガスの乾式処理方法
JPS6319945A (ja) 1986-07-12 1988-01-27 Nec Corp 相手局起動不良の監視方式
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US4702898A (en) * 1986-10-17 1987-10-27 Union Carbide Corporation Process for the removal of acid gases from gas mixtures
JPS63152519A (ja) 1986-12-05 1988-06-25 三菱重工業株式会社 圧縮梱包装置
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US5242670A (en) * 1992-07-02 1993-09-07 Gehringer Ronald C Method for hydrofluoric acid digestion of silica/alumina matrix material for the production of silicon tetrafluoride, aluminum fluoride and other residual metal fluorides and oxides
JP2731492B2 (ja) * 1992-10-19 1998-03-25 出光石油化学株式会社 三フッ化ホウ素の回収方法
IL103918A (en) * 1992-11-29 1996-10-16 Hamit Energy As Method for reducing atmospheric pollution caused by SO2
JP2561616B2 (ja) * 1993-03-17 1996-12-11 日本酸素株式会社 有害成分の固体除去剤
US5385689A (en) * 1993-06-29 1995-01-31 Novapure Corporation Process and composition for purifying semiconductor process gases to remove Lewis acid and oxidant impurities therefrom
EP0662339A3 (en) * 1994-01-07 1996-11-13 Osaka Oxygen Ind Method for removing water from gases.
JPH07308538A (ja) * 1994-03-24 1995-11-28 Japan Pionics Co Ltd 有害ガスの浄化剤
JPH08215538A (ja) * 1995-02-17 1996-08-27 Central Glass Co Ltd ハロゲン系ガスの除去法
US6075174A (en) * 1995-05-08 2000-06-13 Bp Amoco Corporation BF3 removal from BF3 catalyzed olefin oligomer
US5705727A (en) * 1995-06-13 1998-01-06 Amoco Corporation BF3 recovery process
US5882615A (en) * 1995-07-28 1999-03-16 Japan Pionics Co., Ltd. Cleaning agent and cleaning process for harmful gas
EP0791557B1 (en) * 1996-02-20 1999-09-22 Nippon Petrochemicals Co., Ltd. Method for separating and recovering boron trifluoride
JP2002511376A (ja) * 1998-04-09 2002-04-16 ユーエイチピー・マテリアルズ・インコーポレーテッド ジボランの調製および精製

Also Published As

Publication number Publication date
US20030103885A1 (en) 2003-06-05
JP2002511376A (ja) 2002-04-16
KR100627920B1 (ko) 2006-09-25
US6660238B2 (en) 2003-12-09
BR9909531A (pt) 2001-12-26
EP1087906A4 (en) 2005-11-09
KR100731836B1 (ko) 2007-06-25
DE69934889T2 (de) 2007-07-05
AU3488299A (en) 1999-11-01
WO1999052817A1 (en) 1999-10-21
EP1087906B1 (en) 2007-01-17
MXPA00009799A (es) 2002-05-08
CN1309619A (zh) 2001-08-22
IL138928A0 (en) 2001-11-25
PL343430A1 (en) 2001-08-13
TWI221828B (en) 2004-10-11
EP1087906A1 (en) 2001-04-04
IL159569A (he) 2006-08-01
US6517796B1 (en) 2003-02-11
AU749603B2 (en) 2002-06-27
KR20010042581A (ko) 2001-05-25
US6165434A (en) 2000-12-26
NO20005048D0 (no) 2000-10-06
KR20060030921A (ko) 2006-04-11
NO20005048L (no) 2000-12-08
CA2327658A1 (en) 1999-10-21
DE69934889D1 (de) 2007-03-08

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Legal Events

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MM9K Patent not in force due to non-payment of renewal fees