NO20005048L - Fremgangsmåte og rensing av diboran - Google Patents

Fremgangsmåte og rensing av diboran

Info

Publication number
NO20005048L
NO20005048L NO20005048A NO20005048A NO20005048L NO 20005048 L NO20005048 L NO 20005048L NO 20005048 A NO20005048 A NO 20005048A NO 20005048 A NO20005048 A NO 20005048A NO 20005048 L NO20005048 L NO 20005048L
Authority
NO
Norway
Prior art keywords
diborane
purification
Prior art date
Application number
NO20005048A
Other languages
English (en)
Other versions
NO20005048D0 (no
Inventor
Dalbir S Millet
Original Assignee
Uhp Materials Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Uhp Materials Inc filed Critical Uhp Materials Inc
Publication of NO20005048D0 publication Critical patent/NO20005048D0/no
Publication of NO20005048L publication Critical patent/NO20005048L/no

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B9/00—General methods of preparing halides
    • C01B9/08—Fluorides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B35/00—Boron; Compounds thereof
    • C01B35/02—Boron; Borides
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/06—Hydrides of aluminium, gallium, indium, thallium, germanium, tin, lead, arsenic, antimony, bismuth or polonium; Monoborane; Diborane; Addition complexes thereof
    • C01B6/10—Monoborane; Diborane; Addition complexes thereof
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B6/00—Hydrides of metals including fully or partially hydrided metals, alloys or intermetallic compounds ; Compounds containing at least one metal-hydrogen bond, e.g. (GeH3)2S, SiH GeH; Monoborane or diborane; Addition complexes thereof
    • C01B6/34—Purification; Stabilisation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Silicon Compounds (AREA)
  • Discharge Lamp (AREA)
NO20005048A 1998-04-09 2000-10-06 Fremgangsmåte og rensing av diboran NO20005048L (no)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US8124998P 1998-04-09 1998-04-09
PCT/US1999/007866 WO1999052817A1 (en) 1998-04-09 1999-04-09 Preparation and purification of diborane

Publications (2)

Publication Number Publication Date
NO20005048D0 NO20005048D0 (no) 2000-10-06
NO20005048L true NO20005048L (no) 2000-12-08

Family

ID=22163016

Family Applications (1)

Application Number Title Priority Date Filing Date
NO20005048A NO20005048L (no) 1998-04-09 2000-10-06 Fremgangsmåte og rensing av diboran

Country Status (15)

Country Link
US (3) US6165434A (no)
EP (1) EP1087906B1 (no)
JP (1) JP2002511376A (no)
KR (2) KR100627920B1 (no)
CN (1) CN1309619A (no)
AU (1) AU749603B2 (no)
BR (1) BR9909531A (no)
CA (1) CA2327658A1 (no)
DE (1) DE69934889T2 (no)
IL (2) IL138928A (no)
MX (1) MXPA00009799A (no)
NO (1) NO20005048L (no)
PL (1) PL343430A1 (no)
TW (1) TWI221828B (no)
WO (1) WO1999052817A1 (no)

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US6790419B1 (en) * 1999-06-11 2004-09-14 Honeywell Intellectual Properties Inc. Purification of gaseous inorganic halide
EP1714690A4 (en) * 2004-01-29 2009-08-05 Taiyo Nippon Sanso Corp EXHAUST GAS, METHOD FOR TREATMENT OF EXHAUST GAS AND DEVICE FOR TREATMENT OF EXHAUST GAS
US7521036B2 (en) * 2004-02-26 2009-04-21 General Motors Corporation Hydrogen storage materials and methods including hydrides and hydroxides
CN101269293B (zh) * 2007-03-20 2012-02-01 财团法人工业技术研究院 用于处理腐蚀性气体的净化剂及其净化方法
US20090087970A1 (en) * 2007-09-27 2009-04-02 Applied Materials, Inc. Method of producing a dopant gas species
JP5373508B2 (ja) * 2009-08-27 2013-12-18 住友精化株式会社 ジボランの製造方法
CN101955156A (zh) * 2010-06-07 2011-01-26 天津市泰源工业气体有限公司 吸附分离提纯方式制备高纯乙硼烷方法的工艺技术
CN102258933B (zh) * 2011-05-21 2013-04-03 南京中锗科技股份有限公司 一种锗烷生产系统尾气的处理方法
RU2533491C1 (ru) * 2013-08-08 2014-11-20 Федеральное государственное унитарное предприятие "Государственный ордена Трудового Красного Знамени научно-исследовательский институт химии и технологии элементоорганических соединений" (ФГУП "ГНИИХТЭОС") Способ получения хемосорбента для очистки инертных газов и газов-восстановителей от примесей
CN104086576A (zh) * 2014-07-18 2014-10-08 上海格物致知医药科技有限公司 高纯度硼烷气体的制备方法及该硼烷气体的应用
CN110950382B (zh) * 2018-09-26 2022-03-15 紫石能源有限公司 砷烷的制备方法
KR102193572B1 (ko) 2019-01-15 2020-12-22 대성산업가스 주식회사 삼불화붕소 동시반응공정을 이용한 고순도의 디보레인 제조방법 및 그 제조장치
KR102304981B1 (ko) * 2019-11-29 2021-09-27 주식회사 에프알디 디보란 합성 및 정제 장치
CN111892020A (zh) * 2020-08-14 2020-11-06 河南科技大学 一种高纯度电子级乙硼烷的合成方法及装置
KR102521600B1 (ko) * 2021-08-05 2023-04-14 주식회사 에프알디 디보란 합성 및 정제 장치
CN114870804B (zh) * 2022-06-10 2022-12-09 大连科利德光电子材料有限公司 一种杂质气体吸附剂及其制备方法和应用
CN115403011B (zh) * 2022-09-13 2023-11-24 中船(邯郸)派瑞特种气体股份有限公司 一种高纯乙硼烷的制备纯化方法

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US2994586A (en) * 1953-11-06 1961-08-01 Callery Chemical Co Purification of diborane
US4298587A (en) * 1980-10-28 1981-11-03 Atlantic Richfield Company Silicon purification
FR2494696A1 (fr) * 1980-11-21 1982-05-28 Roussel Uclaf Nouveau procede de preparation de steroides 3-amines et leurs sels
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JPS63156537A (ja) * 1987-11-20 1988-06-29 Nippon Sanso Kk 揮発性無機水素化物および揮発性無機ハロゲン化物の吸収処理剤並びにその吸収処理方法
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JP2731492B2 (ja) * 1992-10-19 1998-03-25 出光石油化学株式会社 三フッ化ホウ素の回収方法
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JPH07308538A (ja) * 1994-03-24 1995-11-28 Japan Pionics Co Ltd 有害ガスの浄化剤
JPH08215538A (ja) * 1995-02-17 1996-08-27 Central Glass Co Ltd ハロゲン系ガスの除去法
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DE69700536T2 (de) * 1996-02-20 2000-05-18 Nippon Petrochemicals Co Ltd Verfahren zur Abscheidung und Rückgewinnung von Bortrifluorid
KR100627920B1 (ko) * 1998-04-09 2006-09-25 허니웰 인터내셔널 인코포레이티드 디보란의 제조 및 정제

Also Published As

Publication number Publication date
US6517796B1 (en) 2003-02-11
KR20010042581A (ko) 2001-05-25
NO20005048D0 (no) 2000-10-06
AU3488299A (en) 1999-11-01
IL159569A (en) 2006-08-01
DE69934889T2 (de) 2007-07-05
US20030103885A1 (en) 2003-06-05
PL343430A1 (en) 2001-08-13
CN1309619A (zh) 2001-08-22
EP1087906B1 (en) 2007-01-17
CA2327658A1 (en) 1999-10-21
BR9909531A (pt) 2001-12-26
KR100627920B1 (ko) 2006-09-25
WO1999052817A1 (en) 1999-10-21
JP2002511376A (ja) 2002-04-16
IL138928A (en) 2004-03-28
IL138928A0 (en) 2001-11-25
KR20060030921A (ko) 2006-04-11
DE69934889D1 (de) 2007-03-08
KR100731836B1 (ko) 2007-06-25
TWI221828B (en) 2004-10-11
US6660238B2 (en) 2003-12-09
MXPA00009799A (es) 2002-05-08
AU749603B2 (en) 2002-06-27
EP1087906A1 (en) 2001-04-04
US6165434A (en) 2000-12-26
EP1087906A4 (en) 2005-11-09

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Legal Events

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FC2A Withdrawal, rejection or dismissal of laid open patent application