IL125249A - הוצאת יוני אורתופוספיט מאמבטיות לציפוי ניקל ללא חשמל - Google Patents

הוצאת יוני אורתופוספיט מאמבטיות לציפוי ניקל ללא חשמל

Info

Publication number
IL125249A
IL125249A IL12524997A IL12524997A IL125249A IL 125249 A IL125249 A IL 125249A IL 12524997 A IL12524997 A IL 12524997A IL 12524997 A IL12524997 A IL 12524997A IL 125249 A IL125249 A IL 125249A
Authority
IL
Israel
Prior art keywords
acid
bath
calcium
ion
orthophosphite
Prior art date
Application number
IL12524997A
Other languages
English (en)
Other versions
IL125249A0 (en
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of IL125249A0 publication Critical patent/IL125249A0/xx
Publication of IL125249A publication Critical patent/IL125249A/he

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601—Process or apparatus
    • C23C18/1617—Purification and regeneration of coating baths
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31—Coating with metals
    • C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)
IL12524997A 1996-11-14 1997-11-13 הוצאת יוני אורתופוספיט מאמבטיות לציפוי ניקל ללא חשמל IL125249A (he)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US3087796P 1996-11-14 1996-11-14
PCT/US1997/020781 WO1998021381A1 (en) 1996-11-14 1997-11-13 Removal of orthophosphite ions from electroless nickel plating baths

Publications (2)

Publication Number Publication Date
IL125249A0 IL125249A0 (en) 1999-03-12
IL125249A true IL125249A (he) 2001-04-30

Family

ID=21856476

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12524997A IL125249A (he) 1996-11-14 1997-11-13 הוצאת יוני אורתופוספיט מאמבטיות לציפוי ניקל ללא חשמל

Country Status (8)

Country Link
US (1) US6048585A (he)
EP (1) EP0894156A4 (he)
JP (1) JP2000503354A (he)
CN (1) CN1208442A (he)
BR (1) BR9707124A (he)
CA (1) CA2241794A1 (he)
IL (1) IL125249A (he)
WO (1) WO1998021381A1 (he)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6490984B1 (en) * 1998-12-28 2002-12-10 Miyoshi Yushi Kabushiki Kaisha Method of making flue gas harmless
US6800121B2 (en) * 2002-06-18 2004-10-05 Atotech Deutschland Gmbh Electroless nickel plating solutions
DE10246453A1 (de) * 2002-10-04 2004-04-15 Enthone Inc., West Haven Verfahren zur stromlosen Abscheidung von Nickel
JP2005022956A (ja) * 2003-07-02 2005-01-27 Rohm & Haas Electronic Materials Llc セラミックの金属化
JP4486559B2 (ja) * 2005-07-12 2010-06-23 株式会社ムラタ 無電解めっき液の再生装置及び再生方法
US7787912B2 (en) * 2006-11-22 2010-08-31 Nokia Corporation Portable electronic device with double acting hinge arrangement
EP2072508A1 (fr) * 2007-12-19 2009-06-24 Galactic S.A. Procédé d'obtention de lactide
US8858693B2 (en) * 2011-01-11 2014-10-14 Omg Electronic Chemicals, Llc Electroless plating bath composition and method of plating particulate matter
US11685999B2 (en) * 2014-06-02 2023-06-27 Macdermid Acumen, Inc. Aqueous electroless nickel plating bath and method of using the same
US9708693B2 (en) * 2014-06-03 2017-07-18 Macdermid Acumen, Inc. High phosphorus electroless nickel
EP3325688B1 (en) * 2015-07-17 2021-02-24 Coventya Inc. Electroless nickel-phosphorous plating method using baths with reduced ion concentration
CN110760824A (zh) * 2019-11-07 2020-02-07 惠州市臻鼎环保科技有限公司 一种化学镀镍液的再生处理方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3420680A (en) * 1966-04-08 1969-01-07 Shipley Co Compositions and processes for electroless nickel plating
US4483711A (en) * 1983-06-17 1984-11-20 Omi International Corporation Aqueous electroless nickel plating bath and process
US4789484A (en) * 1988-02-22 1988-12-06 Occidental Chemical Corporation Treatment of electroless nickel plating baths
US5112392A (en) * 1991-06-21 1992-05-12 Martin Marietta Energy Systems, Inc. Recovery process for electroless plating baths
US5221328A (en) * 1991-11-27 1993-06-22 Mcgean-Rohco, Inc. Method of controlling orthophosphite ion concentration in hyphophosphite-based electroless plating baths
US5258061A (en) * 1992-11-20 1993-11-02 Monsanto Company Electroless nickel plating baths
US5277817A (en) * 1992-11-20 1994-01-11 Monsanto Company Apparatus and methods for treating electroless plating baths
US5338342A (en) * 1993-05-21 1994-08-16 Mallory Jr Glen O Stabilized electroless nickel plating baths
US5944879A (en) * 1997-02-19 1999-08-31 Elf Atochem North America, Inc. Nickel hypophosphite solutions containing increased nickel concentration

Also Published As

Publication number Publication date
JP2000503354A (ja) 2000-03-21
EP0894156A4 (en) 2002-06-26
US6048585A (en) 2000-04-11
BR9707124A (pt) 1999-07-20
CN1208442A (zh) 1999-02-17
WO1998021381A1 (en) 1998-05-22
IL125249A0 (en) 1999-03-12
CA2241794A1 (en) 1998-05-22
EP0894156A1 (en) 1999-02-03

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Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
RH1 Patent not in force