US3420680A - Compositions and processes for electroless nickel plating - Google Patents

Compositions and processes for electroless nickel plating Download PDF

Info

Publication number
US3420680A
US3420680A US541060A US3420680DA US3420680A US 3420680 A US3420680 A US 3420680A US 541060 A US541060 A US 541060A US 3420680D A US3420680D A US 3420680DA US 3420680 A US3420680 A US 3420680A
Authority
US
United States
Prior art keywords
nickel
hypophosphite
compositions
ions
consumption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
US541060A
Inventor
Michael Gulla
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shipley Co Inc
Original Assignee
Shipley Co Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shipley Co Inc filed Critical Shipley Co Inc
Application granted granted Critical
Publication of US3420680A publication Critical patent/US3420680A/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/32Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
    • C23C18/34Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents
    • C23C18/36Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents using hypophosphites

Definitions

  • the additive suppresses side reactions consumptive of hypophosphite, provides a more constant ratio of consumption of hypophosphite ions relative to nickel ions in storage and in use and suppresses gas generation and evolution in the body of the composition other than at the catalytic surface being plated.
  • This invention relates to improved processes of electroless nickel plating of catalytic surfaces employing baths of the nickel cation-hypophosphite anion type, the nickel ions being reduced to metal by the hypophosphite ions.
  • Electroless plating refers to plating by chemical reduction in the absence of an external electric source.
  • Electroless nickel deposition of the above type is well known and is disclosed for example in United States Patents Nos. 2,532,283; 2,762,723; 2,935,425; and 2,999,770, which disclose suitable materials, concentrations, operating temperatures, pH conditions and various additives such as buffers, complexing agents for the nickel ions, and stabilizers. Deposition occurs in the presence of a catalytic surface, generally a variety of metals as disclosed in the above patents. Also, non-catalytic surfaces, such as plastics, ceramics, or other dielectrics, may be sensitized with catalysts as disclosed in the above patents and as also disclosed in United States Patent No. 3,011,920.
  • Plating compositions are employed typically for several cycles by replenishment or addition of consumed ingredients during use to maintain approximately initial concentrations. One cycle represents one complete consumption and replenishment of the amount of nickel initially present.
  • Replenishment on a satisfactory basis of compositions of the above type require extensive and careful analysis. Consumption of ingredients has not been reasonably prebased upon the amount of nickel plated, especially with respect to the reducing agent, hypophosphite. A number of side reactions occur, even in storage, and it has been found necessary normally to analyze for hypophosphite as well as for nickel or other ingredients. Replenishment from a standard replenishment mixture is difiicult where the relative consumption of ingredients is not reasonably constant.
  • the amounts of the hydroxy propane sulfonic acid addition is not critical, small amounts providing some advantage and large amounts being tolerable. Generally, amounts as small as 0.25 gram per liter up to about 70 grams per liter or greater are useful. Preferred amounts are between about 1 and 20 grams per liter with about 5 grams per liter being most preferred as illustrated below. Addition of the sulfonic acid additive does not significantly alter the nature or concentrations of the materials useful as heretofore known, or the pH or temperature conditions of operation all of which are known and are illustrated in the above-mentioned patents.
  • compositions require a source of nickel ions in an amount sufficient to provide a useful deposit, a source of hypophosphite ion as reducing agent therefor, and acid or base to provide the desired pH which may generally be in the range of about 3 to about 11, but which is more preferably on the mildly acid side.
  • buffers, complexing or chelating agents for the nickel ions and stabilizers such as a source of trace quantities of sulfide ion, are preferred.
  • the above compositions were plated hot, for example at 200 F., over a steel surface.
  • As the stabilizer 1 part per million of lead was added as lead chloride to stabilize the above composition in accordance with the disclosure of United States Patent No. 2,762,723.
  • the concentration of hypop'hosphite and nickel was maintained by addition thereto of hypophosphite and nickel salts in the ratio of 3 to 1 molar. Additional lead stabilizer was added in the amount of /2 part per million per cycle of nickel consumption.
  • Example 1 and 2 above were plated through four complete cycles of nickel consumption without undue instability and without evidence of gas evolution other than at the surface being plated. At the end of four cycles, each example was analyzed for hypophosphite salt content which was determined to be 28 grams per liter for Example 1, and 32 grams per liter for Example 2, a 14% decrease in hypophosphite consumption. In these tests, deposition was accomplished in approximately twelve hours of bath operation and the losses in the hypophosphite in the case of Example 1 would have been far greater with more extended storage and deposition.
  • hypophosphite relative to nickel was relatively constant at the ratio of about 2.85 to 1 so that replenishment needs could be satisfactorily calculated on the basis of nickel concentration analysis without the necessity of frequent hypophosphite analysis.
  • the hydroxy propane sulfonic acid employed in the above tests was propane sultone obtained from the Shell Chemical Company and is fully described in its publication PD-145 in which it is noted that the propane sultone hydrolyzes in water to form the sulfonic acid.
  • the nickel sulfate is the source of nickel ions
  • the sodium hypophosphite is the source of hypophosphite ions
  • the hydrox y-acetic acid is a known chelating agent for the nickel ions.
  • an aqueous electroless nickel composition comprising a source of nickel ions in an amount sufficient to provide a useful deposit and a source of hypophosphite ions in an amount sufiicient to serve as a reducing agent therefor, the improvement comprising the addition of a member Selected from the group consisting of hydroxy propane sulfonic acid and salts thereof soluble in said aqueous electroless nickel composition.
  • composition according to claim 1 wherein said hydroxy propane sulfonic acid, or salts thereof, 'are present in an amount sufficient to suppress consumption of hypophosphite ions in use and storage.
  • composition according to claim 1 wherein said hydroxy-propane sulfonic acid is present in an amount between about 1 and 20 grams per liter.
  • composition according to claim 2 having a pH between about 3 and 11.
  • a process for electroless plating of nickel comprising contacting a catalytic surface with a composition according to claim 1 for a time sufficient to plate nickel, and removing said surface from contact with said composition.
  • a process for electroless plating of nickel comprising contacting a catalytic surface with 'a composition according to claim 2 for a time suificient to plate nickel, and removing said surface from contact with said composition.

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemically Coating (AREA)

Description

' dictable United States Patent 3,420,680 COMPOSITIONS AND PROCESSES FOR ELECTROLESS NICKEL PLATING Michael Gulla, Newton, Mass., assignor to Shipley Company, Inc., Newton, Mass., a corporation of Massachusetts No Drawing. Filed Apr. 8, 1966, Ser. No. 541,060 U.S. Cl. 1061 Int. Cl. C23c 3/02 ABSTRACT OF THE DISCLOSURE An electroless nickel plating composition characterized by the addition of hydroxy-propane sulfonic acid or a salt of hydroxy-propane sulfonic acid. The additive suppresses side reactions consumptive of hypophosphite, provides a more constant ratio of consumption of hypophosphite ions relative to nickel ions in storage and in use and suppresses gas generation and evolution in the body of the composition other than at the catalytic surface being plated.
This invention relates to improved processes of electroless nickel plating of catalytic surfaces employing baths of the nickel cation-hypophosphite anion type, the nickel ions being reduced to metal by the hypophosphite ions. Electroless plating refers to plating by chemical reduction in the absence of an external electric source.
Electroless nickel deposition of the above type is well known and is disclosed for example in United States Patents Nos. 2,532,283; 2,762,723; 2,935,425; and 2,999,770, which disclose suitable materials, concentrations, operating temperatures, pH conditions and various additives such as buffers, complexing agents for the nickel ions, and stabilizers. Deposition occurs in the presence of a catalytic surface, generally a variety of metals as disclosed in the above patents. Also, non-catalytic surfaces, such as plastics, ceramics, or other dielectrics, may be sensitized with catalysts as disclosed in the above patents and as also disclosed in United States Patent No. 3,011,920.
As recognized in the above patents, stability of such nickel compositions in extended deposition and storage is a continuing problem. Plating compositions are employed typically for several cycles by replenishment or addition of consumed ingredients during use to maintain approximately initial concentrations. One cycle represents one complete consumption and replenishment of the amount of nickel initially present.
Replenishment on a satisfactory basis of compositions of the above type require extensive and careful analysis. Consumption of ingredients has not been reasonably prebased upon the amount of nickel plated, especially with respect to the reducing agent, hypophosphite. A number of side reactions occur, even in storage, and it has been found necessary normally to analyze for hypophosphite as well as for nickel or other ingredients. Replenishment from a standard replenishment mixture is difiicult where the relative consumption of ingredients is not reasonably constant.
It is the principal object of the present invention to provide improved electroless plating compositions, and methods employing the same. Further objects include suppression of side reactions consumptive of hypophosphite, provision of a more constant ratio of consumption of hypophosphite ions relative to nickel ion in storage and use, and suppression of gas generation and evolution in the body of the composition other than at the catalytic surface being plated. Extraneous gas evolution of the above type is thought to be evidence of undesired decomposition in the bath and a potential source of insta- 7 Claims ice bility. Suppression of hypophosphite consumption in side reaction also suppresses production of phosphite ions, a known source of instability, the hypophosphite ions being oxidized to phosphite.
In accordance with this invention, it has been found that the addition of hydroxy propane sulfonic acid, or the compatible solution-soluble salts thereof, generally alkali-metal salts, to electroless nickel compositions of the nickel cation-hypophosphite anion type has the above stated advantages of suppressing hypophosphite consumption, of rendering it relatively constant with respect to nickel ion consumption, and in suppressing decomposition in the body of the solutions evidenced by evolution of gas.
The amounts of the hydroxy propane sulfonic acid addition is not critical, small amounts providing some advantage and large amounts being tolerable. Generally, amounts as small as 0.25 gram per liter up to about 70 grams per liter or greater are useful. Preferred amounts are between about 1 and 20 grams per liter with about 5 grams per liter being most preferred as illustrated below. Addition of the sulfonic acid additive does not significantly alter the nature or concentrations of the materials useful as heretofore known, or the pH or temperature conditions of operation all of which are known and are illustrated in the above-mentioned patents. Such compositions require a source of nickel ions in an amount sufficient to provide a useful deposit, a source of hypophosphite ion as reducing agent therefor, and acid or base to provide the desired pH which may generally be in the range of about 3 to about 11, but which is more preferably on the mildly acid side. In addition, buffers, complexing or chelating agents for the nickel ions and stabilizers such as a source of trace quantities of sulfide ion, are preferred.
The present invention is illustrated by the following examples.
Water, ti) make tliteri:
3-hyd1-0xy-l-propanesulfonic acid (hydrolysis product).
The above compositions were plated hot, for example at 200 F., over a steel surface. As the stabilizer, 1 part per million of lead was added as lead chloride to stabilize the above composition in accordance with the disclosure of United States Patent No. 2,762,723. During plating, the concentration of hypop'hosphite and nickel was maintained by addition thereto of hypophosphite and nickel salts in the ratio of 3 to 1 molar. Additional lead stabilizer was added in the amount of /2 part per million per cycle of nickel consumption.
Each of Examples 1 and 2 above were plated through four complete cycles of nickel consumption without undue instability and without evidence of gas evolution other than at the surface being plated. At the end of four cycles, each example was analyzed for hypophosphite salt content which was determined to be 28 grams per liter for Example 1, and 32 grams per liter for Example 2, a 14% decrease in hypophosphite consumption. In these tests, deposition was accomplished in approximately twelve hours of bath operation and the losses in the hypophosphite in the case of Example 1 would have been far greater with more extended storage and deposition.
It was also found that the consumption of hypophosphite relative to nickel was relatively constant at the ratio of about 2.85 to 1 so that replenishment needs could be satisfactorily calculated on the basis of nickel concentration analysis without the necessity of frequent hypophosphite analysis.
The hydroxy propane sulfonic acid employed in the above tests was propane sultone obtained from the Shell Chemical Company and is fully described in its publication PD-145 in which it is noted that the propane sultone hydrolyzes in water to form the sulfonic acid.
In the above examples the nickel sulfate is the source of nickel ions, the sodium hypophosphite is the source of hypophosphite ions, and the hydrox y-acetic acid is a known chelating agent for the nickel ions.
It should be understood that the above examples are for the purpose of illustration and that the invention includes all modifications within-the scope of the appended claims.
I claim:
1. In an aqueous electroless nickel composition comprising a source of nickel ions in an amount sufficient to provide a useful deposit and a source of hypophosphite ions in an amount sufiicient to serve as a reducing agent therefor, the improvement comprising the addition of a member Selected from the group consisting of hydroxy propane sulfonic acid and salts thereof soluble in said aqueous electroless nickel composition.
2. A composition according to claim 1, wherein said hydroxy propane sulfonic acid, or salts thereof, 'are present in an amount sufficient to suppress consumption of hypophosphite ions in use and storage.
3. An electroless nickel composition according to claim 1 wherein said hydroxy propane sulfonic acid, or salts thereof, are present in an amount between about 0.25 and about grams per liter.
4. A composition according to claim 1, wherein said hydroxy-propane sulfonic acid is present in an amount between about 1 and 20 grams per liter.
5. A composition according to claim 2, having a pH between about 3 and 11.
6. A process for electroless plating of nickel comprising contacting a catalytic surface with a composition according to claim 1 for a time sufficient to plate nickel, and removing said surface from contact with said composition.
7. A process for electroless plating of nickel comprising contacting a catalytic surface with 'a composition according to claim 2 for a time suificient to plate nickel, and removing said surface from contact with said composition.
References Cited UNITED STATES PATENTS 3,234,031 2/1966 Zirngiebl et a1. l06l JULIUS FROME, Primary Examiner.
L. HAYER, Assistant Examiner.
U.S.Cl.X.R.
US541060A 1966-04-08 1966-04-08 Compositions and processes for electroless nickel plating Expired - Lifetime US3420680A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US54106066A 1966-04-08 1966-04-08

Publications (1)

Publication Number Publication Date
US3420680A true US3420680A (en) 1969-01-07

Family

ID=24158027

Family Applications (1)

Application Number Title Priority Date Filing Date
US541060A Expired - Lifetime US3420680A (en) 1966-04-08 1966-04-08 Compositions and processes for electroless nickel plating

Country Status (6)

Country Link
US (1) US3420680A (en)
BE (1) BE695663A (en)
DE (1) DE1621337B2 (en)
FR (1) FR1515425A (en)
GB (1) GB1107146A (en)
NL (1) NL6704756A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484282A (en) * 1966-08-06 1969-12-16 Knapsack Ag Process for the chemical nickel-plating of non-metallic articles
US3649350A (en) * 1970-06-29 1972-03-14 Gen Electric Electroless copper plating
US4188227A (en) * 1977-05-27 1980-02-12 Bauer Randy L Method of preparing multi-component chemical compositions
US4467067A (en) * 1982-12-27 1984-08-21 Shipley Company Electroless nickel plating
US4997686A (en) * 1987-12-23 1991-03-05 Surface Technology, Inc. Composite electroless plating-solutions, processes, and articles thereof
EP0894156A1 (en) * 1996-11-14 1999-02-03 ATOTECH Deutschland GmbH Removal of orthophosphite ions from electroless nickel plating baths
US20030127015A1 (en) * 2001-10-24 2003-07-10 Shipley Company, L.L.C. Stabilizers for electroless plating solutions and methods of use thereof

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2650873A1 (en) * 1976-11-06 1978-05-11 Philips Patentverwaltung METHOD OF MANUFACTURING AN ELECTROMAGNET

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3234031A (en) * 1961-02-04 1966-02-08 Bayer Ag Reduction nickel plating with boron reducing agents and organic divalent sulfur stabilizers

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3234031A (en) * 1961-02-04 1966-02-08 Bayer Ag Reduction nickel plating with boron reducing agents and organic divalent sulfur stabilizers

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3484282A (en) * 1966-08-06 1969-12-16 Knapsack Ag Process for the chemical nickel-plating of non-metallic articles
US3649350A (en) * 1970-06-29 1972-03-14 Gen Electric Electroless copper plating
US4188227A (en) * 1977-05-27 1980-02-12 Bauer Randy L Method of preparing multi-component chemical compositions
US4467067A (en) * 1982-12-27 1984-08-21 Shipley Company Electroless nickel plating
US4997686A (en) * 1987-12-23 1991-03-05 Surface Technology, Inc. Composite electroless plating-solutions, processes, and articles thereof
EP0894156A1 (en) * 1996-11-14 1999-02-03 ATOTECH Deutschland GmbH Removal of orthophosphite ions from electroless nickel plating baths
EP0894156A4 (en) * 1996-11-14 2002-06-26 Atotech Deutschland Gmbh Removal of orthophosphite ions from electroless nickel plating baths
US20030127015A1 (en) * 2001-10-24 2003-07-10 Shipley Company, L.L.C. Stabilizers for electroless plating solutions and methods of use thereof
US6824597B2 (en) * 2001-10-24 2004-11-30 Shipley Company, L.L.C. Stabilizers for electroless plating solutions and methods of use thereof
EP2339050A1 (en) 2001-10-24 2011-06-29 Rohm and Haas Electronic Materials LLC Stabilizers for electroless plating solutions and methods of use thereof

Also Published As

Publication number Publication date
GB1107146A (en) 1968-03-20
BE695663A (en) 1967-09-18
FR1515425A (en) 1968-03-01
NL6704756A (en) 1967-10-09
DE1621337A1 (en) 1971-05-13
DE1621337B2 (en) 1971-05-13

Similar Documents

Publication Publication Date Title
US2762723A (en) Processes of chemical nickel plating and baths therefor
US4483711A (en) Aqueous electroless nickel plating bath and process
US3338726A (en) Chemical reduction plating process and bath
US3650777A (en) Electroless copper plating
US2935425A (en) Chemical nickel plating processes and baths therefor
US3420680A (en) Compositions and processes for electroless nickel plating
US3062666A (en) Bath compositions for the chemical reductive plating of nickel-boron and cobalt-boron alloys
US2577887A (en) Activation of oxalate metal coating compositions
US3915717A (en) Stabilized autocatalytic metal deposition baths
US3024134A (en) Nickel chemical reduction plating bath and method of using same
KR101206538B1 (en) Electroless copper plating solution and method for electroless copper plating
US3607317A (en) Ductility promoter and stabilizer for electroless copper plating baths
US2067007A (en) Method of coating metal
US2819187A (en) Chemical nickel plating processes and baths therefor
US3178311A (en) Electroless plating process
US3489576A (en) Chemical nickel plating
US3663242A (en) Stabilized electroless plating solutions
US2955944A (en) Electroless nickel plating bath control
JP2000503354A (en) Removal of orthophosphite ions from electroless nickel plating bath
US2822294A (en) Chemical nickel plating processes and baths therefor
US2883288A (en) Silver plating bath
US2721814A (en) Nickel plating by chemical reduction
US3738849A (en) Chemical plating solutions
US2999770A (en) Processes of chemical nickel plating and baths therefor
US3265511A (en) Electroless plating