IL120804A - Fluid control device - Google Patents

Fluid control device

Info

Publication number
IL120804A
IL120804A IL12080497A IL12080497A IL120804A IL 120804 A IL120804 A IL 120804A IL 12080497 A IL12080497 A IL 12080497A IL 12080497 A IL12080497 A IL 12080497A IL 120804 A IL120804 A IL 120804A
Authority
IL
Israel
Prior art keywords
control device
fluid control
fluid
control
Prior art date
Application number
IL12080497A
Other languages
English (en)
Other versions
IL120804A0 (en
Original Assignee
Ohmi Tadahiro
Fujikin Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ohmi Tadahiro, Fujikin Kk filed Critical Ohmi Tadahiro
Publication of IL120804A0 publication Critical patent/IL120804A0/xx
Publication of IL120804A publication Critical patent/IL120804A/xx

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/67034—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for drying
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16K—VALVES; TAPS; COCKS; ACTUATING-FLOATS; DEVICES FOR VENTING OR AERATING
    • F16K27/00—Construction of housing; Use of materials therefor
    • F16K27/003—Housing formed from a plurality of the same valve elements
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02041—Cleaning
    • H01L21/02043—Cleaning before device manufacture, i.e. Begin-Of-Line process
    • H01L21/02046—Dry cleaning only
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/02104—Forming layers
    • H01L21/02107—Forming insulating materials on a substrate
    • H01L21/02296—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer
    • H01L21/02299—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment
    • H01L21/02312—Forming insulating materials on a substrate characterised by the treatment performed before or after the formation of the layer pre-treatment treatment by exposure to a gas or vapour
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/4238—With cleaner, lubrication added to fluid or liquid sealing at valve interface
    • Y10T137/4245—Cleaning or steam sterilizing
    • Y10T137/4259—With separate material addition
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T137/00—Fluid handling
    • Y10T137/8593—Systems
    • Y10T137/87571—Multiple inlet with single outlet
    • Y10T137/87676—With flow control
    • Y10T137/87684—Valve in each inlet

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Valve Housings (AREA)
  • Pipeline Systems (AREA)
  • Fluid-Pressure Circuits (AREA)
  • Lift Valve (AREA)
  • Flow Control (AREA)
IL12080497A 1996-05-10 1997-05-08 Fluid control device IL120804A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11620496A JP3726168B2 (ja) 1996-05-10 1996-05-10 流体制御装置

Publications (2)

Publication Number Publication Date
IL120804A0 IL120804A0 (en) 1997-09-30
IL120804A true IL120804A (en) 2000-07-26

Family

ID=14681423

Family Applications (1)

Application Number Title Priority Date Filing Date
IL12080497A IL120804A (en) 1996-05-10 1997-05-08 Fluid control device

Country Status (9)

Country Link
US (2) US5975112A (fr)
EP (2) EP1276030A3 (fr)
JP (1) JP3726168B2 (fr)
KR (1) KR970075396A (fr)
CA (1) CA2204939A1 (fr)
DE (1) DE69727419T2 (fr)
IL (1) IL120804A (fr)
SG (1) SG50019A1 (fr)
TW (1) TW377387B (fr)

Families Citing this family (59)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3726168B2 (ja) 1996-05-10 2005-12-14 忠弘 大見 流体制御装置
JP3737869B2 (ja) * 1997-05-13 2006-01-25 シーケーディ株式会社 プロセスガス供給ユニット
JP4235759B2 (ja) 1997-08-05 2009-03-11 忠弘 大見 流体制御装置
AU2218699A (en) * 1998-01-09 1999-07-26 Swagelok Company Seal for a modular flow devices
US6345642B1 (en) * 1999-02-19 2002-02-12 Applied Materials, Inc. Method and apparatus for removing processing liquid from a processing liquid path
FR2794844B1 (fr) * 1999-06-08 2001-08-03 Air Liquide Procede et dispositif de mise en gaz d'une ligne de distribution de gaz corrosif
US6817381B2 (en) * 1999-08-24 2004-11-16 Tokyo Electron Limited Gas processing apparatus, gas processing method and integrated valve unit for gas processing apparatus
US6729353B2 (en) 1999-09-01 2004-05-04 Asml Us, Inc. Modular fluid delivery apparatus
IT249485Y1 (it) * 2000-03-17 2003-05-19 Dalmec Spa Elemento di supporto e distribuzione per una valvola pneumatica.
FR2819198B1 (fr) * 2001-01-05 2003-09-26 Yves Lecoffre Procede et dispositif pour constituer par evaporation une substance volatile
KR20060017577A (ko) * 2002-08-27 2006-02-24 셀레리티 인크. 공통 평면 내에 매니폴드 연결부를 갖는 모듈형 기판 가스패널
JP4555052B2 (ja) * 2004-11-04 2010-09-29 シーケーディ株式会社 ガス供給集積ユニット
JP4742762B2 (ja) * 2005-09-12 2011-08-10 株式会社フジキン 流体制御装置
US7607426B2 (en) * 2006-05-17 2009-10-27 David Deng Dual fuel heater
US7434447B2 (en) * 2006-05-17 2008-10-14 David Deng Oxygen depletion sensor
US7677236B2 (en) 2006-05-17 2010-03-16 David Deng Heater configured to operate with a first or second fuel
US20070277803A1 (en) * 2006-05-17 2007-12-06 David Deng Heater
US8011920B2 (en) 2006-12-22 2011-09-06 David Deng Valve assemblies for heating devices
US8152515B2 (en) 2007-03-15 2012-04-10 Continental Appliances Inc Fuel selectable heating devices
US8241034B2 (en) 2007-03-14 2012-08-14 Continental Appliances Inc. Fuel selection valve assemblies
US7654820B2 (en) 2006-12-22 2010-02-02 David Deng Control valves for heaters and fireplace devices
US8545216B2 (en) 2006-12-22 2013-10-01 Continental Appliances, Inc. Valve assemblies for heating devices
US8118590B1 (en) 2007-03-09 2012-02-21 Coprecitec, S.L. Dual fuel vent free gas heater
US8403661B2 (en) 2007-03-09 2013-03-26 Coprecitec, S.L. Dual fuel heater
US7766006B1 (en) 2007-03-09 2010-08-03 Coprecitec, S.L. Dual fuel vent free gas heater
US8057219B1 (en) 2007-03-09 2011-11-15 Coprecitec, S.L. Dual fuel vent free gas heater
JP5150628B2 (ja) * 2007-05-31 2013-02-20 東京エレクトロン株式会社 流体制御装置
US20080302426A1 (en) * 2007-06-06 2008-12-11 Greg Patrick Mulligan System and method of securing removable components for distribution of fluids
US8122903B2 (en) 2007-07-26 2012-02-28 Parker-Hannifin Corporation Close-coupled purgeable vaporizer valve
US8307854B1 (en) 2009-05-14 2012-11-13 Vistadeltek, Inc. Fluid delivery substrates for building removable standard fluid delivery sticks
SG176152A1 (en) * 2009-06-10 2011-12-29 Vistadeltek Llc Extreme flow rate and/or high temperature fluid delivery substrates
US8506290B2 (en) * 2009-06-29 2013-08-13 David Deng Heating apparatus with air shutter adjustment
US8757202B2 (en) 2009-06-29 2014-06-24 David Deng Dual fuel heating source
US9829195B2 (en) 2009-12-14 2017-11-28 David Deng Dual fuel heating source with nozzle
US10073071B2 (en) 2010-06-07 2018-09-11 David Deng Heating system
EP2584258A3 (fr) 2010-06-07 2013-06-12 David Deng Système de chauffage
CN202328495U (zh) 2011-11-16 2012-07-11 普鲁卡姆电器（上海）有限公司 带有360度风门调节装置的多气源平衡式燃气取暖器
US8899971B2 (en) 2010-08-20 2014-12-02 Coprecitec, S.L. Dual fuel gas heater
WO2012099825A2 (fr) 2011-01-18 2012-07-26 David Deng Système de chauffage à régulateur de pression
US9523497B2 (en) 2012-07-04 2016-12-20 David Deng Dual fuel heater with selector valve
US9200802B2 (en) * 2011-04-08 2015-12-01 David Deng Dual fuel heater with selector valve
US8985094B2 (en) 2011-04-08 2015-03-24 David Deng Heating system
US9739389B2 (en) 2011-04-08 2017-08-22 David Deng Heating system
US10222057B2 (en) 2011-04-08 2019-03-05 David Deng Dual fuel heater with selector valve
WO2012151292A2 (fr) 2011-05-02 2012-11-08 Advantage Group International Inc. Système de conduits pour le transport de gaz et de fluides
WO2013046660A1 (fr) 2011-09-30 2013-04-04 株式会社フジキン Dispositif d'alimentation en gaz
US9175848B2 (en) * 2011-12-05 2015-11-03 David Deng Dual fuel heater with selector valve
CN102506198B (zh) 2011-10-20 2013-05-22 南京普鲁卡姆电器有限公司 双气源燃气自适应主控阀
US9170016B2 (en) 2012-08-22 2015-10-27 David Deng Dual fuel heater with selector valve
US9022064B2 (en) 2012-05-10 2015-05-05 David Deng Dual fuel control device with auxiliary backline pressure regulator
US9091431B2 (en) 2012-09-13 2015-07-28 David Deng Dual fuel valve with air shutter adjustment
US20140248567A1 (en) 2013-03-02 2014-09-04 David Deng Safety pilot
US9752779B2 (en) 2013-03-02 2017-09-05 David Deng Heating assembly
US9454158B2 (en) 2013-03-15 2016-09-27 Bhushan Somani Real time diagnostics for flow controller systems and methods
US10240789B2 (en) 2014-05-16 2019-03-26 David Deng Dual fuel heating assembly with reset switch
US10429074B2 (en) 2014-05-16 2019-10-01 David Deng Dual fuel heating assembly with selector switch
JP6671299B2 (ja) * 2015-01-16 2020-03-25 株式会社キッツエスシーティー ブロック弁と原料容器用ブロック弁
TW201634738A (zh) * 2015-01-22 2016-10-01 應用材料股份有限公司 用於在空間上分離之原子層沉積腔室的經改良注射器
US10983537B2 (en) 2017-02-27 2021-04-20 Flow Devices And Systems Inc. Systems and methods for flow sensor back pressure adjustment for mass flow controller

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US462966A (en) 1891-11-10 Automatic governor for air-brakes
US1525393A (en) 1922-09-19 1925-02-03 John A Jernatowski Faucet
US3797524A (en) * 1972-06-15 1974-03-19 Reedmer Plastics Inc Fluid metering device
DE2648751C2 (de) 1976-10-27 1986-04-30 Max-Planck-Gesellschaft zur Förderung der Wissenschaften e.V., 3400 Göttingen Vorrichtung für die Zuführung flüssiger oder gasförmiger Substanzen zu einem Verarbeitungsgefäß
US4281683A (en) * 1978-12-11 1981-08-04 Poly-Glas Systems Modular multiple-fluid component selection and delivery system
US4558845A (en) * 1982-09-22 1985-12-17 Hunkapiller Michael W Zero dead volume valve
DE3622527C1 (de) * 1986-07-04 1987-05-07 Draegerwerk Ag Ventil fuer Gasbehaelter
JPS6362976A (ja) 1986-08-29 1988-03-19 Daiwa Handotai Sochi Kk 半導体プロセス用一方掃気形バルブ装置
US4741354A (en) * 1987-04-06 1988-05-03 Spire Corporation Radial gas manifold
US4738693A (en) * 1987-04-27 1988-04-19 Advanced Technology Materials, Inc. Valve block and container for semiconductor source reagent dispensing and/or purification
FR2628501B1 (fr) * 1988-03-09 1990-05-18 Eferel Sa Procede pour la realisation d'un dispositif d'obturation a obturateurs multiples et a circuits d'interconnexion integres adaptables selon les fonctionnalites desirees par l'utilisateur et dispositifs d'obturation realises conformement audit procede.
DE3811041A1 (de) 1988-03-31 1989-10-19 Merck Patent Gmbh Entnahmeventilkopf fuer behaelter
JPH03168494A (ja) * 1989-11-14 1991-07-22 Cryolab Inc Ｔ字管
US5137047A (en) * 1990-08-24 1992-08-11 Mark George Delivery of reactive gas from gas pad to process tool
US5476118A (en) * 1991-02-22 1995-12-19 Asahi Yukizai Kogyo Co., Ltd. Non-stagnant piping system
US5224513A (en) * 1991-06-04 1993-07-06 Cselt - Centro Studi E Laboratori Telecomunicazioni S.P.A. Device for introducing reagents into an organometallic vapor phase deposition apparatus
US5183072A (en) 1991-10-21 1993-02-02 Matheson Gas Products, Inc. Automatic switchover valve
US5368062A (en) * 1992-01-29 1994-11-29 Kabushiki Kaisha Toshiba Gas supplying system and gas supplying apparatus
EP0619450A1 (fr) 1993-04-09 1994-10-12 The Boc Group, Inc. Armoire de gaz sans espace mort
JP3387630B2 (ja) 1994-06-16 2003-03-17 株式会社フジキン ブロック弁
JP3546275B2 (ja) 1995-06-30 2004-07-21 忠弘 大見 流体制御装置
JP3726168B2 (ja) 1996-05-10 2005-12-14 忠弘 大見 流体制御装置
JP3650859B2 (ja) 1996-06-25 2005-05-25 忠弘 大見 遮断開放器およびこれを備えた流体制御装置
JP4156672B2 (ja) 1996-07-16 2008-09-24 コントロールズ コーポレイション オブ アメリカ 高純度、高腐食性ガス施設用ガス流制御装置

Also Published As

Publication number Publication date
JPH09303308A (ja) 1997-11-25
US6257270B1 (en) 2001-07-10
DE69727419D1 (de) 2004-03-11
DE69727419T2 (de) 2004-12-16
EP0806573B1 (fr) 2004-02-04
SG50019A1 (en) 1998-06-15
EP1276030A2 (fr) 2003-01-15
KR970075396A (ko) 1997-12-10
CA2204939A1 (fr) 1997-11-10
JP3726168B2 (ja) 2005-12-14
TW377387B (en) 1999-12-21
EP1276030A3 (fr) 2003-02-05
US5975112A (en) 1999-11-02
EP0806573A3 (fr) 1999-07-07
IL120804A0 (en) 1997-09-30
EP0806573A2 (fr) 1997-11-12

Similar Documents

Publication Publication Date Title
SG50019A1 (en) Fluid control device
IL126530A0 (en) Fluid control device
GB2315568B (en) Thermostat control device
IL123305A0 (en) Fluid control apparatus
SG75966A1 (en) Fluid control device
SG74149A1 (en) Fluid control device
IL118437A0 (en) Fluid control device
EP0692753A3 (fr) Dispositif de commande
TW510466U (en) Fluid control device
GB2319323B (en) Fluid flow control device
GB2323579B (en) Hydraulic control device
IL125437A (en) Fluid control device
GB9513906D0 (en) Flow control devices
GB9724669D0 (en) Electromagneticaly-operating jaquard control device
GB9626143D0 (en) Fluid control system
GB2313945B (en) Fluid flow control devices
GB2309797B (en) Flow control device
GB9611715D0 (en) Peripheral device control
GB9421696D0 (en) Control device
GB2310029B (en) Fluid flow control device
GB2320119B (en) Control device
GB2316151B (en) Fluid control apparatus
GB9410733D0 (en) Control device
KR100212503B1 (en) Differential control device
GB2343968B (en) Thermostat control device

Legal Events

Date Code Title Description
FF Patent granted
KB Patent renewed
KB Patent renewed
MM9K Patent not in force due to non-payment of renewal fees