IL108150A - Surface potential control in plasma processing of materials - Google Patents

Surface potential control in plasma processing of materials

Info

Publication number
IL108150A
IL108150A IL10815093A IL10815093A IL108150A IL 108150 A IL108150 A IL 108150A IL 10815093 A IL10815093 A IL 10815093A IL 10815093 A IL10815093 A IL 10815093A IL 108150 A IL108150 A IL 108150A
Authority
IL
Israel
Prior art keywords
grid
plasma
plasma processing
electrically conducting
ion
Prior art date
Application number
IL10815093A
Other languages
English (en)
Hebrew (he)
Other versions
IL108150A0 (en
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL108150A0 publication Critical patent/IL108150A0/xx
Publication of IL108150A publication Critical patent/IL108150A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/36—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases using ionised gases, e.g. ionitriding
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00—Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14—Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/48—Ion implantation
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0866—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
    • B29C2035/0872—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using ion-radiation, e.g. alpha-rays
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B29—WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29C—SHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C35/00—Heating, cooling or curing, e.g. crosslinking or vulcanising; Apparatus therefor
    • B29C35/02—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould
    • B29C35/08—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation
    • B29C35/0866—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation
    • B29C2035/0877—Heating or curing, e.g. crosslinking or vulcanizing during moulding, e.g. in a mould by wave energy or particle radiation using particle radiation using electron radiation, e.g. beta-rays

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
  • Cleaning In General (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Medicines Containing Material From Animals Or Micro-Organisms (AREA)
IL10815093A 1992-12-23 1993-12-22 Surface potential control in plasma processing of materials IL108150A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/995,864 US5374456A (en) 1992-12-23 1992-12-23 Surface potential control in plasma processing of materials

Publications (2)

Publication Number Publication Date
IL108150A0 IL108150A0 (en) 1994-04-12
IL108150A true IL108150A (en) 1996-08-04

Family

ID=25542293

Family Applications (1)

Application Number Title Priority Date Filing Date
IL10815093A IL108150A (en) 1992-12-23 1993-12-22 Surface potential control in plasma processing of materials

Country Status (8)

Country Link
US (1) US5374456A (de)
EP (1) EP0603864B1 (de)
JP (1) JP2501770B2 (de)
KR (1) KR970002242B1 (de)
CA (1) CA2112178A1 (de)
DE (1) DE69319869T2 (de)
IL (1) IL108150A (de)
MX (1) MX9400100A (de)

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US5859404A (en) * 1995-10-12 1999-01-12 Hughes Electronics Corporation Method and apparatus for plasma processing a workpiece in an enveloping plasma
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AU2305199A (en) * 1997-09-24 1999-05-03 Regents Of The University Of California, The Process for forming adherent coatings using plasma processing
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US6274459B1 (en) 1998-02-17 2001-08-14 Silicon Genesis Corporation Method for non mass selected ion implant profile control
US6300643B1 (en) 1998-08-03 2001-10-09 Varian Semiconductor Equipment Associates, Inc. Dose monitor for plasma doping system
US6224536B1 (en) 1999-02-08 2001-05-01 Advanced Cardiovascular Systems Method for delivering radiation therapy to an intravascular site in a body
US6458723B1 (en) 1999-06-24 2002-10-01 Silicon Genesis Corporation High temperature implant apparatus
US7309997B1 (en) 2000-09-15 2007-12-18 Varian Semiconductor Equipment Associates, Inc. Monitor system and method for semiconductor processes
DE10108456B4 (de) * 2001-02-22 2004-08-26 Christof Diener Verfahren zur Oberflächenvorbehandlung
US6734447B2 (en) * 2002-08-13 2004-05-11 Taiwan Semiconductor Manufacturing Co., Ltd. Electron filter for current implanter
EP1677857A1 (de) * 2003-10-31 2006-07-12 Ventracor Limited Verbesserte blutpumpe mit polymerbestandteilen
CN1322163C (zh) * 2004-11-05 2007-06-20 哈尔滨工业大学 绝缘材料零部件等离子体注入方法及其注入装置
US7993404B2 (en) * 2006-03-29 2011-08-09 Warsaw Orthopedic, Inc. Transformable spinal implants and methods of use
US7501945B2 (en) * 2006-07-27 2009-03-10 Lockheed Martin Corporation System and method of simulation
US8846516B2 (en) * 2007-07-06 2014-09-30 Micron Technology, Inc. Dielectric charge-trapping materials having doped metal sites
US8252388B2 (en) * 2008-05-15 2012-08-28 Southwest Research Institute Method and apparatus for high rate, uniform plasma processing of three-dimensional objects
DE102008027363B4 (de) 2008-06-09 2018-04-26 Meyer Burger (Germany) Ag Vorrichtung zur Behandlung großvolumiger Substrate im Plasma und Verfahren zur Anwendung
KR20110042051A (ko) * 2008-06-11 2011-04-22 솔라 임플란트 테크놀로지스 아이엔씨. 주입을 사용하여 솔라 셀의 제작
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US8450175B2 (en) 2011-02-22 2013-05-28 Micron Technology, Inc. Methods of forming a vertical transistor and at least a conductive line electrically coupled therewith
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JP6068491B2 (ja) 2011-11-08 2017-01-25 インテヴァック インコーポレイテッド 基板処理システムおよび基板処理方法
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Also Published As

Publication number Publication date
EP0603864B1 (de) 1998-07-22
CA2112178A1 (en) 1994-06-24
KR970002242B1 (ko) 1997-02-26
EP0603864A2 (de) 1994-06-29
EP0603864A3 (de) 1996-01-31
US5374456A (en) 1994-12-20
IL108150A0 (en) 1994-04-12
JP2501770B2 (ja) 1996-05-29
KR940017966A (ko) 1994-07-27
JPH073453A (ja) 1995-01-06
DE69319869T2 (de) 1999-04-15
DE69319869D1 (de) 1998-08-27
MX9400100A (es) 1994-07-29

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