IL107475A - Plasma Ion Device and Method for High Impedance - Google Patents

Plasma Ion Device and Method for High Impedance

Info

Publication number
IL107475A
IL107475A IL107475A IL10747593A IL107475A IL 107475 A IL107475 A IL 107475A IL 107475 A IL107475 A IL 107475A IL 10747593 A IL10747593 A IL 10747593A IL 107475 A IL107475 A IL 107475A
Authority
IL
Israel
Prior art keywords
plasma
target
chamber
support structure
voltage
Prior art date
Application number
IL107475A
Other languages
English (en)
Hebrew (he)
Other versions
IL107475A0 (en
Original Assignee
Hughes Aircraft Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hughes Aircraft Co filed Critical Hughes Aircraft Co
Publication of IL107475A0 publication Critical patent/IL107475A0/xx
Publication of IL107475A publication Critical patent/IL107475A/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32412—Plasma immersion ion implantation

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Physical Vapour Deposition (AREA)
IL107475A 1992-11-04 1993-11-02 Plasma Ion Device and Method for High Impedance IL107475A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US07/971,433 US5330800A (en) 1992-11-04 1992-11-04 High impedance plasma ion implantation method and apparatus

Publications (2)

Publication Number Publication Date
IL107475A0 IL107475A0 (en) 1994-02-27
IL107475A true IL107475A (en) 1998-03-10

Family

ID=25518384

Family Applications (1)

Application Number Title Priority Date Filing Date
IL107475A IL107475A (en) 1992-11-04 1993-11-02 Plasma Ion Device and Method for High Impedance

Country Status (7)

Country Link
US (2) US5330800A (fr)
EP (1) EP0596496B1 (fr)
JP (1) JPH06256943A (fr)
KR (1) KR960014437B1 (fr)
CA (1) CA2102384C (fr)
DE (1) DE69324326T2 (fr)
IL (1) IL107475A (fr)

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Also Published As

Publication number Publication date
EP0596496A1 (fr) 1994-05-11
US5607509A (en) 1997-03-04
IL107475A0 (en) 1994-02-27
CA2102384C (fr) 2000-01-11
KR940013298A (ko) 1994-06-25
CA2102384A1 (fr) 1994-05-05
KR960014437B1 (ko) 1996-10-15
DE69324326D1 (de) 1999-05-12
EP0596496B1 (fr) 1999-04-07
JPH06256943A (ja) 1994-09-13
US5330800A (en) 1994-07-19
DE69324326T2 (de) 1999-12-16

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