HK51695A - Dust-proof film. - Google Patents

Dust-proof film.

Info

Publication number
HK51695A
HK51695A HK51695A HK51695A HK51695A HK 51695 A HK51695 A HK 51695A HK 51695 A HK51695 A HK 51695A HK 51695 A HK51695 A HK 51695A HK 51695 A HK51695 A HK 51695A
Authority
HK
Hong Kong
Prior art keywords
mask
pellicle
dust
attached
film
Prior art date
Application number
HK51695A
Other languages
English (en)
Inventor
Kiroaki Nakagawa
Yoichi Takehana
Original Assignee
Mitsui Petrochemical Ind
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Petrochemical Ind, Hitachi Ltd filed Critical Mitsui Petrochemical Ind
Publication of HK51695A publication Critical patent/HK51695A/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
    • G03F1/48—Protective coatings
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
    • Y10T156/10—Methods of surface bonding and/or assembly therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/16—Two dimensionally sectional layer
    • Y10T428/161—Two dimensionally sectional layer with frame, casing, or perimeter structure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Moving Of Heads (AREA)
  • Organic Insulating Materials (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Adhesive Tapes (AREA)
HK51695A 1987-08-18 1995-04-06 Dust-proof film. HK51695A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP20553387A JP2642637B2 (ja) 1987-08-18 1987-08-18 防塵膜

Publications (1)

Publication Number Publication Date
HK51695A true HK51695A (en) 1995-04-13

Family

ID=16508463

Family Applications (1)

Application Number Title Priority Date Filing Date
HK51695A HK51695A (en) 1987-08-18 1995-04-06 Dust-proof film.

Country Status (9)

Country Link
US (1) US5085899A (xx)
EP (1) EP0304211B1 (xx)
JP (1) JP2642637B2 (xx)
KR (1) KR910008707B1 (xx)
AT (1) ATE105427T1 (xx)
CA (1) CA1319043C (xx)
DE (1) DE3889396T2 (xx)
HK (1) HK51695A (xx)
MY (1) MY103336A (xx)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2535971B2 (ja) * 1987-11-05 1996-09-18 三井石油化学工業株式会社 ペリクル
JP2714450B2 (ja) * 1989-08-10 1998-02-16 ダイセル化学工業株式会社 防塵膜
JP3037745B2 (ja) * 1990-11-29 2000-05-08 三井化学株式会社 ペリクル構造体
US5254375A (en) * 1991-08-26 1993-10-19 Yen Yung Tsai Apparatus for controllably separating framed working area from remainder of the membrane
US5344677A (en) * 1992-08-27 1994-09-06 Hong Gilbert H Photochemically stable deep ultraviolet pellicles for excimer lasers
JP3027073B2 (ja) * 1993-07-28 2000-03-27 信越化学工業株式会社 ペリクル
TW285721B (xx) * 1994-12-27 1996-09-11 Siemens Ag
JP3493090B2 (ja) * 1995-12-15 2004-02-03 信越化学工業株式会社 ペリクル
TW337002B (en) * 1996-11-19 1998-07-21 Mitsui Kagaku Kk Pellicle
DE19808461A1 (de) * 1998-03-02 1999-09-09 Zeiss Carl Fa Retikel mit Kristall-Trägermaterial
US20040032576A1 (en) * 1999-03-26 2004-02-19 Nikon Corporation Exposure method and apparatus
WO2005036604A2 (en) * 2003-10-09 2005-04-21 E.I. Dupont De Nemours And Company Apparatus and method for supporting a flexible substrate during processing
JP4889510B2 (ja) * 2007-01-16 2012-03-07 信越化学工業株式会社 ペリクルフレーム内面への粘着剤の塗布方法
JP5314631B2 (ja) 2010-04-20 2013-10-16 信越化学工業株式会社 ペリクルフレームの通気孔内壁に粘着剤を塗布する方法
JP2011253176A (ja) * 2010-05-07 2011-12-15 Shin Etsu Chem Co Ltd ペリクル用粘着剤
US8945799B2 (en) * 2010-07-09 2015-02-03 Mitsui Chemicals, Inc. Pellicle and mask adhesive agent for use in same
JP5767535B2 (ja) * 2010-09-01 2015-08-19 旭化成イーマテリアルズ株式会社 ペリクル枠体、ペリクル及びペリクル枠体の製造方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2165539A (en) * 1937-05-26 1939-07-11 Teletype Corp Package
US2888368A (en) * 1954-12-27 1959-05-26 American Viscose Corp Nitrocellulose type coatings for cellulosic base films
US3082453A (en) * 1959-03-04 1963-03-26 David E Mutchler Adhesive coated cleaning article
US4537813A (en) * 1982-09-27 1985-08-27 At&T Technologies, Inc. Photomask encapsulation
US4482591A (en) * 1983-03-08 1984-11-13 J. T. Baker Chemical Company Polyvinyl butyrate pellicle compositions and pellicles thereof for projection printing
US4476172A (en) * 1983-04-18 1984-10-09 J. T. Baker Chemical Company Pellicle compositions and pellicles thereof for projection printing
US4470508A (en) * 1983-08-19 1984-09-11 Micro Lithography, Inc. Dustfree packaging container and method
DE3480234D1 (en) * 1983-08-29 1989-11-23 Yen Yung Tsai Method of producing contamination-free pellicles
JPS6057841A (ja) * 1983-09-09 1985-04-03 Hitachi Ltd 異物固定方法及び装置
JPS6075835A (ja) * 1983-10-03 1985-04-30 Hitachi Ltd ペリクル
JPS61209449A (ja) * 1985-03-14 1986-09-17 Asahi Chem Ind Co Ltd 非反射性ペリクル体
US4759990A (en) * 1985-11-27 1988-07-26 Yen Yung Tsai Composite optical element including anti-reflective coating
KR930001191Y1 (ko) * 1986-06-13 1993-03-18 나고야 유까 가부시기가이샤 마스킹재
US4737387A (en) * 1986-07-07 1988-04-12 Yen Yung Tsai Removable pellicle and method
EP0252574A2 (en) * 1986-07-07 1988-01-13 YEN, Yung-Tsai Method and apparatus for reducing particulates on photomasks

Also Published As

Publication number Publication date
DE3889396D1 (de) 1994-06-09
US5085899A (en) 1992-02-04
EP0304211B1 (en) 1994-05-04
EP0304211A2 (en) 1989-02-22
KR910008707B1 (ko) 1991-10-19
EP0304211A3 (en) 1989-11-15
KR890004458A (ko) 1989-04-22
MY103336A (en) 1993-05-29
JPS6448062A (en) 1989-02-22
DE3889396T2 (de) 1994-10-06
CA1319043C (en) 1993-06-15
ATE105427T1 (de) 1994-05-15
JP2642637B2 (ja) 1997-08-20

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Legal Events

Date Code Title Description
PF Patent in force
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20050808