HK1245416A1 - 物體交換方法、物體交換系統、曝光裝置、平面顯示器的製造方法、及組件製造方法 - Google Patents

物體交換方法、物體交換系統、曝光裝置、平面顯示器的製造方法、及組件製造方法

Info

Publication number
HK1245416A1
HK1245416A1 HK18104745.0A HK18104745A HK1245416A1 HK 1245416 A1 HK1245416 A1 HK 1245416A1 HK 18104745 A HK18104745 A HK 18104745A HK 1245416 A1 HK1245416 A1 HK 1245416A1
Authority
HK
Hong Kong
Prior art keywords
swapping
manufacturing
exposure apparatus
panel display
manufacturing device
Prior art date
Application number
HK18104745.0A
Other languages
English (en)
Chinese (zh)
Inventor
青木保夫
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1245416A1 publication Critical patent/HK1245416A1/zh

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Liquid Crystal (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
HK18104745.0A 2012-08-08 2015-06-09 物體交換方法、物體交換系統、曝光裝置、平面顯示器的製造方法、及組件製造方法 HK1245416A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012175778 2012-08-08

Publications (1)

Publication Number Publication Date
HK1245416A1 true HK1245416A1 (zh) 2018-08-24

Family

ID=50067736

Family Applications (2)

Application Number Title Priority Date Filing Date
HK18104745.0A HK1245416A1 (zh) 2012-08-08 2015-06-09 物體交換方法、物體交換系統、曝光裝置、平面顯示器的製造方法、及組件製造方法
HK15105480.9A HK1205277A1 (en) 2012-08-08 2015-06-09 Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK15105480.9A HK1205277A1 (en) 2012-08-08 2015-06-09 Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device

Country Status (6)

Country Link
JP (2) JP6394965B2 (ko)
KR (1) KR102216809B1 (ko)
CN (2) CN104662478B (ko)
HK (2) HK1245416A1 (ko)
TW (2) TWI600973B (ko)
WO (1) WO2014024483A1 (ko)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN110520798B (zh) * 2017-03-31 2021-11-16 株式会社尼康 物体交换装置、物体处理装置、平板显示器的制造方法、元件制造方法、物体交换方法、以及物体处理方法
KR102469192B1 (ko) * 2017-12-19 2022-11-21 엘지디스플레이 주식회사 디스플레이 장치의 제조 장치
KR102469193B1 (ko) * 2017-12-19 2022-11-21 엘지디스플레이 주식회사 디스플레이 장치의 제조 장치
WO2019188274A1 (ja) * 2018-03-30 2019-10-03 株式会社ニコン 保持装置、露光装置、フラットパネルディスプレイの製造方法、デバイス製造方法、及び保持方法
CN110858059B (zh) * 2018-08-24 2021-06-04 上海微电子装备（集团）股份有限公司 一种垂向运动机构及光刻设备
JP7196734B2 (ja) * 2019-03-29 2022-12-27 株式会社ニコン 基板搬送装置、露光装置、フラットパネルディスプレイ製造方法、デバイス製造方法、及び露光方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999039999A1 (fr) 1998-02-09 1999-08-12 Nikon Corporation Appareil de support d'une plaque de base, appareil et procede de transport de cette plaque, appareil de remplacement de cette plaque et appareil d'exposition et procede de fabrication dudit appareil
JP4249869B2 (ja) * 1999-12-22 2009-04-08 株式会社オーク製作所 基板搬送装置
JP2002368065A (ja) * 2001-06-08 2002-12-20 Hiroshi Akashi 位置合わせ装置
JP2005044882A (ja) * 2003-07-24 2005-02-17 Nikon Corp 搬送装置及び露光装置
JP2008300723A (ja) * 2007-06-01 2008-12-11 Nec Electronics Corp 処理装置
JP2009073646A (ja) * 2007-09-21 2009-04-09 Myotoku Ltd 浮上方法及び浮上ユニット
JP5338576B2 (ja) * 2009-09-04 2013-11-13 ウシオ電機株式会社 露光装置
TWI661505B (zh) * 2010-02-17 2019-06-01 日商尼康股份有限公司 Transfer device, transfer method, exposure device, and component manufacturing method
CN201886733U (zh) * 2010-06-24 2011-06-29 华东师范大学 激光显示的多点综合测量装置
CN201811787U (zh) * 2010-07-01 2011-04-27 华东师范大学 激光显示的光色性能的手持式测量装置
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US20120064461A1 (en) * 2010-09-13 2012-03-15 Nikon Corporation Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method

Also Published As

Publication number Publication date
JP6708233B2 (ja) 2020-06-10
TW201800876A (zh) 2018-01-01
CN107436540B (zh) 2020-05-26
WO2014024483A1 (ja) 2014-02-13
HK1205277A1 (en) 2015-12-11
KR20150041038A (ko) 2015-04-15
CN104662478A (zh) 2015-05-27
JP2019016801A (ja) 2019-01-31
JPWO2014024483A1 (ja) 2016-07-25
KR102216809B1 (ko) 2021-02-17
TWI739894B (zh) 2021-09-21
JP6394965B2 (ja) 2018-09-26
CN107436540A (zh) 2017-12-05
TW201407298A (zh) 2014-02-16
CN104662478B (zh) 2017-08-11
TWI600973B (zh) 2017-10-01

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