HK1245416A1 - Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device - Google Patents

Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device

Info

Publication number
HK1245416A1
HK1245416A1 HK18104745.0A HK18104745A HK1245416A1 HK 1245416 A1 HK1245416 A1 HK 1245416A1 HK 18104745 A HK18104745 A HK 18104745A HK 1245416 A1 HK1245416 A1 HK 1245416A1
Authority
HK
Hong Kong
Prior art keywords
swapping
manufacturing
exposure apparatus
panel display
manufacturing device
Prior art date
Application number
HK18104745.0A
Other languages
Chinese (zh)
Inventor
青木保夫
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1245416A1 publication Critical patent/HK1245416A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67739—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber
    • H01L21/67748—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations into and out of processing chamber horizontal transfer of a single workpiece
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
    • B65G2249/04—Arrangements of vacuum systems or suction cups
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063—Transporting devices for sheet glass
    • B65G49/064—Transporting devices for sheet glass in a horizontal position
    • B65G49/065—Transporting devices for sheet glass in a horizontal position supported partially or completely on fluid cushions, e.g. a gas cushion
HK18104745.0A 2012-08-08 2015-06-09 Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device HK1245416A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2012175778 2012-08-08

Publications (1)

Publication Number Publication Date
HK1245416A1 true HK1245416A1 (en) 2018-08-24

Family

ID=50067736

Family Applications (2)

Application Number Title Priority Date Filing Date
HK18104745.0A HK1245416A1 (en) 2012-08-08 2015-06-09 Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device
HK15105480.9A HK1205277A1 (en) 2012-08-08 2015-06-09 Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK15105480.9A HK1205277A1 (en) 2012-08-08 2015-06-09 Object-swapping method, object-swapping system, exposure apparatus, method for manufacturing flat-panel display, and method for manufacturing device

Country Status (6)

Country Link
JP (2) JP6394965B2 (en)
KR (1) KR102216809B1 (en)
CN (2) CN107436540B (en)
HK (2) HK1245416A1 (en)
TW (2) TWI600973B (en)
WO (1) WO2014024483A1 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2018180969A1 (en) * 2017-03-31 2018-10-04 株式会社ニコン Object replacement device, object processing device, production method for flat panel display, device production method, object replacement method, and object processing method
KR102469193B1 (en) * 2017-12-19 2022-11-21 엘지디스플레이 주식회사 Apparatus for manufacturing of display device
KR102469192B1 (en) * 2017-12-19 2022-11-21 엘지디스플레이 주식회사 Apparatus for manufacturing of display device
WO2019188274A1 (en) * 2018-03-30 2019-10-03 株式会社ニコン Holding apparatus, light exposure apparatus, flat panel display production method, device production method, and holding method
CN110858059B (en) * 2018-08-24 2021-06-04 上海微电子装备（集团）股份有限公司 Vertical motion mechanism and lithography apparatus
JP7196734B2 (en) * 2019-03-29 2022-12-27 株式会社ニコン Substrate transport apparatus, exposure apparatus, flat panel display manufacturing method, device manufacturing method, and exposure method

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100638533B1 (en) 1998-02-09 2006-10-26 가부시키가이샤 니콘 Apparatus for supporting base plate, apparatus and method for transferring base plate, method of replacing base plate, and exposure apparatus and method of manufacturing the same
JP4249869B2 (en) * 1999-12-22 2009-04-08 株式会社オーク製作所 Substrate transfer device
JP2002368065A (en) * 2001-06-08 2002-12-20 Hiroshi Akashi Aligning device
JP2005044882A (en) * 2003-07-24 2005-02-17 Nikon Corp Transporting device and aligner
JP2008300723A (en) * 2007-06-01 2008-12-11 Nec Electronics Corp Processing apparatus
JP2009073646A (en) * 2007-09-21 2009-04-09 Myotoku Ltd Floating method and floating unit
JP5338576B2 (en) * 2009-09-04 2013-11-13 ウシオ電機株式会社 Exposure equipment
TWI777060B (en) * 2010-02-17 2022-09-11 日商尼康股份有限公司 Conveyor device, exposure device, and device manufacturing method
CN201886733U (en) * 2010-06-24 2011-06-29 华东师范大学 Laser-displayed multipoint comprehensive measurement device
CN201811787U (en) * 2010-07-01 2011-04-27 华东师范大学 Handheld measuring device for photochromic performance of laser display
US20120064460A1 (en) * 2010-09-07 2012-03-15 Nikon Corporation Movable body apparatus, object processing device, exposure apparatus, flat-panel display manufacturing method, and device manufacturing method
US20120064461A1 (en) * 2010-09-13 2012-03-15 Nikon Corporation Movable body apparatus, exposure apparatus, device manufacturing method, flat-panel display manufacturing method, and object exchange method

Also Published As

Publication number Publication date
HK1205277A1 (en) 2015-12-11
KR20150041038A (en) 2015-04-15
JP6708233B2 (en) 2020-06-10
KR102216809B1 (en) 2021-02-17
TW201407298A (en) 2014-02-16
CN104662478A (en) 2015-05-27
JPWO2014024483A1 (en) 2016-07-25
TWI739894B (en) 2021-09-21
WO2014024483A1 (en) 2014-02-13
CN107436540B (en) 2020-05-26
CN107436540A (en) 2017-12-05
JP6394965B2 (en) 2018-09-26
JP2019016801A (en) 2019-01-31
TWI600973B (en) 2017-10-01
TW201800876A (en) 2018-01-01
CN104662478B (en) 2017-08-11

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