HK1206676A1 - 成膜裝置 - Google Patents

成膜裝置

Info

Publication number
HK1206676A1
HK1206676A1 HK15107152.2A HK15107152A HK1206676A1 HK 1206676 A1 HK1206676 A1 HK 1206676A1 HK 15107152 A HK15107152 A HK 15107152A HK 1206676 A1 HK1206676 A1 HK 1206676A1
Authority
HK
Hong Kong
Prior art keywords
film
forming apparatus
forming
Prior art date
Application number
HK15107152.2A
Other languages
English (en)
Inventor
白幡孝洋
織田容征
平松孝浩
Original Assignee
Toshiba Mitsubishi Elec Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Mitsubishi Elec Inc filed Critical Toshiba Mitsubishi Elec Inc
Publication of HK1206676A1 publication Critical patent/HK1206676A1/zh

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/0012Apparatus for achieving spraying before discharge from the apparatus
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/455Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B12/00Arrangements for controlling delivery; Arrangements for controlling the spray area
    • B05B12/16Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
    • B05B12/18Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area using fluids, e.g. gas streams
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B14/00Arrangements for collecting, re-using or eliminating excess spraying material
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B15/00Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
    • B05B15/50Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
    • B05B15/55Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/04Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
    • B05B7/0416Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
    • B05B7/0483Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with gas and liquid jets intersecting in the mixing chamber
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4412Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/448Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
    • C23C16/4486Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/46Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B1/00Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
    • B05B1/02Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
    • B05B1/04Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
    • B05B1/044Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/0075Nozzle arrangements in gas streams
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/08Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0807Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B05SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
    • B05BSPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
    • B05B7/00Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
    • B05B7/02Spray pistols; Apparatus for discharge
    • B05B7/08Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
    • B05B7/0807Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets
    • B05B7/0861Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets with one single jet constituted by a liquid or a mixture containing a liquid and several gas jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Dispersion Chemistry (AREA)
  • Nozzles (AREA)
  • Chemically Coating (AREA)
HK15107152.2A 2012-11-05 2015-07-27 成膜裝置 HK1206676A1 (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
PCT/JP2012/078580 WO2014068778A1 (ja) 2012-11-05 2012-11-05 成膜装置

Publications (1)

Publication Number Publication Date
HK1206676A1 true HK1206676A1 (zh) 2016-01-15

Family

ID=50626741

Family Applications (1)

Application Number Title Priority Date Filing Date
HK15107152.2A HK1206676A1 (zh) 2012-11-05 2015-07-27 成膜裝置

Country Status (8)

Country Link
US (1) US10458017B2 (zh)
EP (1) EP2915588B1 (zh)
JP (1) JP5914690B2 (zh)
KR (1) KR101764987B1 (zh)
CN (1) CN104755174B (zh)
HK (1) HK1206676A1 (zh)
TW (1) TWI466728B (zh)
WO (1) WO2014068778A1 (zh)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107073487B (zh) * 2014-10-01 2020-03-27 东芝三菱电机产业系统株式会社 成膜装置
CN104391433A (zh) * 2014-12-05 2015-03-04 合肥鑫晟光电科技有限公司 一种喷淋系统及其使用方法
WO2017068624A1 (ja) * 2015-10-19 2017-04-27 東芝三菱電機産業システム株式会社 成膜装置
US10544509B2 (en) * 2015-10-19 2020-01-28 Toshiba Mitsubishi-Electric Industrial Systems Corporation Film forming device
JP6466877B2 (ja) * 2016-03-29 2019-02-06 東芝三菱電機産業システム株式会社 成膜装置
JP6466876B2 (ja) * 2016-03-29 2019-02-06 東芝三菱電機産業システム株式会社 成膜装置
KR102198675B1 (ko) * 2016-04-26 2021-01-05 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 성막 장치
KR200485392Y1 (ko) 2016-12-07 2018-01-31 주식회사 나래나노텍 개선된 저온 미스트 cvd 장치
JP6863474B2 (ja) * 2017-11-30 2021-04-21 株式会社島津製作所 マトリックス膜形成装置
CN110017420B (zh) * 2018-01-09 2020-10-27 宝山钢铁股份有限公司 一种气动阀门的缸体自润滑装置
JP6529628B2 (ja) * 2018-04-17 2019-06-12 東芝三菱電機産業システム株式会社 成膜装置
CN115613005A (zh) * 2021-07-16 2023-01-17 长鑫存储技术有限公司 雾化装置与薄膜沉积系统
CN113578559A (zh) * 2021-08-27 2021-11-02 深圳市鑫王牌科技发展有限公司 喷嘴及喷雾设备

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US3382845A (en) 1964-07-21 1968-05-14 Avisun Corp Separating liquid droplets in spray coating operation
JP2838536B2 (ja) * 1989-04-12 1998-12-16 ノードソン株式会社 顔料又は染料の調色塗布方法
US6409839B1 (en) * 1997-06-02 2002-06-25 Msp Corporation Method and apparatus for vapor generation and film deposition
DE19730617A1 (de) * 1997-07-17 1999-01-21 Abb Research Ltd Druckzerstäuberdüse
US6322003B1 (en) * 1999-06-11 2001-11-27 Spraying Systems Co. Air assisted spray nozzle
JP2001321701A (ja) * 2000-03-08 2001-11-20 Dyflex Corp スプレーガン
JP2001327898A (ja) * 2000-05-24 2001-11-27 Tdk Corp 霧化方法及び装置、並びに固液混合方法及び装置
EP1311773B1 (de) * 2000-08-17 2006-11-22 KNORR-BREMSE SYSTEME FÜR NUTZFAHRZEUGE GmbH Scheibenbremse mit einer nachstell-einrichtung auf jeder seite der bremsscheibe
JP4293035B2 (ja) 2003-05-07 2009-07-08 セイコーエプソン株式会社 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置
JP3990322B2 (ja) * 2003-06-18 2007-10-10 株式会社東芝 基板乾燥方法及び装置
JP4494840B2 (ja) * 2003-06-27 2010-06-30 大日本スクリーン製造株式会社 異物除去装置、基板処理装置および基板処理方法
JP5124760B2 (ja) 2004-04-19 2013-01-23 静雄 藤田 成膜方法及び成膜装置
JP2007144297A (ja) 2005-11-28 2007-06-14 Masaharu Kaneko 薄膜形成方法
US8017186B2 (en) 2006-08-17 2011-09-13 Semiconductor Energy Laboratory Co., Ltd. Film forming method, discharging droplet method and droplet discharging device
CN101462095A (zh) * 2007-12-21 2009-06-24 穆兴叶 热气喷塑技术
JP2010247106A (ja) 2009-04-17 2010-11-04 Nozzle Network Co Ltd 微細化促進用の気液混合ノズル装置
FI9160U1 (fi) * 2010-01-04 2011-04-14 Beneq Oy Pinnoituslaite
KR101387634B1 (ko) * 2010-02-05 2014-04-22 엠 에스피 코포레이션 액상 전구체 증발을 위한 미세 액적 분무기
JP2011167675A (ja) * 2010-02-22 2011-09-01 Nanoplanet Corp 旋回ミスト発生装置及び旋回ミストの発生方法
WO2012124047A1 (ja) * 2011-03-15 2012-09-20 東芝三菱電機産業システム株式会社 成膜装置
CN103648974B (zh) * 2011-09-13 2015-10-21 东芝三菱电机产业系统株式会社 氧化膜成膜方法及氧化膜成膜装置

Also Published As

Publication number Publication date
KR101764987B1 (ko) 2017-08-03
TWI466728B (zh) 2015-01-01
JPWO2014068778A1 (ja) 2016-09-08
US10458017B2 (en) 2019-10-29
EP2915588A4 (en) 2016-07-06
CN104755174A (zh) 2015-07-01
US20150299854A1 (en) 2015-10-22
EP2915588A1 (en) 2015-09-09
JP5914690B2 (ja) 2016-05-11
TW201418894A (zh) 2014-05-16
KR20150055067A (ko) 2015-05-20
WO2014068778A1 (ja) 2014-05-08
EP2915588B1 (en) 2020-08-26
CN104755174B (zh) 2017-08-04

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