HK1206676A1 - 成膜裝置 - Google Patents
成膜裝置Info
- Publication number
- HK1206676A1 HK1206676A1 HK15107152.2A HK15107152A HK1206676A1 HK 1206676 A1 HK1206676 A1 HK 1206676A1 HK 15107152 A HK15107152 A HK 15107152A HK 1206676 A1 HK1206676 A1 HK 1206676A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- film
- forming apparatus
- forming
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/0012—Apparatus for achieving spraying before discharge from the apparatus
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/455—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for introducing gases into reaction chamber or for modifying gas flows in reaction chamber
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B12/00—Arrangements for controlling delivery; Arrangements for controlling the spray area
- B05B12/16—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area
- B05B12/18—Arrangements for controlling delivery; Arrangements for controlling the spray area for controlling the spray area using fluids, e.g. gas streams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B14/00—Arrangements for collecting, re-using or eliminating excess spraying material
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B15/00—Details of spraying plant or spraying apparatus not otherwise provided for; Accessories
- B05B15/50—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter
- B05B15/55—Arrangements for cleaning; Arrangements for preventing deposits, drying-out or blockage; Arrangements for detecting improper discharge caused by the presence of foreign matter using cleaning fluids
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/04—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge
- B05B7/0416—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid
- B05B7/0483—Spray pistols; Apparatus for discharge with arrangements for mixing liquids or other fluent materials before discharge with arrangements for mixing one gas and one liquid with gas and liquid jets intersecting in the mixing chamber
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/4412—Details relating to the exhausts, e.g. pumps, filters, scrubbers, particle traps
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4486—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by producing an aerosol and subsequent evaporation of the droplets or particles
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/46—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for heating the substrate
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B1/00—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means
- B05B1/02—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape
- B05B1/04—Nozzles, spray heads or other outlets, with or without auxiliary devices such as valves, heating means designed to produce a jet, spray, or other discharge of particular shape or nature, e.g. in single drops, or having an outlet of particular shape in flat form, e.g. fan-like, sheet-like
- B05B1/044—Slits, i.e. narrow openings defined by two straight and parallel lips; Elongated outlets for producing very wide discharges, e.g. fluid curtains
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/0075—Nozzle arrangements in gas streams
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
- B05B7/0807—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05B—SPRAYING APPARATUS; ATOMISING APPARATUS; NOZZLES
- B05B7/00—Spraying apparatus for discharge of liquids or other fluent materials from two or more sources, e.g. of liquid and air, of powder and gas
- B05B7/02—Spray pistols; Apparatus for discharge
- B05B7/08—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point
- B05B7/0807—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets
- B05B7/0861—Spray pistols; Apparatus for discharge with separate outlet orifices, e.g. to form parallel jets, i.e. the axis of the jets being parallel, to form intersecting jets, i.e. the axis of the jets converging but not necessarily intersecting at a point to form intersecting jets with one single jet constituted by a liquid or a mixture containing a liquid and several gas jets
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Nozzles (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PCT/JP2012/078580 WO2014068778A1 (ja) | 2012-11-05 | 2012-11-05 | 成膜装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1206676A1 true HK1206676A1 (zh) | 2016-01-15 |
Family
ID=50626741
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK15107152.2A HK1206676A1 (zh) | 2012-11-05 | 2015-07-27 | 成膜裝置 |
Country Status (8)
Country | Link |
---|---|
US (1) | US10458017B2 (zh) |
EP (1) | EP2915588B1 (zh) |
JP (1) | JP5914690B2 (zh) |
KR (1) | KR101764987B1 (zh) |
CN (1) | CN104755174B (zh) |
HK (1) | HK1206676A1 (zh) |
TW (1) | TWI466728B (zh) |
WO (1) | WO2014068778A1 (zh) |
Families Citing this family (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN107073487B (zh) * | 2014-10-01 | 2020-03-27 | 东芝三菱电机产业系统株式会社 | 成膜装置 |
CN104391433A (zh) * | 2014-12-05 | 2015-03-04 | 合肥鑫晟光电科技有限公司 | 一种喷淋系统及其使用方法 |
WO2017068624A1 (ja) * | 2015-10-19 | 2017-04-27 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
US10544509B2 (en) * | 2015-10-19 | 2020-01-28 | Toshiba Mitsubishi-Electric Industrial Systems Corporation | Film forming device |
JP6466877B2 (ja) * | 2016-03-29 | 2019-02-06 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
JP6466876B2 (ja) * | 2016-03-29 | 2019-02-06 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
KR102198675B1 (ko) * | 2016-04-26 | 2021-01-05 | 도시바 미쓰비시덴키 산교시스템 가부시키가이샤 | 성막 장치 |
KR200485392Y1 (ko) | 2016-12-07 | 2018-01-31 | 주식회사 나래나노텍 | 개선된 저온 미스트 cvd 장치 |
JP6863474B2 (ja) * | 2017-11-30 | 2021-04-21 | 株式会社島津製作所 | マトリックス膜形成装置 |
CN110017420B (zh) * | 2018-01-09 | 2020-10-27 | 宝山钢铁股份有限公司 | 一种气动阀门的缸体自润滑装置 |
JP6529628B2 (ja) * | 2018-04-17 | 2019-06-12 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
CN115613005A (zh) * | 2021-07-16 | 2023-01-17 | 长鑫存储技术有限公司 | 雾化装置与薄膜沉积系统 |
CN113578559A (zh) * | 2021-08-27 | 2021-11-02 | 深圳市鑫王牌科技发展有限公司 | 喷嘴及喷雾设备 |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3382845A (en) | 1964-07-21 | 1968-05-14 | Avisun Corp | Separating liquid droplets in spray coating operation |
JP2838536B2 (ja) * | 1989-04-12 | 1998-12-16 | ノードソン株式会社 | 顔料又は染料の調色塗布方法 |
US6409839B1 (en) * | 1997-06-02 | 2002-06-25 | Msp Corporation | Method and apparatus for vapor generation and film deposition |
DE19730617A1 (de) * | 1997-07-17 | 1999-01-21 | Abb Research Ltd | Druckzerstäuberdüse |
US6322003B1 (en) * | 1999-06-11 | 2001-11-27 | Spraying Systems Co. | Air assisted spray nozzle |
JP2001321701A (ja) * | 2000-03-08 | 2001-11-20 | Dyflex Corp | スプレーガン |
JP2001327898A (ja) * | 2000-05-24 | 2001-11-27 | Tdk Corp | 霧化方法及び装置、並びに固液混合方法及び装置 |
EP1311773B1 (de) * | 2000-08-17 | 2006-11-22 | KNORR-BREMSE SYSTEME FÜR NUTZFAHRZEUGE GmbH | Scheibenbremse mit einer nachstell-einrichtung auf jeder seite der bremsscheibe |
JP4293035B2 (ja) | 2003-05-07 | 2009-07-08 | セイコーエプソン株式会社 | 撥液膜被覆部材、液体噴出装置の構成部材、液体噴出ヘッドのノズルプレート、液体噴出ヘッドおよび液体噴出装置 |
JP3990322B2 (ja) * | 2003-06-18 | 2007-10-10 | 株式会社東芝 | 基板乾燥方法及び装置 |
JP4494840B2 (ja) * | 2003-06-27 | 2010-06-30 | 大日本スクリーン製造株式会社 | 異物除去装置、基板処理装置および基板処理方法 |
JP5124760B2 (ja) | 2004-04-19 | 2013-01-23 | 静雄 藤田 | 成膜方法及び成膜装置 |
JP2007144297A (ja) | 2005-11-28 | 2007-06-14 | Masaharu Kaneko | 薄膜形成方法 |
US8017186B2 (en) | 2006-08-17 | 2011-09-13 | Semiconductor Energy Laboratory Co., Ltd. | Film forming method, discharging droplet method and droplet discharging device |
CN101462095A (zh) * | 2007-12-21 | 2009-06-24 | 穆兴叶 | 热气喷塑技术 |
JP2010247106A (ja) | 2009-04-17 | 2010-11-04 | Nozzle Network Co Ltd | 微細化促進用の気液混合ノズル装置 |
FI9160U1 (fi) * | 2010-01-04 | 2011-04-14 | Beneq Oy | Pinnoituslaite |
KR101387634B1 (ko) * | 2010-02-05 | 2014-04-22 | 엠 에스피 코포레이션 | 액상 전구체 증발을 위한 미세 액적 분무기 |
JP2011167675A (ja) * | 2010-02-22 | 2011-09-01 | Nanoplanet Corp | 旋回ミスト発生装置及び旋回ミストの発生方法 |
WO2012124047A1 (ja) * | 2011-03-15 | 2012-09-20 | 東芝三菱電機産業システム株式会社 | 成膜装置 |
CN103648974B (zh) * | 2011-09-13 | 2015-10-21 | 东芝三菱电机产业系统株式会社 | 氧化膜成膜方法及氧化膜成膜装置 |
-
2012
- 2012-11-05 WO PCT/JP2012/078580 patent/WO2014068778A1/ja active Application Filing
- 2012-11-05 US US14/440,000 patent/US10458017B2/en active Active
- 2012-11-05 EP EP12887704.0A patent/EP2915588B1/en active Active
- 2012-11-05 KR KR1020157010105A patent/KR101764987B1/ko active IP Right Grant
- 2012-11-05 CN CN201280076801.5A patent/CN104755174B/zh active Active
- 2012-11-05 JP JP2014544189A patent/JP5914690B2/ja active Active
-
2013
- 2013-02-06 TW TW102104527A patent/TWI466728B/zh active
-
2015
- 2015-07-27 HK HK15107152.2A patent/HK1206676A1/zh unknown
Also Published As
Publication number | Publication date |
---|---|
KR101764987B1 (ko) | 2017-08-03 |
TWI466728B (zh) | 2015-01-01 |
JPWO2014068778A1 (ja) | 2016-09-08 |
US10458017B2 (en) | 2019-10-29 |
EP2915588A4 (en) | 2016-07-06 |
CN104755174A (zh) | 2015-07-01 |
US20150299854A1 (en) | 2015-10-22 |
EP2915588A1 (en) | 2015-09-09 |
JP5914690B2 (ja) | 2016-05-11 |
TW201418894A (zh) | 2014-05-16 |
KR20150055067A (ko) | 2015-05-20 |
WO2014068778A1 (ja) | 2014-05-08 |
EP2915588B1 (en) | 2020-08-26 |
CN104755174B (zh) | 2017-08-04 |
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