SG11201405405SA - Cvd apparatus - Google Patents

Cvd apparatus

Info

Publication number
SG11201405405SA
SG11201405405SA SG11201405405SA SG11201405405SA SG11201405405SA SG 11201405405S A SG11201405405S A SG 11201405405SA SG 11201405405S A SG11201405405S A SG 11201405405SA SG 11201405405S A SG11201405405S A SG 11201405405SA SG 11201405405S A SG11201405405S A SG 11201405405SA
Authority
SG
Singapore
Prior art keywords
cvd apparatus
cvd
Prior art date
Application number
SG11201405405SA
Inventor
Koji Abe
Yuuji Honda
Keiichi Terashima
Original Assignee
Youtec Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Youtec Co Ltd filed Critical Youtec Co Ltd
Publication of SG11201405405SA publication Critical patent/SG11201405405SA/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
    • C22C—ALLOYS
    • C22C30/00—Alloys containing less than 50% by weight of each constituent
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/4401—Means for minimising impurities, e.g. dust, moisture or residual gas, in the reaction chamber
    • C23C16/4404—Coatings or surface treatment on the inside of the reaction chamber or on parts thereof
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/04—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the coating material
    • C23C4/06—Metallic material
    • C23C4/08—Metallic material containing only metal elements

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Plasma & Fusion (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Chemical Vapour Deposition (AREA)
  • Coating By Spraying Or Casting (AREA)
SG11201405405SA 2012-03-09 2013-02-21 Cvd apparatus SG11201405405SA (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2012052932 2012-03-09
PCT/JP2013/055263 WO2013133110A1 (en) 2012-03-09 2013-02-21 Cvd device

Publications (1)

Publication Number Publication Date
SG11201405405SA true SG11201405405SA (en) 2014-11-27

Family

ID=49116592

Family Applications (1)

Application Number Title Priority Date Filing Date
SG11201405405SA SG11201405405SA (en) 2012-03-09 2013-02-21 Cvd apparatus

Country Status (3)

Country Link
JP (2) JP6229136B2 (en)
SG (1) SG11201405405SA (en)
WO (1) WO2013133110A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9875890B2 (en) * 2015-03-24 2018-01-23 Lam Research Corporation Deposition of metal dielectric film for hardmasks

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH06136544A (en) * 1992-10-29 1994-05-17 Sumitomo Metal Ind Ltd Plasma treatment device
JPH10321555A (en) * 1997-05-15 1998-12-04 Tokyo Electron Ltd Plasma film deposition device and cleaning method therefor
JPH11335842A (en) * 1998-05-22 1999-12-07 Hitachi Ltd Cvd device and cleaning of the device
KR20010062209A (en) * 1999-12-10 2001-07-07 히가시 데쓰로 Processing apparatus with a chamber having therein a high-etching resistant sprayed film
JP4551561B2 (en) * 1999-12-28 2010-09-29 株式会社東芝 Vacuum film forming apparatus parts, vacuum film forming apparatus using the same, and target apparatus
JP2002033497A (en) * 2000-07-14 2002-01-31 Nihon University Solar cell and panel thereof
JP2002033286A (en) * 2000-07-17 2002-01-31 Mitsubishi Heavy Ind Ltd Wafer-retaining table and semiconductor manufacturing equipment
JP2002088461A (en) * 2000-09-14 2002-03-27 Kawasaki Steel Corp Corrosion resisting roll
JP2002155372A (en) * 2000-11-17 2002-05-31 Mitsubishi Chemicals Corp Method and system for film deposition, and method for manufacturing information recording medium
JP4647249B2 (en) * 2004-06-09 2011-03-09 ルネサスエレクトロニクス株式会社 Thin film forming apparatus component and method of manufacturing the same
JP5053595B2 (en) * 2006-08-18 2012-10-17 正義 梅野 DLC film forming method and DLC film manufacturing apparatus
JP2009068067A (en) * 2007-09-13 2009-04-02 Covalent Materials Corp Plasma resistant ceramics sprayed coating
JP4704453B2 (en) * 2008-07-16 2011-06-15 株式会社プラズマイオンアシスト Diamond-like carbon manufacturing apparatus, manufacturing method, and industrial product
JP2010171388A (en) * 2008-12-25 2010-08-05 Hitachi Kokusai Electric Inc Substrate processing apparatus, method of manufacturing semiconductor device, and reaction tube for processing substrate

Also Published As

Publication number Publication date
JPWO2013133110A1 (en) 2015-07-30
JP6229136B2 (en) 2017-11-15
JP2017179612A (en) 2017-10-05
WO2013133110A1 (en) 2013-09-12

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