HK1187116A1 - 防塵薄膜組件 - Google Patents
防塵薄膜組件Info
- Publication number
- HK1187116A1 HK1187116A1 HK13113681.2A HK13113681A HK1187116A1 HK 1187116 A1 HK1187116 A1 HK 1187116A1 HK 13113681 A HK13113681 A HK 13113681A HK 1187116 A1 HK1187116 A1 HK 1187116A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- dust
- thin film
- film assembly
- proofing
- proofing thin
- Prior art date
Links
- 239000010409 thin film Substances 0.000 title 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/22—Masks or mask blanks for imaging by radiation of 100nm or shorter wavelength, e.g. X-ray masks, extreme ultraviolet [EUV] masks; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
- G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Laminated Bodies (AREA)
- Adhesives Or Adhesive Processes (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012100882A JP5749680B2 (ja) | 2012-04-26 | 2012-04-26 | ペリクル |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1187116A1 true HK1187116A1 (zh) | 2014-03-28 |
Family
ID=49461992
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK13113681.2A HK1187116A1 (zh) | 2012-04-26 | 2013-12-09 | 防塵薄膜組件 |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5749680B2 (zh) |
KR (1) | KR102040547B1 (zh) |
CN (1) | CN103376671B (zh) |
HK (1) | HK1187116A1 (zh) |
TW (1) | TWI475086B (zh) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP6150300B2 (ja) * | 2014-04-04 | 2017-06-21 | 信越化学工業株式会社 | ペリクルの貼り付け部確認方法 |
JP6347741B2 (ja) * | 2014-12-25 | 2018-06-27 | 信越化学工業株式会社 | ペリクル |
TWI566033B (zh) * | 2015-04-17 | 2017-01-11 | Micro Lithography Inc | Mask dustproof frame structure |
US10036951B2 (en) | 2015-05-29 | 2018-07-31 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle assembly and fabrication methods thereof |
US11143952B2 (en) * | 2017-09-28 | 2021-10-12 | Taiwan Semiconductor Manufacturing Company, Ltd. | Pellicle removal method |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS58219023A (ja) | 1982-06-15 | 1983-12-20 | Daicel Chem Ind Ltd | 樹脂薄膜の製造方法 |
US4861402A (en) | 1984-10-16 | 1989-08-29 | Du Pont Tau Laboratories, Inc. | Method of making a cellulose acetate butyrate pellicle |
JPS6327707A (ja) | 1986-07-21 | 1988-02-05 | Matsushita Electric Ind Co Ltd | 双曲面鏡検査装置 |
JPH06260398A (ja) * | 1993-03-05 | 1994-09-16 | Canon Inc | X線マスク構造体及びその製造方法、x線マスク構造体を用いたx線露光方法及びそのx線露光方法により製造される半導体デバイス |
JP2000292908A (ja) * | 1999-04-02 | 2000-10-20 | Shin Etsu Chem Co Ltd | リソグラフィー用ペリクル |
JP2003307832A (ja) * | 2002-04-16 | 2003-10-31 | Asahi Glass Co Ltd | ペリクル及びペリクル装着フォトマスク |
EP1429186A3 (en) * | 2002-12-09 | 2006-06-07 | ASML Holding N.V. | Pellicle frame with porous inserts or heightened bonding surfaces |
JP4839041B2 (ja) * | 2005-08-29 | 2011-12-14 | 東レ・ダウコーニング株式会社 | 絶縁性液状ダイボンディング剤および半導体装置 |
EP2322585A1 (en) * | 2005-12-26 | 2011-05-18 | Hitachi Chemical Co., Ltd. | Adhesive composition, circuit connecting material and connecting structure of circuit member |
JP2011028091A (ja) * | 2009-07-28 | 2011-02-10 | Shin-Etsu Chemical Co Ltd | ペリクル |
JP2011076042A (ja) * | 2009-10-02 | 2011-04-14 | Shin-Etsu Chemical Co Ltd | ペリクル |
KR101990345B1 (ko) * | 2009-10-02 | 2019-06-18 | 신에쓰 가가꾸 고교 가부시끼가이샤 | 펠리클의 제조 방법 |
JP4951051B2 (ja) * | 2009-10-30 | 2012-06-13 | 信越化学工業株式会社 | ペリクルフレーム及びペリクル |
JP5532845B2 (ja) * | 2009-11-18 | 2014-06-25 | 信越化学工業株式会社 | 化粧料 |
JP5436296B2 (ja) * | 2010-03-26 | 2014-03-05 | 信越化学工業株式会社 | リソグラフィー用ペリクル |
-
2012
- 2012-04-26 JP JP2012100882A patent/JP5749680B2/ja active Active
-
2013
- 2013-01-18 KR KR1020130005761A patent/KR102040547B1/ko active IP Right Grant
- 2013-04-19 TW TW102113867A patent/TWI475086B/zh active
- 2013-04-26 CN CN201310149430.5A patent/CN103376671B/zh active Active
- 2013-12-09 HK HK13113681.2A patent/HK1187116A1/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
TW201350554A (zh) | 2013-12-16 |
TWI475086B (zh) | 2015-03-01 |
CN103376671A (zh) | 2013-10-30 |
JP5749680B2 (ja) | 2015-07-15 |
KR20130121005A (ko) | 2013-11-05 |
CN103376671B (zh) | 2016-07-13 |
KR102040547B1 (ko) | 2019-11-05 |
JP2013228582A (ja) | 2013-11-07 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20220422 |