HK1177324A1 - Surface coatings - Google Patents
Surface coatingsInfo
- Publication number
- HK1177324A1 HK1177324A1 HK13104194.1A HK13104194A HK1177324A1 HK 1177324 A1 HK1177324 A1 HK 1177324A1 HK 13104194 A HK13104194 A HK 13104194A HK 1177324 A1 HK1177324 A1 HK 1177324A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- surface coatings
- coatings
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D1/00—Processes for applying liquids or other fluent materials
- B05D1/62—Plasma-deposition of organic layers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F2/00—Processes of polymerisation
- C08F2/46—Polymerisation initiated by wave energy or particle radiation
- C08F2/52—Polymerisation initiated by wave energy or particle radiation by electric discharge, e.g. voltolisation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
- C23C16/509—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges using internal electrodes
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/52—Controlling or regulating the coating process
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32403—Treating multiple sides of workpieces, e.g. 3D workpieces
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32541—Shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32532—Electrodes
- H01J37/32568—Relative arrangement or disposition of electrodes; moving means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
- H05K3/282—Applying non-metallic protective coatings for inhibiting the corrosion of the circuit, e.g. for preserving the solderability
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D5/00—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures
- B05D5/08—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface
- B05D5/083—Processes for applying liquids or other fluent materials to surfaces to obtain special surface effects, finishes or structures to obtain an anti-friction or anti-adhesive surface involving the use of fluoropolymers
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/09—Treatments involving charged particles
- H05K2203/095—Plasma, e.g. for treating a substrate to improve adhesion with a conductor or for cleaning holes
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Metallurgy (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Polymers & Plastics (AREA)
- Medicinal Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physical Vapour Deposition (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Chemical Vapour Deposition (AREA)
- Polymerisation Methods In General (AREA)
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Formation Of Insulating Films (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB1115465.5A GB2489761B (en) | 2011-09-07 | 2011-09-07 | Surface coatings |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1177324A1 true HK1177324A1 (en) | 2013-08-16 |
Family
ID=44908215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK13104194.1A HK1177324A1 (en) | 2011-09-07 | 2013-04-05 | Surface coatings |
Country Status (12)
Country | Link |
---|---|
US (2) | US20140322525A1 (ko) |
EP (1) | EP2753418B1 (ko) |
JP (1) | JP6175438B2 (ko) |
KR (1) | KR101666285B1 (ko) |
CN (1) | CN103930192B (ko) |
DK (1) | DK2753418T3 (ko) |
ES (1) | ES2776999T3 (ko) |
GB (1) | GB2489761B (ko) |
HK (1) | HK1177324A1 (ko) |
PL (1) | PL2753418T3 (ko) |
PT (1) | PT2753418T (ko) |
WO (1) | WO2013034920A2 (ko) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2510213A (en) * | 2012-08-13 | 2014-07-30 | Europlasma Nv | Forming a protective polymer coating on a component |
GB201316113D0 (en) * | 2013-09-10 | 2013-10-23 | Europlasma Nv | Apparatus and method for applying surface coatings |
WO2014056968A1 (en) * | 2012-10-09 | 2014-04-17 | Europlasma Nv | Apparatus and method for applying surface coatings |
BE1021288B1 (nl) * | 2013-10-07 | 2015-10-20 | Europlasma Nv | Verbeterde manieren om plasma te genereren op continue vermogens wijze voor lage druk plasma processen |
GB2521137A (en) * | 2013-12-10 | 2015-06-17 | Europlasma Nv | Surface Coatings |
GB201403558D0 (en) | 2014-02-28 | 2014-04-16 | P2I Ltd | Coating |
JP6114710B2 (ja) * | 2014-03-27 | 2017-04-12 | 富士フイルム株式会社 | 太陽電池 |
CN105744783A (zh) * | 2014-12-09 | 2016-07-06 | 友威科技股份有限公司 | 多电极蚀刻装置 |
PL3308613T3 (pl) * | 2015-06-09 | 2020-11-16 | P2I Ltd | Sposób tworzenia powłoki na urządzeniu elektronicznym lub elektrycznym |
JP2018517044A (ja) | 2015-06-09 | 2018-06-28 | ピーツーアイ リミティド | コーティング |
BE1023805B1 (fr) * | 2016-06-30 | 2017-07-26 | Green Frix | Dispositif pour le traitement electrique d'un corps gras d'origine vegetale |
KR101931692B1 (ko) | 2017-10-11 | 2018-12-21 | 주식회사 유진테크 | 배치식 플라즈마 기판처리장치 |
EP4071269A4 (en) * | 2019-12-04 | 2024-04-03 | Jiangsu Favored Nanotechnology Co., Ltd. | COATING SYSTEM |
KR102433553B1 (ko) * | 2020-07-30 | 2022-08-18 | 연세대학교 산학협력단 | 폴리머 증착기 및 폴리머 증착 방법 |
AU2021402001A1 (en) * | 2020-12-18 | 2023-07-06 | Xefco Pty Ltd | System for treatment of substrates |
Family Cites Families (42)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4282077A (en) * | 1980-07-03 | 1981-08-04 | General Dynamics, Pomona Division | Uniform plasma etching system |
DE3041551A1 (de) * | 1980-11-04 | 1982-06-09 | Siemens AG, 1000 Berlin und 8000 München | Elektroden fuer plasma-aetzanlage |
US4381965A (en) * | 1982-01-06 | 1983-05-03 | Drytek, Inc. | Multi-planar electrode plasma etching |
US4628006A (en) * | 1984-01-20 | 1986-12-09 | The United States Of America As Represented By The Secretary Of The Navy | Passivation of hybrid microelectronic circuits |
US4825806A (en) * | 1984-02-17 | 1989-05-02 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Film forming apparatus |
GB8622820D0 (en) * | 1986-09-23 | 1986-10-29 | Nordiko Ltd | Electrode assembly & apparatus |
JPS63311794A (ja) * | 1987-06-12 | 1988-12-20 | Sumitomo Electric Ind Ltd | フレキシブル配線板の製造方法 |
JPH03207866A (ja) * | 1990-01-08 | 1991-09-11 | Nippon Steel Corp | 複数電極式プラズマ発生装置 |
US5593550A (en) * | 1994-05-06 | 1997-01-14 | Medtronic, Inc. | Plasma process for reducing friction within the lumen of polymeric tubing |
ATE316593T1 (de) * | 1997-06-14 | 2006-02-15 | Secr Defence | Oberflächenbehandlung |
JP3649898B2 (ja) * | 1997-09-25 | 2005-05-18 | 三洋電機株式会社 | プラズマcvd装置を用いた多層薄膜形成装置 |
JP3501668B2 (ja) * | 1997-12-10 | 2004-03-02 | キヤノン株式会社 | プラズマcvd方法及びプラズマcvd装置 |
EP1130948B1 (en) * | 1999-09-09 | 2011-01-26 | Ishikawajima-Harima Heavy Industries Co., Ltd. | Inner-electrode plasma processing apparatus and method of plasma processing |
JP3516918B2 (ja) * | 2000-01-19 | 2004-04-05 | 株式会社日立国際電気 | 半導体装置の製造方法及び半導体製造装置 |
US20040020432A1 (en) * | 2000-05-17 | 2004-02-05 | Tomoko Takagi | Plasma cvd apparatus and method |
DE10114897A1 (de) * | 2001-03-26 | 2002-10-24 | Infineon Technologies Ag | Elektronisches Bauteil |
JP3711955B2 (ja) * | 2002-04-01 | 2005-11-02 | 日産自動車株式会社 | 回転電機の制御装置 |
TW544071U (en) * | 2002-04-02 | 2003-07-21 | Nano Electronics And Micro Sys | Electrode device for plasma treatment system |
JP2004103423A (ja) * | 2002-09-10 | 2004-04-02 | Matsushita Electric Works Ltd | プラズマ処理方法及びプラズマ処理装置 |
JP4120546B2 (ja) * | 2002-10-04 | 2008-07-16 | 株式会社Ihi | 薄膜形成方法及び装置並びに太陽電池の製造方法及び装置並びに太陽電池 |
US20040152381A1 (en) * | 2003-01-22 | 2004-08-05 | The Procter & Gamble Company | Fibrous products and methods of making and using them |
US7824520B2 (en) * | 2003-03-26 | 2010-11-02 | Semiconductor Energy Laboratory Co., Ltd. | Plasma treatment apparatus |
WO2004108984A1 (ja) * | 2003-06-06 | 2004-12-16 | Konica Minolta Holdings, Inc. | 薄膜形成方法および薄膜形成体 |
US20060162741A1 (en) * | 2005-01-26 | 2006-07-27 | Cerionx, Inc. | Method and apparatus for cleaning and surface conditioning objects with plasma |
WO2005045873A2 (en) * | 2003-10-28 | 2005-05-19 | Nordson Corporation | Plasma processing system and plasma treatment process |
US7695590B2 (en) * | 2004-03-26 | 2010-04-13 | Applied Materials, Inc. | Chemical vapor deposition plasma reactor having plural ion shower grids |
US7712434B2 (en) * | 2004-04-30 | 2010-05-11 | Lam Research Corporation | Apparatus including showerhead electrode and heater for plasma processing |
US7673970B2 (en) * | 2004-06-30 | 2010-03-09 | Lexmark International, Inc. | Flexible circuit corrosion protection |
KR20070045334A (ko) * | 2004-08-24 | 2007-05-02 | 고쿠리츠다이가쿠호진 규슈다이가쿠 | 클러스터-프리의 아모퍼스 실리콘막과 그것을 제조하는방법 및 장치 |
EP1808056B1 (en) * | 2004-11-05 | 2015-08-26 | Dow Corning Ireland Limited | Plasma process |
JP4584722B2 (ja) * | 2005-01-13 | 2010-11-24 | シャープ株式会社 | プラズマ処理装置および同装置により製造された半導体素子 |
US20090255630A1 (en) * | 2005-04-28 | 2009-10-15 | Hitachi Kokusai Electric Inc. | Substrate processing apparatus and electrode member |
US7938931B2 (en) * | 2006-05-24 | 2011-05-10 | Lam Research Corporation | Edge electrodes with variable power |
US20080083732A1 (en) * | 2006-10-10 | 2008-04-10 | Sumitomo Electric Industries, Ltd. | Wafer holder and exposure apparatus equipped with wafer holder |
JP5654238B2 (ja) * | 2006-12-28 | 2015-01-14 | ネーデルランツ オルガニサティー フォール トゥーゲパストナトゥールヴェテンシャッペリーク オンデルズーク テーエンオー | 表面誘電体バリア放電プラズマユニット、および表面プラズマを発生させる方法 |
GB0703172D0 (en) | 2007-02-19 | 2007-03-28 | Pa Knowledge Ltd | Printed circuit boards |
JP4838197B2 (ja) * | 2007-06-05 | 2011-12-14 | 東京エレクトロン株式会社 | プラズマ処理装置,電極温度調整装置,電極温度調整方法 |
US8438990B2 (en) * | 2008-09-30 | 2013-05-14 | Applied Materials, Inc. | Multi-electrode PECVD source |
EP2408947A1 (en) * | 2009-03-19 | 2012-01-25 | Anthony Herbert | Apparatus and method for deposition of functional coatings |
JP2011100930A (ja) * | 2009-11-09 | 2011-05-19 | Noda Screen:Kk | 回路基板用保護絶縁材 |
BE1019159A5 (nl) * | 2010-01-22 | 2012-04-03 | Europlasma Nv | Werkwijze voor de afzetting van een gelijkmatige nanocoating door middel van een lage druk plasma proces. |
EP2422887A1 (en) * | 2010-08-27 | 2012-02-29 | Oticon A/S | A method of coating a surface with a water and oil repellant polymer layer |
-
2011
- 2011-09-07 GB GB1115465.5A patent/GB2489761B/en active Active
-
2012
- 2012-09-07 WO PCT/GB2012/052201 patent/WO2013034920A2/en active Application Filing
- 2012-09-07 EP EP12766708.7A patent/EP2753418B1/en active Active
- 2012-09-07 JP JP2014529068A patent/JP6175438B2/ja active Active
- 2012-09-07 ES ES12766708T patent/ES2776999T3/es active Active
- 2012-09-07 PL PL12766708T patent/PL2753418T3/pl unknown
- 2012-09-07 US US14/343,474 patent/US20140322525A1/en not_active Abandoned
- 2012-09-07 DK DK12766708.7T patent/DK2753418T3/da active
- 2012-09-07 KR KR1020147009163A patent/KR101666285B1/ko active IP Right Grant
- 2012-09-07 CN CN201280051836.3A patent/CN103930192B/zh active Active
- 2012-09-07 PT PT127667087T patent/PT2753418T/pt unknown
-
2013
- 2013-04-05 HK HK13104194.1A patent/HK1177324A1/xx not_active IP Right Cessation
-
2019
- 2019-07-19 US US16/517,523 patent/US10923330B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
DK2753418T3 (da) | 2020-03-16 |
GB201115465D0 (en) | 2011-10-26 |
US20190393020A1 (en) | 2019-12-26 |
CN103930192A (zh) | 2014-07-16 |
KR101666285B1 (ko) | 2016-10-13 |
EP2753418A2 (en) | 2014-07-16 |
PL2753418T3 (pl) | 2020-09-21 |
ES2776999T3 (es) | 2020-08-03 |
JP2014528143A (ja) | 2014-10-23 |
KR20140096266A (ko) | 2014-08-05 |
US20140322525A1 (en) | 2014-10-30 |
EP2753418B1 (en) | 2019-12-11 |
CN103930192B (zh) | 2016-11-09 |
WO2013034920A2 (en) | 2013-03-14 |
PT2753418T (pt) | 2020-03-24 |
US10923330B2 (en) | 2021-02-16 |
GB2489761A (en) | 2012-10-10 |
GB2489761B (en) | 2015-03-04 |
JP6175438B2 (ja) | 2017-08-02 |
WO2013034920A3 (en) | 2013-05-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
HRP20190681T1 (hr) | Premazivanje ploče | |
IL237181A0 (en) | surface coatings | |
GB2489761B (en) | Surface coatings | |
EP2736985A4 (en) | SUPERHYDROPHOPE SURFACES | |
EP2764061A4 (en) | INFRARED REFLECTIVE COATINGS | |
GB201212361D0 (en) | Coatings | |
PT2668695T (pt) | Revestimento transparente ao radar | |
EP2698426A4 (en) | CELLULAR ADHESION PHOTOGRAPHING BASE MATERIAL | |
GB201113385D0 (en) | Coating composition | |
GB201219417D0 (en) | Coatings | |
EP2794768A4 (en) | SURFACE COATINGS AND METHODS | |
GB201122269D0 (en) | Surface | |
IL238257A0 (en) | surface coatings | |
EP2718383A4 (en) | CLEAR VARNISH, ACRYLIC COATINGS | |
EP2812460A4 (en) | SURFACE | |
EP2755475A4 (en) | BIOCIDE COATING | |
GB2496644B (en) | Non-slip coating composition | |
HK1201149A1 (en) | Lubricious coatings | |
PL2643030T3 (pl) | Powłoka powierzchni balona | |
PL2729196T3 (pl) | Powłoka powierzchni balonu | |
EP2714808A4 (en) | ANTI-CORROSION COATINGS | |
GB201407050D0 (en) | Coating Composition | |
PL2798013T3 (pl) | Powłoka przeciwodblaskowa | |
GB201100924D0 (en) | Surfaces | |
GB201218055D0 (en) | Surface coatings |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20190910 |