HK1153848A1 - Xrf system having multiple excitation energy bands in highly aligned package xrf - Google Patents
Xrf system having multiple excitation energy bands in highly aligned package xrfInfo
- Publication number
- HK1153848A1 HK1153848A1 HK11108104.3A HK11108104A HK1153848A1 HK 1153848 A1 HK1153848 A1 HK 1153848A1 HK 11108104 A HK11108104 A HK 11108104A HK 1153848 A1 HK1153848 A1 HK 1153848A1
- Authority
- HK
- Hong Kong
- Prior art keywords
- xrf
- excitation energy
- energy bands
- multiple excitation
- highly aligned
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
- G01N23/20008—Constructional details of analysers, e.g. characterised by X-ray source, detector or optical system; Accessories therefor; Preparing specimens therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G1/00—X-ray apparatus involving X-ray tubes; Circuits therefor
- H05G1/02—Constructional details
- H05G1/04—Mounting the X-ray tube within a closed housing
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/07—Investigating materials by wave or particle radiation secondary emission
- G01N2223/076—X-ray fluorescence
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/10—Different kinds of radiation or particles
- G01N2223/1003—Different kinds of radiation or particles monochromatic
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/30—Accessories, mechanical or electrical features
- G01N2223/315—Accessories, mechanical or electrical features monochromators
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/423—Imaging multispectral imaging-multiple energy imaging
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/062—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements the element being a crystal
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K2201/00—Arrangements for handling radiation or particles
- G21K2201/06—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements
- G21K2201/064—Arrangements for handling radiation or particles using diffractive, refractive or reflecting elements having a curved surface
Landscapes
- Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US3389908P | 2008-03-05 | 2008-03-05 | |
US3922008P | 2008-03-25 | 2008-03-25 | |
US4297408P | 2008-04-07 | 2008-04-07 | |
PCT/US2009/035847 WO2009111454A1 (en) | 2008-03-05 | 2009-03-03 | Xrf system having multiple excitation energy bands in highly aligned package |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1153848A1 true HK1153848A1 (en) | 2012-04-05 |
Family
ID=41056347
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK11108104.3A HK1153848A1 (en) | 2008-03-05 | 2011-08-04 | Xrf system having multiple excitation energy bands in highly aligned package xrf |
Country Status (8)
Country | Link |
---|---|
US (4) | US8559597B2 (xx) |
EP (1) | EP2260501B1 (xx) |
JP (1) | JP5539906B2 (xx) |
CN (2) | CN105044139B (xx) |
CA (1) | CA2753990C (xx) |
HK (1) | HK1153848A1 (xx) |
MX (1) | MX2010009713A (xx) |
WO (1) | WO2009111454A1 (xx) |
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EP2260501B1 (en) | 2008-03-05 | 2021-08-25 | X-ray Optical Systems, INC. | Xrf system having multiple excitation energy bands in highly aligned package |
US8331534B2 (en) | 2009-04-16 | 2012-12-11 | Silver Eric H | Monochromatic X-ray methods and apparatus |
US9383326B2 (en) * | 2011-06-20 | 2016-07-05 | X-Ray Optical Systems, Inc. | Online monitoring of contaminants in crude and heavy fuels, and refinery applications thereof |
WO2013025682A2 (en) | 2011-08-15 | 2013-02-21 | X-Ray Optical Systems, Inc. | Sample viscosity and flow control for heavy samples, and x-ray analysis applications thereof |
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US20140294157A1 (en) * | 2011-10-26 | 2014-10-02 | X-Ray Optical Systems, Inc. | Support structure and highly aligned monochromating x-ray optics for x-ray analysis engines and analyzers |
US20150117599A1 (en) | 2013-10-31 | 2015-04-30 | Sigray, Inc. | X-ray interferometric imaging system |
EP2820666A4 (en) * | 2012-02-28 | 2016-02-17 | X Ray Optical Sys Inc | DEVICE FOR ANALYSIS BY X-RAYS WITH MULTIPLE EXTRACTION ENERGY TAPES, PRODUCED BY X-RAY TUBE ANODES MADE OF SEVERAL MATERIALS AND MONOCHROMATIC OPTICS |
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US9449781B2 (en) | 2013-12-05 | 2016-09-20 | Sigray, Inc. | X-ray illuminators with high flux and high flux density |
US10297359B2 (en) | 2013-09-19 | 2019-05-21 | Sigray, Inc. | X-ray illumination system with multiple target microstructures |
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USRE48612E1 (en) | 2013-10-31 | 2021-06-29 | Sigray, Inc. | X-ray interferometric imaging system |
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US10401309B2 (en) | 2014-05-15 | 2019-09-03 | Sigray, Inc. | X-ray techniques using structured illumination |
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US9966161B2 (en) * | 2015-09-21 | 2018-05-08 | Uchicago Argonne, Llc | Mechanical design of thin-film diamond crystal mounting apparatus with optimized thermal contact and crystal strain for coherence preservation x-ray optics |
US10677744B1 (en) * | 2016-06-03 | 2020-06-09 | U.S. Department Of Energy | Multi-cone x-ray imaging Bragg crystal spectrometer |
US10247683B2 (en) | 2016-12-03 | 2019-04-02 | Sigray, Inc. | Material measurement techniques using multiple X-ray micro-beams |
PL3364421T3 (pl) * | 2017-02-17 | 2019-08-30 | Rigaku Corporation | Rentgenowskie urządzenie optyczne |
JP6937380B2 (ja) | 2017-03-22 | 2021-09-22 | シグレイ、インコーポレイテッド | X線分光を実施するための方法およびx線吸収分光システム |
AU2018269056B2 (en) | 2017-05-19 | 2024-01-25 | Imagine Scientific, Inc. | Monochromatic x-ray imaging systems and methods |
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US10818467B2 (en) | 2018-02-09 | 2020-10-27 | Imagine Scientific, Inc. | Monochromatic x-ray imaging systems and methods |
US10578566B2 (en) | 2018-04-03 | 2020-03-03 | Sigray, Inc. | X-ray emission spectrometer system |
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US10658145B2 (en) | 2018-07-26 | 2020-05-19 | Sigray, Inc. | High brightness x-ray reflection source |
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US10962491B2 (en) | 2018-09-04 | 2021-03-30 | Sigray, Inc. | System and method for x-ray fluorescence with filtering |
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DE112020004169T5 (de) | 2019-09-03 | 2022-05-25 | Sigray, Inc. | System und verfahren zur computergestützten laminografieröntgenfluoreszenz-bildgebung |
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EP2260501B1 (en) | 2008-03-05 | 2021-08-25 | X-ray Optical Systems, INC. | Xrf system having multiple excitation energy bands in highly aligned package |
US7738630B2 (en) * | 2008-03-05 | 2010-06-15 | X-Ray Optical Systems, Inc. | Highly aligned x-ray optic and source assembly for precision x-ray analysis applications |
-
2009
- 2009-03-03 EP EP09716373.7A patent/EP2260501B1/en active Active
- 2009-03-03 CN CN201510303481.8A patent/CN105044139B/zh active Active
- 2009-03-03 CA CA2753990A patent/CA2753990C/en active Active
- 2009-03-03 CN CN200980111618.2A patent/CN101981651B/zh active Active
- 2009-03-03 WO PCT/US2009/035847 patent/WO2009111454A1/en active Application Filing
- 2009-03-03 US US12/920,641 patent/US8559597B2/en active Active
- 2009-03-03 MX MX2010009713A patent/MX2010009713A/es active IP Right Grant
- 2009-03-03 JP JP2010549809A patent/JP5539906B2/ja active Active
-
2011
- 2011-08-04 HK HK11108104.3A patent/HK1153848A1/xx not_active IP Right Cessation
-
2013
- 2013-10-11 US US14/052,078 patent/US9048001B2/en active Active
-
2015
- 2015-06-01 US US14/727,027 patent/US9343193B2/en active Active
-
2016
- 2016-05-16 US US15/155,575 patent/US20160260514A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
CA2753990A1 (en) | 2009-09-11 |
JP5539906B2 (ja) | 2014-07-02 |
CN105044139B (zh) | 2019-04-23 |
US20160260514A1 (en) | 2016-09-08 |
US9343193B2 (en) | 2016-05-17 |
JP2011513751A (ja) | 2011-04-28 |
MX2010009713A (es) | 2011-03-29 |
CN105044139A (zh) | 2015-11-11 |
EP2260501A4 (en) | 2014-03-19 |
CN101981651B (zh) | 2015-07-08 |
CN101981651A (zh) | 2011-02-23 |
EP2260501B1 (en) | 2021-08-25 |
EP2260501A1 (en) | 2010-12-15 |
CA2753990C (en) | 2017-11-21 |
WO2009111454A1 (en) | 2009-09-11 |
US20150262722A1 (en) | 2015-09-17 |
US20110170666A1 (en) | 2011-07-14 |
US9048001B2 (en) | 2015-06-02 |
US20140105363A1 (en) | 2014-04-17 |
US8559597B2 (en) | 2013-10-15 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20230306 |