HK1148826A1 - Pellicle frame and lithographic pellicle - Google Patents

Pellicle frame and lithographic pellicle

Info

Publication number
HK1148826A1
HK1148826A1 HK11102985.0A HK11102985A HK1148826A1 HK 1148826 A1 HK1148826 A1 HK 1148826A1 HK 11102985 A HK11102985 A HK 11102985A HK 1148826 A1 HK1148826 A1 HK 1148826A1
Authority
HK
Hong Kong
Prior art keywords
pellicle
lithographic
pellicle frame
frame
face
Prior art date
Application number
HK11102985.0A
Other languages
English (en)
Inventor
Toru Shirasaki
David Mushell
Kishore Chakracorty
Grace Ng
Original Assignee
Shinetsu Chemical Co
Intel Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co, Intel Corp filed Critical Shinetsu Chemical Co
Publication of HK1148826A1 publication Critical patent/HK1148826A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
    • H01L21/0271—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers
    • H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
    • H01L21/0274—Photolithographic processes

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Packaging Frangible Articles (AREA)
HK11102985.0A 2009-06-24 2011-03-24 Pellicle frame and lithographic pellicle HK1148826A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2009149775A JP5411595B2 (ja) 2009-06-24 2009-06-24 ペリクルフレーム及びリソグラフィ用ペリクル

Publications (1)

Publication Number Publication Date
HK1148826A1 true HK1148826A1 (en) 2011-09-16

Family

ID=42667060

Family Applications (1)

Application Number Title Priority Date Filing Date
HK11102985.0A HK1148826A1 (en) 2009-06-24 2011-03-24 Pellicle frame and lithographic pellicle

Country Status (7)

Country Link
US (1) US8467035B2 (ja)
EP (1) EP2267528B1 (ja)
JP (1) JP5411595B2 (ja)
KR (1) KR101780062B1 (ja)
CN (1) CN101930166B (ja)
HK (1) HK1148826A1 (ja)
TW (1) TWI476511B (ja)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5481106B2 (ja) * 2009-06-24 2014-04-23 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
JP5962866B2 (ja) * 2013-10-23 2016-08-03 日本軽金属株式会社 ペリクル枠及びその製造方法
SG11201701805QA (en) * 2014-09-19 2017-04-27 Mitsui Chemicals Inc Pellicle, production method thereof, exposure method
JP6304884B2 (ja) 2014-09-22 2018-04-04 信越化学工業株式会社 ペリクルの貼り付け方法
JP6293041B2 (ja) 2014-12-01 2018-03-14 信越化学工業株式会社 ペリクルフレームおよびこれを用いたペリクル
JP6347741B2 (ja) 2014-12-25 2018-06-27 信越化学工業株式会社 ペリクル
JP6899759B2 (ja) * 2017-12-12 2021-07-07 日本軽金属株式会社 Ｆｐｄ（フラットパネルディスプレイ）用ペリクル枠体及びその製造方法
WO2019172141A1 (ja) * 2018-03-05 2019-09-12 三井化学株式会社 ペリクル、露光原版、露光装置、及び半導体装置の製造方法
JP7096063B2 (ja) 2018-04-27 2022-07-05 日本特殊陶業株式会社 ペリクル枠の製造方法
KR20210129663A (ko) * 2019-02-28 2021-10-28 에이에스엠엘 네델란즈 비.브이. 레티클 조립체의 조립을 위한 장치
JP7347789B2 (ja) * 2019-07-09 2023-09-20 三井化学株式会社 ペリクル枠体及びペリクル

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01292343A (ja) * 1988-05-19 1989-11-24 Fujitsu Ltd ペリクル
JPH03235321A (ja) * 1990-02-13 1991-10-21 Toshiba Corp Ｘ線露光用マスク
US5422704A (en) * 1992-07-13 1995-06-06 Intel Corporation Pellicle frame
JPH0968793A (ja) * 1995-08-30 1997-03-11 Shin Etsu Chem Co Ltd ペリクル
KR20030041811A (ko) * 2001-11-21 2003-05-27 아사히 가라스 가부시키가이샤 페리클의 포토마스크에 대한 장착구조
US7014961B2 (en) * 2002-10-02 2006-03-21 Yazaki Corporation Photomask assembly incorporating a porous frame
JP2006039257A (ja) * 2004-07-28 2006-02-09 Asahi Kasei Electronics Co Ltd 大型ペリクル
JP4388467B2 (ja) * 2004-12-28 2009-12-24 信越化学工業株式会社 フォトリソグラフィ用ペリクル及びペリクルフレーム
WO2008105531A1 (ja) * 2007-03-01 2008-09-04 Nikon Corporation ペリクルフレーム装置、マスク、露光方法及び露光装置並びにデバイスの製造方法
JP2008256925A (ja) 2007-04-04 2008-10-23 Shin Etsu Chem Co Ltd ペリクル
CN101689018B (zh) * 2007-07-06 2013-03-20 旭化成电子材料株式会社 大型表膜构件的框体及该框体的把持方法
JP2009025562A (ja) 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd ペリクルフレーム
JP2009025559A (ja) 2007-07-19 2009-02-05 Shin Etsu Chem Co Ltd ペリクルフレーム
US7829248B2 (en) * 2007-07-24 2010-11-09 Taiwan Semiconductor Manufacturing Company, Ltd. Pellicle stress relief
JP5134418B2 (ja) * 2008-04-01 2013-01-30 信越化学工業株式会社 リソグラフィ用ペリクル
JP5134436B2 (ja) * 2008-05-27 2013-01-30 信越化学工業株式会社 リソグラフィ用ペリクル
US8349525B2 (en) * 2009-06-18 2013-01-08 Nikon Corporation Protective apparatus, mask, mask fabricating method and conveying apparatus, and exposure apparatus
JP5411596B2 (ja) * 2009-06-24 2014-02-12 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル

Also Published As

Publication number Publication date
CN101930166B (zh) 2013-05-08
KR20100138820A (ko) 2010-12-31
EP2267528A2 (en) 2010-12-29
US8467035B2 (en) 2013-06-18
KR101780062B1 (ko) 2017-09-19
EP2267528B1 (en) 2020-07-08
TWI476511B (zh) 2015-03-11
US20100328641A1 (en) 2010-12-30
CN101930166A (zh) 2010-12-29
EP2267528A3 (en) 2013-04-03
JP5411595B2 (ja) 2014-02-12
JP2011007933A (ja) 2011-01-13
TW201109838A (en) 2011-03-16

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20210629