HK1132338A1 - Pellicle for lithography - Google Patents

Pellicle for lithography

Info

Publication number
HK1132338A1
HK1132338A1 HK09112084.3A HK09112084A HK1132338A1 HK 1132338 A1 HK1132338 A1 HK 1132338A1 HK 09112084 A HK09112084 A HK 09112084A HK 1132338 A1 HK1132338 A1 HK 1132338A1
Authority
HK
Hong Kong
Prior art keywords
pellicle
lithography
Prior art date
Application number
HK09112084.3A
Other languages
English (en)
Original Assignee
Shinetsu Chemical Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shinetsu Chemical Co filed Critical Shinetsu Chemical Co
Publication of HK1132338A1 publication Critical patent/HK1132338A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G03F1/64—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof characterised by the frames, e.g. structure or material, including bonding means therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/66—Containers specially adapted for masks, mask blanks or pellicles; Preparation thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
HK09112084.3A 2008-04-01 2009-12-23 Pellicle for lithography HK1132338A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008094998A JP5134418B2 (ja) 2008-04-01 2008-04-01 リソグラフィ用ペリクル

Publications (1)

Publication Number Publication Date
HK1132338A1 true HK1132338A1 (en) 2010-02-19

Family

ID=40863687

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09112084.3A HK1132338A1 (en) 2008-04-01 2009-12-23 Pellicle for lithography

Country Status (7)

Country Link
US (1) US8026023B2 (ko)
EP (1) EP2107421B1 (ko)
JP (1) JP5134418B2 (ko)
KR (1) KR101541920B1 (ko)
CN (1) CN101551587B (ko)
HK (1) HK1132338A1 (ko)
TW (1) TWI392958B (ko)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5602626B2 (ja) 2007-06-29 2014-10-08 アーティフィシャル マッスル，インク． 感覚性フィードバック用途のための電気活性ポリマートランスデューサー
EP2239793A1 (de) 2009-04-11 2010-10-13 Bayer MaterialScience AG Elektrisch schaltbarer Polymerfilmaufbau und dessen Verwendung
JP5142297B2 (ja) * 2009-06-19 2013-02-13 信越化学工業株式会社 ペリクル
JP5411595B2 (ja) * 2009-06-24 2014-02-12 信越化学工業株式会社 ペリクルフレーム及びリソグラフィ用ペリクル
KR101990345B1 (ko) * 2009-10-02 2019-06-18 신에쓰 가가꾸 고교 가부시끼가이샤 펠리클의 제조 방법
JP5199217B2 (ja) * 2009-11-02 2013-05-15 信越化学工業株式会社 ペリクル
JP5152870B2 (ja) * 2009-12-07 2013-02-27 信越化学工業株式会社 リソグラフィ用ペリクル及びその製造方法
JP2011164255A (ja) 2010-02-08 2011-08-25 Shin-Etsu Chemical Co Ltd リソグラフィー用ペリクル
JP2012093595A (ja) * 2010-10-28 2012-05-17 Shin Etsu Chem Co Ltd ペリクルフレームおよびペリクル
KR20140008416A (ko) 2011-03-01 2014-01-21 바이엘 인텔렉쳐 프로퍼티 게엠베하 변형가능한 중합체 장치 및 필름을 제조하기 위한 자동화 제조 방법
WO2012129357A2 (en) 2011-03-22 2012-09-27 Bayer Materialscience Ag Electroactive polymer actuator lenticular system
JP2013057861A (ja) * 2011-09-09 2013-03-28 Shin Etsu Chem Co Ltd リソグラフィ用ペリクルおよびその製造方法
WO2013142552A1 (en) 2012-03-21 2013-09-26 Bayer Materialscience Ag Roll-to-roll manufacturing processes for producing self-healing electroactive polymer devices
WO2013192143A1 (en) * 2012-06-18 2013-12-27 Bayer Intellectual Property Gmbh Stretch frame for stretching process
WO2014066576A1 (en) 2012-10-24 2014-05-01 Bayer Intellectual Property Gmbh Polymer diode
JP5822401B2 (ja) * 2012-12-25 2015-11-24 信越化学工業株式会社 リソグラフィ用ペリクル
JP6156998B2 (ja) * 2013-10-22 2017-07-05 信越化学工業株式会社 ペリクル
JP6551837B2 (ja) * 2015-08-17 2019-07-31 三井化学株式会社 ペリクルフレーム、及びこれを含むペリクル
JP6632057B2 (ja) * 2016-01-07 2020-01-15 信越化学工業株式会社 ペリクル
JP2018180252A (ja) * 2017-04-12 2018-11-15 日本特殊陶業株式会社 ペリクル枠及びその製造方法
JP6968259B2 (ja) 2018-03-05 2021-11-17 三井化学株式会社 ペリクル、露光原版、露光装置、及び半導体装置の製造方法

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4965946A (ko) * 1972-10-28 1974-06-26
JPS58219023A (ja) 1982-06-15 1983-12-20 Daicel Chem Ind Ltd 樹脂薄膜の製造方法
US4861402A (en) * 1984-10-16 1989-08-29 Du Pont Tau Laboratories, Inc. Method of making a cellulose acetate butyrate pellicle
US4828640A (en) 1987-05-28 1989-05-09 Mitsui Petrochemical Industries, Ltd. Method of producing films using a peeling jig
US5234742A (en) * 1989-03-03 1993-08-10 Shin-Etsu Chemical Co., Ltd. Pellicle for lithography
JPH05341502A (ja) * 1992-06-09 1993-12-24 Tosoh Corp ペリクル枠
JPH06148871A (ja) * 1992-10-30 1994-05-27 Tosoh Corp ペリクル及びペリクルの製造方法
JP3027073B2 (ja) * 1993-07-28 2000-03-27 信越化学工業株式会社 ペリクル
JP3240261B2 (ja) * 1996-07-25 2001-12-17 信越化学工業株式会社 ペリクルの製造方法
JP4202554B2 (ja) * 1999-09-24 2008-12-24 信越化学工業株式会社 半導体リソグラフィ用ペリクル
KR20030041811A (ko) * 2001-11-21 2003-05-27 아사히 가라스 가부시키가이샤 페리클의 포토마스크에 대한 장착구조
JP2004157229A (ja) * 2002-11-05 2004-06-03 Shin Etsu Chem Co Ltd リソグラフィ用ペリクル及びその製造方法
JP2006146085A (ja) * 2004-11-24 2006-06-08 Shin Etsu Chem Co Ltd 大型ペリクル
JP2006178434A (ja) * 2004-11-25 2006-07-06 Asahi Kasei Electronics Co Ltd 大型ペリクル
KR101112544B1 (ko) * 2004-12-03 2012-03-13 삼성전자주식회사 박막 트랜지스터 표시판 및 그 제조 방법
JP2007156397A (ja) * 2005-05-09 2007-06-21 Mitsui Chemicals Inc 汚染の少ないペリクル及びその製造方法
JP2007333910A (ja) * 2006-06-14 2007-12-27 Shin Etsu Chem Co Ltd ペリクル

Also Published As

Publication number Publication date
JP5134418B2 (ja) 2013-01-30
CN101551587A (zh) 2009-10-07
TWI392958B (zh) 2013-04-11
EP2107421B1 (en) 2016-06-29
JP2009251022A (ja) 2009-10-29
KR20090105809A (ko) 2009-10-07
EP2107421A2 (en) 2009-10-07
EP2107421A3 (en) 2010-03-17
CN101551587B (zh) 2012-02-15
US20090246646A1 (en) 2009-10-01
TW200942964A (en) 2009-10-16
KR101541920B1 (ko) 2015-08-04
US8026023B2 (en) 2011-09-27

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Legal Events

Date Code Title Description
PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20220331