HK1127438A1 - Megasonic processing apparatus with frequency sweeping of thickness mode transducers - Google Patents

Megasonic processing apparatus with frequency sweeping of thickness mode transducers

Info

Publication number
HK1127438A1
HK1127438A1 HK09104962.7A HK09104962A HK1127438A1 HK 1127438 A1 HK1127438 A1 HK 1127438A1 HK 09104962 A HK09104962 A HK 09104962A HK 1127438 A1 HK1127438 A1 HK 1127438A1
Authority
HK
Hong Kong
Prior art keywords
processing apparatus
frequency sweeping
thickness mode
mode transducers
megasonic processing
Prior art date
Application number
HK09104962.7A
Other languages
English (en)
Chinese (zh)
Inventor
Michael J Goodson
Original Assignee
Michael J Goodson
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=38523045&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=HK1127438(A1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Michael J Goodson filed Critical Michael J Goodson
Publication of HK1127438A1 publication Critical patent/HK1127438A1/xx

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices
    • H10N30/20—Piezoelectric or electrostrictive devices with electrical input and mechanical output, e.g. functioning as actuators or vibrators
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B06—GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS IN GENERAL
    • B06B—METHODS OR APPARATUS FOR GENERATING OR TRANSMITTING MECHANICAL VIBRATIONS OF INFRASONIC, SONIC, OR ULTRASONIC FREQUENCY, e.g. FOR PERFORMING MECHANICAL WORK IN GENERAL
    • B06B1/00—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency
    • B06B1/02—Methods or apparatus for generating mechanical vibrations of infrasonic, sonic, or ultrasonic frequency making use of electrical energy
    • B06B1/0207—Driving circuits
    • B06B1/0223—Driving circuits for generating signals continuous in time
    • B06B1/0269—Driving circuits for generating signals continuous in time for generating multiple frequencies
    • B06B1/0284—Driving circuits for generating signals continuous in time for generating multiple frequencies with consecutive, i.e. sequential generation, e.g. with frequency sweep
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B08—CLEANING
    • B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
    • B08B3/00—Cleaning by methods involving the use or presence of liquid or steam
    • B08B3/04—Cleaning involving contact with liquid
    • B08B3/10—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration
    • B08B3/12—Cleaning involving contact with liquid with additional treatment of the liquid or of the object being cleaned, e.g. by heat, by electricity or by vibration by sonic or ultrasonic vibrations
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
    • H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67011—Apparatus for manufacture or treatment
    • H01L21/67017—Apparatus for fluid treatment
    • H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
    • H01L21/6704—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing
    • H01L21/67057—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like for wet cleaning or washing with the semiconductor substrates being dipped in baths or vessels
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N30/00—Piezoelectric or electrostrictive devices

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • Power Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Cleaning By Liquid Or Steam (AREA)
  • Apparatuses For Generation Of Mechanical Vibrations (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Oscillators With Electromechanical Resonators (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
HK09104962.7A 2006-03-17 2009-06-03 Megasonic processing apparatus with frequency sweeping of thickness mode transducers HK1127438A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78321306P 2006-03-17 2006-03-17
PCT/US2007/006885 WO2007109255A2 (fr) 2006-03-17 2007-03-18 Appareil de traitement mégasonique avec balayage en fréquence de transducteurs suivant l'épaisseur

Publications (1)

Publication Number Publication Date
HK1127438A1 true HK1127438A1 (en) 2009-09-25

Family

ID=38523045

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09104962.7A HK1127438A1 (en) 2006-03-17 2009-06-03 Megasonic processing apparatus with frequency sweeping of thickness mode transducers

Country Status (14)

Country Link
US (2) US7598654B2 (fr)
EP (1) EP1997159B1 (fr)
JP (1) JP5328044B2 (fr)
KR (1) KR101095912B1 (fr)
CN (1) CN101517766B (fr)
AU (1) AU2007227293B2 (fr)
CA (1) CA2645933C (fr)
DK (1) DK1997159T3 (fr)
ES (1) ES2527092T3 (fr)
HK (1) HK1127438A1 (fr)
MX (1) MX2008011778A (fr)
MY (1) MY157699A (fr)
TW (1) TWI393595B (fr)
WO (1) WO2007109255A2 (fr)

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TWI393595B (zh) 2006-03-17 2013-04-21 Michale Goodson J 具有頻率掃描的厚度模式轉換器之超高頻音波處理設備
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DE102008037067B4 (de) * 2008-08-08 2012-03-29 Turbo-Clean Gmbh Schwingförderer mit Ultraschallreinigung
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US20100126942A1 (en) * 2008-11-20 2010-05-27 Thottathil Sebastian K Multi-frequency ultrasonic apparatus and process with exposed transmitting head
US9108232B2 (en) * 2009-10-28 2015-08-18 Megasonic Sweeping, Incorporated Megasonic multifrequency apparatus with matched transducers and mounting plate
US20110132575A1 (en) * 2009-12-07 2011-06-09 Goodson J Michael Cleaning Industrial Heat Exchangers Through Utilization of Thicknenss Mode Ultrasonics
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JP6511353B2 (ja) * 2015-07-07 2019-05-15 クラリオン株式会社 報知装置および報知方法
DE102016101660A1 (de) * 2016-01-29 2017-08-03 Weber Ultrasonics Gmbh Verfahren zur Anregung von piezoelektrischen Wandlern und Schallerzeugungsanordnung
JP6770757B2 (ja) 2016-04-06 2020-10-21 エーシーエム リサーチ （シャンハイ） インコーポレーテッド 半導体ウエハの洗浄方法及び洗浄装置
WO2018036630A1 (fr) 2016-08-25 2018-03-01 Electrolux Appliances Aktiebolag Lave-vaisselle comprenant un récipient de détergent pour distribuer un détergent
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CN109791899B (zh) 2016-09-20 2023-06-16 盛美半导体设备(上海)股份有限公司 衬底清洗方法及清洗装置
US11581205B2 (en) 2017-11-20 2023-02-14 Acm Research, Inc. Methods and system for cleaning semiconductor wafers
EA039904B1 (ru) * 2017-12-28 2022-03-25 Кимикал Холдинг Инк. Автоматическая установка для очистки пресс-форм для шин
CN114101204A (zh) * 2021-11-22 2022-03-01 无锡市锡山德嘉电子有限责任公司 基于超声波技术处理脱盐脱水罐淤泥的清理器

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Also Published As

Publication number Publication date
CA2645933A1 (fr) 2007-09-27
US8310131B2 (en) 2012-11-13
EP1997159B1 (fr) 2014-12-17
MY157699A (en) 2016-07-15
KR20090009801A (ko) 2009-01-23
CN101517766B (zh) 2015-11-25
JP5328044B2 (ja) 2013-10-30
JP2009530856A (ja) 2009-08-27
DK1997159T3 (en) 2015-03-30
AU2007227293B2 (en) 2011-09-15
TWI393595B (zh) 2013-04-21
AU2007227293A1 (en) 2007-09-27
TW200810849A (en) 2008-03-01
EP1997159A4 (fr) 2010-11-03
WO2007109255A2 (fr) 2007-09-27
CA2645933C (fr) 2012-01-03
WO2007109255A3 (fr) 2007-12-21
KR101095912B1 (ko) 2011-12-21
US7598654B2 (en) 2009-10-06
EP1997159A2 (fr) 2008-12-03
CN101517766A (zh) 2009-08-26
ES2527092T3 (es) 2015-01-20
US20070182285A1 (en) 2007-08-09
MX2008011778A (es) 2009-01-14
US20100012148A1 (en) 2010-01-21

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