HK1127099A1 - Crystalline chromium deposit - Google Patents

Crystalline chromium deposit

Info

Publication number
HK1127099A1
HK1127099A1 HK09106989.1A HK09106989A HK1127099A1 HK 1127099 A1 HK1127099 A1 HK 1127099A1 HK 09106989 A HK09106989 A HK 09106989A HK 1127099 A1 HK1127099 A1 HK 1127099A1
Authority
HK
Hong Kong
Prior art keywords
chromium deposit
crystalline chromium
crystalline
deposit
chromium
Prior art date
Application number
HK09106989.1A
Other languages
English (en)
Inventor
Craig V Bishop
Agnes Rousseau
Zoltan Mathe
Original Assignee
Atotech Deutschland Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Atotech Deutschland Gmbh filed Critical Atotech Deutschland Gmbh
Publication of HK1127099A1 publication Critical patent/HK1127099A1/xx

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/10—Electroplating: Baths therefor from solutions of chromium characterised by the organic bath constituents used
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00—Electroplating: Baths therefor
    • C25D3/02—Electroplating: Baths therefor from solutions
    • C25D3/04—Electroplating: Baths therefor from solutions of chromium
    • C25D3/06—Electroplating: Baths therefor from solutions of chromium from solutions of trivalent chromium
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18—Electroplating using modulated, pulsed or reversing current
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/617—Crystalline layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60—Electroplating characterised by the structure or texture of the layers
    • C25D5/615—Microstructure of the layers, e.g. mixed structure
    • C25D5/619—Amorphous layers
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S428/00—Stock material or miscellaneous articles
    • Y10S428/922—Static electricity metal bleed-off metallic stock
    • Y10S428/9335—Product by special process
    • Y10S428/934—Electrical process
    • Y10S428/935—Electroplating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/12—All metal or with adjacent metals
    • Y10T428/12493—Composite; i.e., plural, adjacent, spatially distinct metal components [e.g., layers, joint, etc.]
    • Y10T428/12771—Transition metal-base component
    • Y10T428/12806—Refractory [Group IVB, VB, or VIB] metal-base component
    • Y10T428/12826—Group VIB metal-base component
    • Y10T428/12847—Cr-base component

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
  • Electroplating Methods And Accessories (AREA)
HK09106989.1A 2006-03-31 2009-07-29 Crystalline chromium deposit HK1127099A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US78838706P 2006-03-31 2006-03-31
PCT/US2007/065345 WO2007115030A1 (en) 2006-03-31 2007-03-28 Crystalline chromium deposit

Publications (1)

Publication Number Publication Date
HK1127099A1 true HK1127099A1 (en) 2009-09-18

Family

ID=38325343

Family Applications (1)

Application Number Title Priority Date Filing Date
HK09106989.1A HK1127099A1 (en) 2006-03-31 2009-07-29 Crystalline chromium deposit

Country Status (11)

Country Link
US (2) US7887930B2 (es)
EP (1) EP2010697B1 (es)
JP (1) JP5050048B2 (es)
KR (1) KR101367924B1 (es)
CN (1) CN101410556B (es)
BR (1) BRPI0710028B1 (es)
CA (1) CA2647571C (es)
ES (1) ES2669050T3 (es)
HK (1) HK1127099A1 (es)
TW (1) TWI435957B (es)
WO (1) WO2007115030A1 (es)

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BRPI0817924B1 (pt) * 2007-10-02 2019-02-12 Atotech Deutschland Gmbh Depósito de liga de cromo funcional cristalino eletrodepositado, banho de eletrodeposição para eletrodepositar um depósito de liga de cromo funcional cristalinonanogranular, e processo para eletrodepositar um depósito de liga de cromo cristalino funcional nanogranular em um substrato
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CN112840065A (zh) * 2018-10-19 2021-05-25 德国艾托特克公司 用于电解钝化银、银合金、金或金合金表面的方法
CN109371433B (zh) * 2018-10-31 2019-09-20 中国人民解放军陆军装甲兵学院 一种纳米晶三价铬复合镀层用镀液及复合镀层的制备方法
KR102012739B1 (ko) * 2018-10-31 2019-08-21 주식회사 에이엔씨코리아 3 가 크롬 도금액 및 이를 이용한 크랙프리 크롬도금공정
WO2020120537A1 (en) * 2018-12-11 2020-06-18 Atotech Deutschland Gmbh A method for depositing a chromium or chromium alloy layer and plating apparatus
WO2020261930A1 (ja) * 2019-06-26 2020-12-30 日立オートモティブシステムズ株式会社 シリンダ装置と金属製摺動部品及び金属製摺動部品の製造方法
FI129420B (en) 2020-04-23 2022-02-15 Savroc Ltd AQUATIC ELECTRIC COATING BATH
EP4101947A1 (en) * 2021-06-10 2022-12-14 Atotech Deutschland GmbH & Co. KG Method for electrodepositing a dark chromium layer, substrate comprising same, and electroplating bath thereof
EP4151779A1 (de) * 2021-09-15 2023-03-22 Trivalent Oberflächentechnik GmbH Chrom-indium-, chrom-bismut- und chrom-antimon-beschichtung, verfahren zur herstellung und verwendung
WO2024053668A1 (ja) * 2022-09-07 2024-03-14 日立Astemo株式会社 めっき部材およびその製造方法

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Also Published As

Publication number Publication date
US20110132765A1 (en) 2011-06-09
CA2647571C (en) 2015-02-17
BRPI0710028B1 (pt) 2018-02-14
KR101367924B1 (ko) 2014-03-17
EP2010697A1 (en) 2009-01-07
JP5050048B2 (ja) 2012-10-17
KR20090017493A (ko) 2009-02-18
WO2007115030A1 (en) 2007-10-11
EP2010697B1 (en) 2018-03-07
ES2669050T3 (es) 2018-05-23
TWI435957B (zh) 2014-05-01
JP2009532580A (ja) 2009-09-10
US20070227895A1 (en) 2007-10-04
BRPI0710028A2 (pt) 2011-08-02
US7887930B2 (en) 2011-02-15
TW200806816A (en) 2008-02-01
CN101410556A (zh) 2009-04-15
CN101410556B (zh) 2010-12-29
CA2647571A1 (en) 2007-10-11

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Legal Events

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PC Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee)

Effective date: 20150328