HK1111813A1 - - Google Patents
Info
- Publication number
- HK1111813A1 HK1111813A1 HK08106397.8A HK08106397A HK1111813A1 HK 1111813 A1 HK1111813 A1 HK 1111813A1 HK 08106397 A HK08106397 A HK 08106397A HK 1111813 A1 HK1111813 A1 HK 1111813A1
- Authority
- HK
- Hong Kong
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70825—Mounting of individual elements, e.g. mounts, holders or supports
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/02—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of crystals, e.g. rock-salt, semi-conductors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/06—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of fluids in transparent cells
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B21/00—Microscopes
- G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Environmental & Geological Engineering (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Analytical Chemistry (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Crystallography & Structural Chemistry (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Lenses (AREA)
- Microscoopes, Condenser (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2005139343 | 2005-05-12 | ||
PCT/JP2006/309253 WO2006121008A1 (ja) | 2005-05-12 | 2006-05-08 | 投影光学系、露光装置、および露光方法 |
Publications (1)
Publication Number | Publication Date |
---|---|
HK1111813A1 true HK1111813A1 (de) | 2008-08-15 |
Family
ID=37396517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
HK08106397.8A HK1111813A1 (de) | 2005-05-12 | 2008-06-10 |
Country Status (7)
Country | Link |
---|---|
US (1) | US7936441B2 (de) |
EP (1) | EP1881520A4 (de) |
JP (2) | JP5055566B2 (de) |
KR (1) | KR20080005428A (de) |
CN (1) | CN100539020C (de) |
HK (1) | HK1111813A1 (de) |
WO (1) | WO2006121008A1 (de) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
EP1706793B1 (de) | 2004-01-20 | 2010-03-03 | Carl Zeiss SMT AG | Belichtungsvorrichtung und messeinrichtung für eine projektionslinse |
KR20140138350A (ko) | 2004-05-17 | 2014-12-03 | 칼 짜이스 에스엠티 게엠베하 | 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 |
JP2007005777A (ja) * | 2005-05-25 | 2007-01-11 | Tokuyama Corp | 液浸式露光装置のラストレンズ |
DE102006021797A1 (de) | 2006-05-09 | 2007-11-15 | Carl Zeiss Smt Ag | Optische Abbildungseinrichtung mit thermischer Dämpfung |
US8027023B2 (en) | 2006-05-19 | 2011-09-27 | Carl Zeiss Smt Gmbh | Optical imaging device and method for reducing dynamic fluctuations in pressure difference |
DE102007062894A1 (de) | 2007-01-23 | 2008-07-24 | Carl Zeiss Smt Ag | Projektionsobjektiv für die Lithographie |
EP1998223A2 (de) | 2007-01-23 | 2008-12-03 | Carl Zeiss SMT AG | Projektionsobjektiv für die Lithographie |
NL1035757A1 (nl) | 2007-08-02 | 2009-02-03 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
DE102009037077B3 (de) * | 2009-08-13 | 2011-02-17 | Carl Zeiss Smt Ag | Katadioptrisches Projektionsobjektiv |
DE102011077784A1 (de) | 2011-06-20 | 2012-12-20 | Carl Zeiss Smt Gmbh | Projektionsanordnung |
WO2013029879A1 (en) * | 2011-08-30 | 2013-03-07 | Asml Netherlands B.V. | Lithographic apparatus, method of setting up a lithographic apparatus and device manufacturing method |
JP6261357B2 (ja) * | 2014-01-30 | 2018-01-17 | オリンパス株式会社 | 顕微鏡および観察方法 |
JP2016001633A (ja) | 2014-06-11 | 2016-01-07 | ソニー株式会社 | 固体撮像素子、および電子装置 |
DE102016205618A1 (de) | 2016-04-05 | 2017-03-30 | Carl Zeiss Smt Gmbh | Projektionsobjektiv mit Wellenfrontmanipulator, Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage |
DE102016224400A1 (de) | 2016-12-07 | 2018-06-07 | Carl Zeiss Smt Gmbh | Katadioptrisches Projektionsobjektiv und Verfahren zu seiner Herstellung |
DE102017209440A1 (de) | 2017-06-02 | 2018-12-06 | Carl Zeiss Smt Gmbh | Projektionsbelichtungsverfahren und Projektionsbelichtungsanlage für die Mikrolithografie |
Family Cites Families (31)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS60230604A (ja) | 1984-04-30 | 1985-11-16 | Olympus Optical Co Ltd | レンズ |
JPS63141011A (ja) | 1986-12-03 | 1988-06-13 | Minolta Camera Co Ltd | レンズの保持装置 |
JP3747566B2 (ja) | 1997-04-23 | 2006-02-22 | 株式会社ニコン | 液浸型露光装置 |
US5995304A (en) | 1997-07-02 | 1999-11-30 | Fuji Photo Optical Co., Ltd. | Plastic lens |
WO1999049504A1 (fr) | 1998-03-26 | 1999-09-30 | Nikon Corporation | Procede et systeme d'exposition par projection |
US6671246B1 (en) | 1999-04-28 | 2003-12-30 | Olympus Optical Co., Ltd. | Optical pickup |
JP2001356263A (ja) | 2000-06-12 | 2001-12-26 | Pioneer Electronic Corp | 組み合わせ対物レンズ、光ピックアップ装置、光学式記録再生装置及び組み合わせ対物レンズ製造方法 |
TW569055B (en) | 2000-06-17 | 2004-01-01 | Zeiss Stiftung | Device for mounting an optical element, for example a lens element in a lens |
JP2003075703A (ja) | 2001-08-31 | 2003-03-12 | Konica Corp | 光学ユニット及び光学装置 |
CN100462844C (zh) | 2002-08-23 | 2009-02-18 | 株式会社尼康 | 投影光学系统、微影方法、曝光装置及使用此装置的方法 |
AU2003289239A1 (en) * | 2002-12-10 | 2004-06-30 | Nikon Corporation | Exposure system and device producing method |
JP2004205698A (ja) * | 2002-12-24 | 2004-07-22 | Nikon Corp | 投影光学系、露光装置および露光方法 |
JP2005005395A (ja) * | 2003-06-10 | 2005-01-06 | Nikon Corp | ガス給排気方法及び装置、鏡筒、露光装置及び方法 |
CN102854755A (zh) | 2003-07-09 | 2013-01-02 | 株式会社尼康 | 曝光装置 |
KR101441844B1 (ko) * | 2003-08-21 | 2014-09-17 | 가부시키가이샤 니콘 | 노광 장치, 노광 방법 및 디바이스 제조 방법 |
SG133589A1 (en) | 2003-08-26 | 2007-07-30 | Nikon Corp | Optical element and exposure device |
US8149381B2 (en) | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
WO2005031823A1 (ja) * | 2003-09-29 | 2005-04-07 | Nikon Corporation | 液浸型レンズ系及び投影露光装置、並びにデバイス製造方法 |
JP4470433B2 (ja) * | 2003-10-02 | 2010-06-02 | 株式会社ニコン | 露光装置、露光方法、及びデバイス製造方法 |
US20050185269A1 (en) * | 2003-12-19 | 2005-08-25 | Carl Zeiss Smt Ag | Catadioptric projection objective with geometric beam splitting |
JP4577023B2 (ja) | 2004-03-15 | 2010-11-10 | ソニー株式会社 | ソリッドイマージョンレンズ、集光レンズ、光学ピックアップ装置、光記録再生装置及びソリッドイマージョンレンズの形成方法 |
US20070103661A1 (en) | 2004-06-04 | 2007-05-10 | Nikon Corporation | Exposure apparatus, exposure method, and method for producing device |
JP4655763B2 (ja) * | 2004-06-04 | 2011-03-23 | 株式会社ニコン | 露光装置、露光方法及びデバイス製造方法 |
EP1768169B9 (de) | 2004-06-04 | 2013-03-06 | Nikon Corporation | Belichtungsvorrichtung, belichtungsverfahren und verfahren zur herstellung eines bauelementes |
JP2006114195A (ja) | 2004-09-14 | 2006-04-27 | Sony Corp | レンズ保持体とこれを用いた集光レンズ、光学ピックアップ装置及び光記録再生装置 |
JP2006114196A (ja) | 2004-09-14 | 2006-04-27 | Sony Corp | ソリッドイマージョンレンズとこれを用いた集光レンズ、光学ピックアップ装置、光記録再生装置及びソリッドイマージョンレンズの形成方法 |
JP2006128192A (ja) * | 2004-10-26 | 2006-05-18 | Nikon Corp | 保持装置、鏡筒、及び露光装置、並びにデバイス製造方法 |
WO2006053751A2 (de) * | 2004-11-18 | 2006-05-26 | Carl Zeiss Smt Ag | Projektionsobjektiv einer mikrolithographischen projektionsbelichtungsanlage |
JP2006268741A (ja) * | 2005-03-25 | 2006-10-05 | Nec Corp | コンタクトセンターシステムおよびエージェント端末装置ならびにエージェントへの情報提供方法 |
WO2007132862A1 (ja) * | 2006-05-16 | 2007-11-22 | Nikon Corporation | 投影光学系、露光方法、露光装置、及びデバイス製造方法 |
NL1035908A1 (nl) * | 2007-09-25 | 2009-03-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
-
2006
- 2006-05-08 US US11/920,331 patent/US7936441B2/en not_active Expired - Fee Related
- 2006-05-08 KR KR1020077026699A patent/KR20080005428A/ko not_active Application Discontinuation
- 2006-05-08 WO PCT/JP2006/309253 patent/WO2006121008A1/ja active Application Filing
- 2006-05-08 CN CNB200680015711XA patent/CN100539020C/zh not_active Expired - Fee Related
- 2006-05-08 JP JP2007528268A patent/JP5055566B2/ja not_active Expired - Fee Related
- 2006-05-08 EP EP06746084A patent/EP1881520A4/de not_active Ceased
-
2008
- 2008-06-10 HK HK08106397.8A patent/HK1111813A1/xx not_active IP Right Cessation
-
2012
- 2012-03-29 JP JP2012075410A patent/JP5561563B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JPWO2006121008A1 (ja) | 2008-12-18 |
EP1881520A4 (de) | 2010-06-02 |
EP1881520A1 (de) | 2008-01-23 |
KR20080005428A (ko) | 2008-01-11 |
JP5561563B2 (ja) | 2014-07-30 |
CN100539020C (zh) | 2009-09-09 |
US7936441B2 (en) | 2011-05-03 |
JP5055566B2 (ja) | 2012-10-24 |
CN101171667A (zh) | 2008-04-30 |
WO2006121008A1 (ja) | 2006-11-16 |
US20090092925A1 (en) | 2009-04-09 |
JP2012164991A (ja) | 2012-08-30 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PC | Patent ceased (i.e. patent has lapsed due to the failure to pay the renewal fee) |
Effective date: 20210508 |